오버레이 및 수율 임계 패턴을 이용한 계측
    71.
    发明公开
    오버레이 및 수율 임계 패턴을 이용한 계측 审中-实审
    使用重叠和产量阈值模式进行测量

    公开(公告)号:KR1020170031730A

    公开(公告)日:2017-03-21

    申请号:KR1020177003719

    申请日:2015-07-07

    Abstract: 소자설계에서설계사양에의존하는특정역치보다큰 처리변동에대한오버레이감도를가진오버레이임계패턴을식별하는단계와, 식별된오버레이임계패턴에대응하는계측타겟을이용하는단계를포함한계측방법이제공된다. 대안적으로또는상보적으로, 계측방법은특정처리변동에기인하는대응하는처리창 내로우잉에따라수율임계패턴을식별하는단계를포함하고, 여기에서상기내로우잉은처리파라미터에서패턴들의에지배치오차(EPE)의의존성에의해규정된다. 대응하는타겟및 측정법이제공된다.

    Abstract translation: 该测量方法包括:使用对应于所识别的重叠阈值图案用于识别与比取决于设计规范中的元件设计,提供了一种阈值大的工艺变化的叠加灵敏度覆盖阈图案的计测对象的步骤。 可替代地或补充地,该测量方法根据由于特定过程变量拉拢包括识别收率阈图案,拉拢这里进入地点的过程参数误差的图案的边缘是相应的处理窗内 由(EPE)的依赖性限定。 提供相应的目标和测量。

    CALIBRATION STANDARD, SENSOR ARRANGEMENT AND USE

    公开(公告)号:US20240241053A1

    公开(公告)日:2024-07-18

    申请号:US18531911

    申请日:2023-12-07

    Abstract: A calibration attachment for adjusting, calibrating, and/or performing a functional check of an optical sensor, which is configured to measure at least one measured variable in a medium by light, wherein the sensor is designed to emit transmitted light of at least one wavelength in the range of 200-700 nm, in particular 200-500 nm, includes a housing and a body, which is arranged in the housing, wherein the body includes praseodymium and cerium, and wherein the body, after excitation with the transmitted light, emits light of a different, in particular longer, wavelength. A sensor arrangement includes such a calibration attachment and use thereof.

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