公开(公告)号：EP0300932A1

公开(公告)日：1989-01-25

申请号：EP88420256.5

申请日：1988-07-20

Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE

Inventor： Menet, Jacques ,  De Gabrielli, Olivier

IPC: H01J3/02

CPC classification number: H01J3/025

Abstract: La présente invention concerne une source d'électrons comprenant, dans une enceinte à basse pression, une anode (A), une cathode (K) et des moyens d'application d'un champ magnétique (13). La cathode est constituée d'une cavité équipotentielle (10) munie d'une ouverture (11) du côté de l'anode. Le champ magnétique est appliqué parallèlement à la direction anode-cathode au niveau de l'ouverture.

公开(公告)号：KR101068790B1

公开(公告)日：2011-09-30

申请号：KR1020067010458

申请日：2004-10-29

Applicant: 어플라이드 머티어리얼스, 인코포레이티드

Inventor： 데모스,알렉산더,티. ,  폰네칸티,하리,케이. ,  자오,준 ,  아르머,헬렌,알.

IPC: H01J37/06 ,  H01J37/077

CPC classification number: H01J37/317 ,  H01J3/025 ,  H01J37/077

Abstract: 본 발명의 일 실시예는 전자 빔 처리 장치에 관한 것으로, (a) 챔버; (b) 챔버의 내부에서 노출되는 비교적 큰 면적의 표면을 가지는 캐소드; (c) 내부에 홀들을 가지며 챔버 내부에 배치되며 작업 간격만큼 캐소드로부터 이격된 애노드; (d) 애노드를 면하게 챔버 내부에 배치된 웨이퍼 홀더; (e) 캐소드 전압을 제공하도록 출력이 캐소드에 인가되는 네거티브 전압원; (f) 출력이 애노드에 인가되는 전압원; (g) 주입 속도로 챔버속으로 가스의 진입을 허용하는 가스 인입구; 및(h) 배기 속도로 챔버로부터 가스가 배기되도록 구성된 펌프를 포함하며, 캐소드 전압값, 가스 압력, 작업 간격은 캐소드와 애노드 사이에 아킹이 발생하지 않도록 구성되며 작업 간격은 전자 평균 자유 경로보다 크다.

公开(公告)号：KR1020070119072A

公开(公告)日：2007-12-18

申请号：KR1020077025732

申请日：2006-04-05

Applicant: 탈리아니 카를로 ,  마타코타 프란세스코 치노

Inventor： 마타코타프란세스코치노

IPC: H05H1/54

CPC classification number: H05H1/54 ,  H01J1/025 ,  H01J3/025

Abstract: An apparatus and a process for generating, accelerating and propagating beams of electrons and plasma at high density, the apparatus comprising: a first dielectric tube, which contains gas; a hollow cathode, which is connected to said first dielectric tube; a second dielectric tube, which is connected to said hollow cathode and protrudes inside, and is connected to, a deposition chamber; an anode, which is arranged around said second dielectric tube, in an intermediate position; means for applying voltage to said cathode and said anode; means for evacuating the gas from the chamber; and means for spontaneous conversion of gas in the first dielectric tube into plasma.

Abstract translation: 一种用于以高密度产生，加速和传播电子和等离子体的装置和方法，所述装置包括：含有气体的第一介电管; 连接到所述第一介电管的空心阴极; 第二电介质管，其连接到所述中空阴极并向内突出并连接到沉积室; 阳极，其布置在所述第二介电管周围的中间位置; 用于向所述阴极和所述阳极施加电压的装置; 用于从所述室抽空气体的装置; 以及用于将第一电介质管中的气体自发转化成等离子体的装置。

公开(公告)号：KR1020030081060A

公开(公告)日：2003-10-17

申请号：KR1020030021789

申请日：2003-04-08

Applicant: 에어버스 데에스 게엠베하

Inventor： 샤트너,칼-하인즈 ,  로엡,호르스트 ,  라이터,한스-쥬르겐 ,  하르만,한스-피터

IPC: H01J27/16

CPC classification number: H01J3/025

Abstract: 기체 이온화를 위한 한개 이상의 기체 유입구(14)와 한개 이상의 전자 추출구(16)를 가지는 방전 챔버(11)로 구성되는, 특히 이온 스러스터(ion thruster)용의, 특히 이온 소스 뉴트럴라이저 형태의, 고주파 전자 소스(10)로서,
방전 챔버(11)는 한개 이상의 전극(12a)과 한개의 키퍼 전극(12b)에 의해 적어도 부분적으로 둘러싸이고, 고주파 전기장이 이 전극들(12a, 12b) 사이에 제공되는 것을 특징으로 하는 고주파 전자 소스(10)가 공개된다.

公开(公告)号：WO2018178428A2

公开(公告)日：2018-10-04

申请号：PCT/ES2018/070094

申请日：2018-02-09

Applicant: BENHAIM, Jean Pierre Guy

Inventor： BENHAIM, Jean Pierre Guy

IPC: H01J3/02

CPC classification number: H01J3/025

公开(公告)号：WO2012025947A1

公开(公告)日：2012-03-01

申请号：PCT/IT2011/000301

申请日：2011-08-23

Applicant: ORGANIC SPINTRONICS S.r.l. ,  TALIANI, Carlo ,  NOZAROVA, Libuse

Inventor： TALIANI, Carlo ,  NOZAROVA, Libuse

IPC: H01J3/02 ,  H01J37/077 ,  H01J37/34

CPC classification number: H01J37/077 ,  H01J3/025 ,  H01J37/32422 ,  H01J37/34 ,  H01J2237/06366

Abstract: Device for generating plasma and for directing a flow of electrons towards a given target (3); the device (1) comprises a hollow cathode (5); an activation electrode (7); a substantially dielectric tubular element (21), which extends through a wall of a cathode (5); an annular anode (25) located around the tubular element (21); and an additional electrode (28), which is located in the area of an external end (21b) of the tubular element (21) and is designed to work initially as a an additional anode so as to accelerate the electrons coming from the cathode (5) and then, once this additional electrode (28) reaches the potential of the cathode (5), as a cathode so as to direct the electrons towards the target (3 ).

Abstract translation: 用于产生等离子体并用于将电子流引向给定目标（3）的装置; 所述装置（1）包括空心阴极（5）; 活化电极（7）; 基本介质的管状元件（21），其延伸穿过阴极（5）的壁; 围绕所述管状元件（21）定位的环形阳极（25）; 以及位于管状元件（21）的外端（21b）的区域中的附加电极（28），并且被设计成最初作为附加阳极工作，以加速来自阴极的电子（ 5），然后，一旦该附加电极（28）达到阴极（5）的电位，就作为阴极，以便将电子引向靶（3）。

公开(公告)号：WO2010049866A2

公开(公告)日：2010-05-06

申请号：PCT/IB2009054709

申请日：2009-10-25

Applicant: EX BEAMS LTD ,  MITKO SERGEY

Inventor： MITKO SERGEY

CPC classification number: H01J3/025 ,  G21K5/00 ,  H01J37/077

Abstract: Apparatus is described for generating an electron beam in the presence of a gas at a pressure higher than 100 Pa. The apparatus comprises an acceleration gap defined between a metallic cathode 18 having a flat surface spaced by a uniform predetermined distance from a metallic anode (20). A cable pulse generator applies a steep edged high voltage pulse by way of a transmission line (10) to the acceleration gap. The length of the acceleration gap is determined in dependence upon the peak voltage of the applied pulse, the rise time of the leading edge of the applied pulse and the capacitance of the acceleration gap in such manner as to generate a run-away current between the cathode and the anode.

Abstract translation: 描述了用于在高于100Pa的压力存在下产生电子束的装置，该装置包括一个加速间隙，该加速间隙限定在金属阴极18之间，该金属阴极18具有与金属阳极（20）间隔开均匀的预定距离 ）。 电缆脉冲发生器通过传输线（10）将陡峭的高压脉冲施加到加速间隙。 加速间隙的长度取决于所施加的脉冲的峰值电压，施加的脉冲的前沿的上升时间和加速度间隙的电容，以便产生在 阴极和阳极。

公开(公告)号：WO2006130157A2

公开(公告)日：2006-12-07

申请号：PCT/US2005/025121

申请日：2005-07-12

Applicant: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS ,  PARK, Sung-Jin ,  EDEN, J., Gary ,  PARK, Kyung-Ho

Inventor： PARK, Sung-Jin ,  EDEN, J., Gary ,  PARK, Kyung-Ho

CPC classification number: H01J1/025 ,  B82Y10/00 ,  H01J3/025 ,  H01J17/066 ,  H01J63/02 ,  H01J2201/30469 ,  H01J2217/49

Abstract: Field emission nanostructures (18) assist operation of a microdischarge device. The field emission nanostructures are integrated into the microdischarge device(s) or are situated near an electrode (14, 16, 36, 38) of the microdischarge device(s). The field emission nanostructures reduce operating and ignition voltages compared to otherwise identical device lacking the field emission nanostructures, while also increasing the radiative output of the microdischarge device(s).

Abstract translation: 场发射纳米结构（18）有助于微放电器件的工作。 场致发射纳米结构集成到微放电器件中或位于微放电器件的电极（14,16,36,38）附近。 与其他相同的缺少场致发射纳米结构的器件相比，场致发射纳米结构降低了操作和点火电压，同时也增加了微放电器件的辐射输出。

公开(公告)号：WO2006105955A2

公开(公告)日：2006-10-12

申请号：PCT/EP2006003107

申请日：2006-04-05

Applicant: TALIANI CARLO ,  MATACOTTA FRANCESCO CINO

Inventor： MATACOTTA FRANCESCO CINO

IPC: H05H1/54

CPC classification number: H05H1/54 ,  H01J1/025 ,  H01J3/025

Abstract: An apparatus and a process for generating, accelerating and propagating beams of electrons and plasma at high density, the apparatus comprising: a first dielectric tube, which contains gas; a hollow cathode, which is connected to said first dielectric tube; a second dielectric tube, which is connected to said hollow cathode and protrudes inside, and is connected to, a deposition chamber; an anode, which is arranged around said second dielectric tube, in an intermediate position; means for applying voltage to said cathode and said anode; means for evacuating the gas from the chamber; and means for spontaneous conversion of gas in the first dielectric tube into plasma.

Abstract translation: 一种用于以高密度产生，加速和传播电子和等离子体的装置和方法，所述装置包括：含有气体的第一介电管; 连接到所述第一介电管的空心阴极; 第二电介质管，其连接到所述空心阴极并向内突出并连接到沉积室; 阳极，其布置在所述第二介电管周围的中间位置; 用于向所述阴极和所述阳极施加电压的装置; 用于从所述室抽空气体的装置; 以及用于将第一电介质管中的气体自发转化成等离子体的装置。

公开(公告)号：WO03081965A8

公开(公告)日：2004-04-29

申请号：PCT/RU0300084

申请日：2003-03-07

Applicant: MINAKOV VALERIY IVANOVICH

Inventor： MINAKOV VALERIY IVANOVICH

IPC: H01J17/02 ,  F03H1/00 ,  H01J3/02 ,  H01J19/02 ,  H05H1/54 ,  H05H19/02

CPC classification number: H01J3/025

Abstract: The invention relates to gas-discharge high-vacuum devices. Said invention makes it possible to increase the efficiency of electron beam extraction and the gas and energy efficiency. The inventive plasma electron-emitting source comprises internal and external polepieces embodied in the form of a body of rotation provided with central holes, a source of magnetomotive force arranged between said polepieces, an arc apertured hollow cathode and a gas supply unit which are arranged in a hermetically sealed body. Said source also comprises intermediate and main anodes embodied in the form of a body of rotation provided with central holes and arranged between coaxial output holes of the cathode and the body. The intermediate anode, the internal polepiece, a ring collector, the main anode and the external polepiece are arranged in series between the output holes of the cathode and the body. The main anode is made of low-magnetic material and is disposed in such a way that not less than 30 % of the magnetic flow formed in space between the polepieces passes through the hole thereof. The internal and external polepieces are electrically connected to the cathode.

Abstract translation: 本发明涉及气体放电高真空装置。 所述发明使得可以提高电子束提取的效率和气体和能量效率。 本发明的等离子体电子发射源包括以具有中心孔的旋转体的形式体现的内部和外部极点，设置在所述极柱之间的磁动势源，弧形空心阴极和气体供应单元，其布置在 一个气密的身体。 所述源还包括以设置有中心孔并且布置在阴极和主体的同轴输出孔之间的旋转体的形式体现的中间和主阳极。 中间阳极，内部极靴，环形收集器，主阳极和外部电杆串联布置在阴极和主体的输出孔之间。 主阳极由低磁性材料制成，并且以这样的方式设置，使得在极片之间的空间中形成的磁流的不少于30％通过其孔。 内部和外部极杆电连接到阴极。