Optical measurement arrangement and method for inclination measurement
    71.
    发明申请
    Optical measurement arrangement and method for inclination measurement 有权
    光学测量布置和倾斜测量方法

    公开(公告)号:US20010006419A1

    公开(公告)日:2001-07-05

    申请号:US09748339

    申请日:2000-12-26

    CPC classification number: G03F9/7034 G01B11/0641 G01N21/211

    Abstract: The invention refers to an optical measurement arrangement having an ellipsometer (45) and a device for ascertaining and correcting directional deviations between the line normal to the specimen surface and the angle bisector (25) between the incident and return beams (23, 24) of the ellipsometer (45), and further to a measurement arrangement having a mirror objective and a device for ascertaining directional deviations between the line normal to the specimen surface and the optical axis of the mirror objective, which has a deflection element in the unused aperture space of the mirror objective. In an optical measurement arrangement of the kind described above, a direction monitoring beam (30) is directed onto the specimen (P); optical means for imaging the return reflection of the direction monitoring beam (30) onto an area detector that is connected to an evaluation circuit (46) are also provided, and positioning commands for a specimen stage (12) are available at the outputs of the evaluation circuit (46). By way of the control commands, the specimen stage is caused to tilt until the return reflection on the area detector has assumed the position at which the direction of the normal line corresponds to the direction of the angle bisector (25).

    Abstract translation: 本发明涉及具有椭偏仪(45)的光学测量装置和用于确定和校正在垂直于试样表面的线与方向偏差之间的方向偏差的装置,该装置与入射和回波束(23,24)之间的角度平分线(25) 椭圆偏振计(45),并且还包括具有镜面物镜的测量装置和用于确定在垂直于样品表面的线与反射镜物镜的光轴之间的方向偏差的装置,其在未使用的孔径空间中具有偏转元件 的镜像目标。 在上述类型的光学测量装置中,方向监视光束(30)被引导到样本(P)上; 还提供了用于将方向监视光束(30)的反射成像到连接到评估电路(46)的区域检测器上的光学装置,并且用于样本台(12)的定位命令可用于 评估电路(46)。 通过控制命令,使样本台倾斜直到区域检测器上的返回反射已经假定法线方向对应于角平分线(25)的方向的位置。

    Polarization modulation photoreflectance characterization of semiconductor quantum confined structures
    72.
    发明申请
    Polarization modulation photoreflectance characterization of semiconductor quantum confined structures 失效
    半导体量子限制结构的极化调制光反射特性

    公开(公告)号:US20040257566A1

    公开(公告)日:2004-12-23

    申请号:US10847202

    申请日:2004-05-17

    Abstract: A polarization modulation photoreflectance technique has been developed for optical characterization of semiconductor quantum confined structures. By using a tunable laser source in conjunction with polarization state modulation, a single beam modulation spectroscopy technique may be used to characterize the optical response of semiconductor materials and structures. Disclosed methods and instruments are suitable for characterization of optical signatures of quantum electronic confinement, including resolution of excitonic states at the band edge or other direct or indirect critical points in the band structure. This allows for characterization of semiconductor quantum well structures, for characterization of strain in semiconductor films, and for characterization of electric fields at semiconductor interfaces.

    Abstract translation: 已经开发了用于半导体量子限制结构的光学表征的偏振调制光反射技术。 通过结合极化状态调制使用可调激光源,可以使用单光束调制光谱技术来表征半导体材料和结构的光学响应。 公开的方法和仪器适用于量子电子约束的光学特征的表征,包括在带边缘处的激发态的分辨率或带结构中的其它直接或间接关键点。 这允许表征半导体量子阱结构,用于表征半导体膜中的应变以及用于表征半导体界面处的电场。

    Combination thermal wave and optical spectroscopy measurement systems
    73.
    发明申请
    Combination thermal wave and optical spectroscopy measurement systems 失效
    组合热波和光谱测量系统

    公开(公告)号:US20040233435A1

    公开(公告)日:2004-11-25

    申请号:US10691132

    申请日:2003-10-22

    CPC classification number: G01N21/1717 G01N21/211

    Abstract: A combination metrology tool is disclosed which is capable of obtaining both thermal wave and optical spectroscopy measurements on a semiconductor wafer. In a preferred embodiment, the principal combination includes a thermal wave measurement and a spectroscopic ellipsometric measurement. These measurements are used to characterize ion implantation processes in semiconductors over a large dosage range.

    Abstract translation: 公开了一种能够在半导体晶片上获得热波和光谱测量的组合计量工具。 在优选实施例中,主要组合包括热波测量和光谱椭偏测量。 这些测量用于表征在大剂量范围内的半导体中的离子注入过程。

    Accuracy calibration of birefringence measurement systems
    74.
    发明申请
    Accuracy calibration of birefringence measurement systems 审中-公开
    双折射测量系统的精度校准

    公开(公告)号:US20040233434A1

    公开(公告)日:2004-11-25

    申请号:US10491860

    申请日:2004-06-29

    Inventor: Baoliang Wang

    CPC classification number: G01J4/04 G01N21/23

    Abstract: Provided are systems and methods using a Soleil-Babinet compensator (101) as a standard for calibrating birefringence measurement systems. Highly precise and repeatable calibration is accomplished by the method described here because, among other things, the inventive method accounts for variations of retardance across the surface of the Soleil-Babinet compensator (101). The calibration technique described here may be employed in birefringence measurement systems that have a variety of optical setups for measuring a range of retardation levels and at various frequencies of light sources.

    Abstract translation: 提供了使用Soleil-Babinet补偿器(101)作为校准双折射测量系统的标准的系统和方法。 通过本文所述的方法来实现高精度和可重复的校准,因为除了别的以外,本发明的方法考虑了在Soleil-Babinet补偿器(101)的表面上的延迟的变化。 这里描述的校准技术可以用于具有用于测量延迟水平范围和在各种光源频率的各种光学设置的双折射测量系统中。

    Concentration measurement device
    75.
    发明申请
    Concentration measurement device 失效
    浓度测定装置

    公开(公告)号:US20040233433A1

    公开(公告)日:2004-11-25

    申请号:US10479758

    申请日:2004-06-10

    CPC classification number: G01N21/552 A61B5/14558 G01N21/21 G01N2021/217

    Abstract: To provide a concentration measuring method which enables a stable and highly accurate concentration measurement while avoiding the step of making a background measurement. The concentration measuring apparatus includes: a concentration measuring contact that is brought into contact with a subject of measurement; a light source that emits light and enters the light into the concentration measuring contact; a polarizer that takes out p-polarized and s-polarized light components from the light which is passed through the concentration measuring contact into the subject of measurement, transmitted in the subject of measurement, and returned to the concentration measuring contact; a photodetector that determines at least the quantities of the p-polarized and s-polarized light components taken out by the polarizer; and calculating means that calculates the concentration of a specific component contained in the subject of measurement based on the determined results.

    Abstract translation: 提供一种浓度测量方法,其能够在避免进行背景测量的步骤的同时进行稳定且高精度的浓度测量。 浓度测量装置包括:与测量对象接触的浓度测量接触; 发光并将光进入浓度测量触点的光源; 偏振器,从通过浓度测量触点的光中取出p偏振光和S偏振光分量,传送到测量对象中,并返回到浓度测量接触; 至少确定由偏振器取出的p偏振光和S偏振光分量的量的光电检测器; 以及基于所确定的结果计算包含在测量对象中的特定成分的浓度的计算装置。

    Simultaneous optical isolation and channel monitoring system
    76.
    发明申请
    Simultaneous optical isolation and channel monitoring system 失效
    同时光隔离和通道监控系统

    公开(公告)号:US20040212800A1

    公开(公告)日:2004-10-28

    申请号:US10441525

    申请日:2003-05-21

    CPC classification number: G01J9/00

    Abstract: A simultaneous optical isolation and channel monitoring system for monitoring a channel of an incident light is provided. The system includes an optical isolator for receiving an incident light so as to isolate an interference of backward light into the cavity of laser source or an optical amplifier, wherein after passing through the optical isolator, the incident light has a different polarization state output changing with a wavelength thereof, a beam splitter connected to the optical isolator for separating the light into a light to output and a light for monitoring signal, a linear polarizer connected to the beam splitter for filtering a quantity of signal from the monitored light, and a photodetector connected to the linear polarizer for detecting the quantity of signal generated from the monitored light so as to monitor the channel.

    Abstract translation: 提供了用于监测入射光通道的同时光隔离和通道监测系统。 该系统包括用于接收入射光的光隔离器,以便将后向光的干涉与激光源的空腔或光放大器隔离,其中在通过光隔离器之后,入射光具有与 连接到光隔离器的光束分离器,用于将光分离成光输出和用于监视信号的光;连接到分束器的线偏振器,用于对来自被监视光的信号进行滤波;以及光电检测器 连接到线性偏振器,用于检测从监视光产生的信号量,以便监视通道。

    Apparatus and method for imaging
    77.
    发明申请
    Apparatus and method for imaging 有权
    成像装置及方法

    公开(公告)号:US20040207846A1

    公开(公告)日:2004-10-21

    申请号:US10841988

    申请日:2004-05-07

    Abstract: Apparatus for acquiring an image of a specimen comprising a cassette having an optical portion holding a specimen array on a TIR surface and being removably matable to a processing portion having a polarized light beam source and a processing polarization-sensitive portion to image the spatially distributed charges in polarization of the specimen array. In one form the array optical portion comprises a transparent slide having a bottom surface with first and second gratings located to direct polarized light to the TIR surface and to direct light reflected by that (TIR) surface to an imager, respectively. The apparatus may include a flow cell integral with the optical portion as well as means for selecting the direction and wavelength of the polarized light.

    Abstract translation: 用于获取样本的图像的装置,包括具有在TIR表面上保持样本阵列的光学部分的盒,并且可移除地配合到具有偏振光束源和处理偏振敏感部分的处理部分,以对空间分布的电荷进行成像 在样本阵列的极化。 在一种形式中,阵列光学部分包括具有底表面的透明滑块,其中第一和第二光栅被定位成将偏振光引导到TIR表面并且将由该TIR表面反射的光分别引导到成像器。 该装置可以包括与光学部分成一体的流动池以及用于选择偏振光的方向和波长的装置。

    Optical path switching based differential absorption radiometry for substance detection
    78.
    发明申请
    Optical path switching based differential absorption radiometry for substance detection 失效
    用于物质检测的基于光路切换的差分吸收辐射测量

    公开(公告)号:US20040156050A1

    公开(公告)日:2004-08-12

    申请号:US10465386

    申请日:2003-06-19

    Inventor: Glen W. Sachse

    CPC classification number: G01J3/08 G01N21/314 G01N21/3518

    Abstract: An optical path switch divides sample path radiation into a time series of alternating first polarized components and second polarized components. The first polarized components are transmitted along a first optical path and the second polarized components along a second optical path. A first gasless optical filter train filters the first polarized components to isolate at least a first wavelength band thereby generating first filtered radiation. A second gasless optical filter train filters the second polarized components to isolate at least a second wavelength band thereby generating second filtered radiation. A beam combiner combines the first and second filtered radiation to form a combined beam of radiation. A detector is disposed to monitor magnitude of at least a portion of the combined beam alternately at the first wavelength band and the second wavelength band as an indication of the concentration of the substance in the sample path.

    Abstract translation: 光路开关将采样路径辐射分为交替的第一偏振分量和第二偏振分量的时间序列。 第一偏振分量沿着第一光路传播,第二偏振分量沿着第二光路传输。 第一无气体光学滤波器组对第一极化分量进行滤波以隔离至少第一波长带,从而产生第一滤波辐射。 第二无气体光学滤波器组对第二极化分量进行滤波以隔离至少第二波长带,从而产生第二滤波辐射。 光束组合器组合第一和第二滤波辐射以形成组合的辐射束。 检测器被设置为在第一波长带和第二波长带上交替地监测组合光束的至少一部分的大小作为样品路径中物质浓度的指示。

    Purging light beam paths in optical equipment
    79.
    发明申请
    Purging light beam paths in optical equipment 有权
    清除光学设备中的光束路径

    公开(公告)号:US20040156049A1

    公开(公告)日:2004-08-12

    申请号:US10364006

    申请日:2003-02-10

    Abstract: Purging of a light beam path in an effective manner that minimizes the affect of the purging requirement on system throughput. In one embodiment, the invention is incorporated into a birefringence measurement system that has several components for directing light through a sample optical element and thereafter detecting and analyzing the light. The segment of the beam path through the sample is isolated to reduce the volume that requires continual purging.

    Abstract translation: 以有效的方式清除光束路径,以最大限度地减少净化需求对系统吞吐量的影响。 在一个实施例中,本发明被并入双折射测量系统中,该系统具有多个用于将光引导通过样品光学元件的组件,然后检测和分析光。 通过样品的光束路径的段被隔离以减少需要连续吹扫的体积。

    Method and apparatus for observing and inspecting defects

    公开(公告)号:US20040150821A1

    公开(公告)日:2004-08-05

    申请号:US10761493

    申请日:2004-01-20

    Applicant: Hitachi, Ltd

    Abstract: A defect inspecting apparatus is disclosed that can detect finer defects with high resolution optical images of those defects, and which makes the difference in contrast greater between fine line patterns of a semiconductor device. The defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

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