公开(公告)号：FR1065337A

公开(公告)日：1954-05-24

申请号：FR1065337D

申请日：1952-07-03

Applicant: SIEMENS REINIGERWERKE AG

IPC: H01J3/10 ,  H01J35/10

公开(公告)号：EP0981824B1

公开(公告)日：2002-07-03

申请号：EP98924676.4

申请日：1998-05-11

Applicant: Photocure ASA

Inventor： STEEN, Harald, B.

IPC: H01J3/10

CPC classification number: A61N5/062 ,  A61N2005/0632 ,  A61N2005/0644

Abstract: A device for irradiating a limited, defined area where uniform and intense irradiation is obtained of a sharply defined light field (7) of variable size, the light from a halogen lamp (1) or similar incoherent light source being directed by means of an elliptical mirror (2) towards one end surface (3) of a transparent rod (4) whose opposite end surface (6) is thereby uniformly irradiated and is imaged by a lens (7) in the area (9) which has to be irradiated.

公开(公告)号：EP0981824A1

公开(公告)日：2000-03-01

申请号：EP98924676.4

申请日：1998-05-11

Applicant: Photocure ASA

Inventor： STEEN, Harald, B.

IPC: H01J3/10

CPC classification number: A61N5/062 ,  A61N2005/0632 ,  A61N2005/0644

Abstract: A device for irradiating a limited, defined area where uniform and intense irradiation is obtained of a sharply defined light field (7) of variable size, the light from a halogen lamp (1) or similar incoherent light source being directed by means of an elliptical mirror (2) towards one end surface (3) of a transparent rod (4) whose opposite end surface (6) is thereby uniformly irradiated and is imaged by a lens (7) in the area (9) which has to be irradiated.

公开(公告)号：EP1586106A4

公开(公告)日：2007-08-08

申请号：EP03781059

申请日：2003-12-30

Applicant: CEBT CO LTD

Inventor： KIM HO SEOB ,  AHN SEUNG JOON ,  KIM DAE WOOK

IPC: G03F9/00 ,  H01J3/02 ,  H01J3/10 ,  H01J37/06 ,  H01J37/067 ,  H01J37/15

CPC classification number: H01J3/028 ,  H01J3/10 ,  H01J37/067 ,  H01J37/15 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/24465 ,  H01J2237/24507

Abstract: The present invention provides a new extractor for a micro-column and an alignment method of the aperture of said extractor and an electron emitter for a micro-column. Further, the present invention provides a measuring system, a method for measuring, and an alignment method using the principle of said alignment.

公开(公告)号：EP1102301A1

公开(公告)日：2001-05-23

申请号：EP00125158.6

申请日：2000-11-17

Applicant: LG ELECTRONICS INC.

Inventor： Lee, Seok Moon

IPC: H01J29/76 ,  H01J29/70 ,  H01J3/10

CPC classification number: H01J29/76 ,  H01J2229/7031

Abstract: Deflection yoke for a cathode ray tube including horizontal deflection coils and vertical deflection coils for deflecting electron beams emitted from an electron gun in a horizontal or vertical direction, a ferrite core for reducing a loss of a magnetic force generated at the horizontal and vertical deflection coils to enhance a magnetic efficiency, and a holder for fixing the horizontal deflection coils and the vertical deflection coils and the ferrite core to preset positions, and insulating between the horizontal deflection coils and the vertical deflection coils, wherein the ferrite core includes a main ferrite core with a curved surface and supplementary ferrite cores each with a planar surface fitted to the main ferrite core, thereby maintaining the advantage of the rectangular core of improving a deflection sensitivity compared to the circular ferrite core, and permitting an easier grinding on an internal surface compared to the arectangular ferrite core, to improve a distribution of inside surface dimensions.

Abstract translation: 用于阴极射线管的偏转磁轭，包括水平偏转线圈和用于偏转电子枪在水平或垂直方向上发射的电子束的垂直偏转线圈，用于减少在水平和垂直偏转线圈产生的磁力损失的铁氧体磁心 以提高磁效率，以及用于将水平偏转线圈和垂直偏转线圈和铁氧体磁心固定到预设位置的保持器，以及水平偏转线圈和垂直偏转线圈之间的绝缘，其中，铁氧体磁芯包括主铁氧体磁芯 具有弯曲表面和辅助铁氧体磁芯，每个磁芯具有装配到主铁氧体磁芯的平面，从而保持了与圆形铁氧体磁心相比提高挠曲灵敏度的矩形磁芯的优点，并且允许在内表面上更容易研磨 以铁心为中心，提高分布 内表面尺寸。

公开(公告)号：US12080507B2

公开(公告)日：2024-09-03

申请号：US17763186

申请日：2020-09-04

Applicant: Photo electron Soul Inc.

Inventor： Hokuto Iijima

IPC: H01J3/02 ,  H01J1/34 ,  H01J1/52 ,  H01J3/10 ,  H01J37/073

CPC classification number: H01J3/021 ,  H01J1/34 ,  H01J1/52 ,  H01J3/10 ,  H01J37/073 ,  H01J2237/06333

Abstract: An object is to provide an electron gun that makes it possible to verify whether or not an electron beam emitted form a photocathode is misaligned from a designed emission center axis. The object can be achieved by an electron gun including: a light source; a photocathode; and an anode. The electron gun includes an intermediate electrode arranged between the photocathode and the anode, an electron beam shielding member configured to block a part of an electron beam, a measurement unit configured to measure an intensity of an electron beam blocked by the electron beam shielding member, and an electron beam emission direction deflector arranged between the anode and the electron beam shielding member and configured to change a position where an electron beam that passed through the anode reaches the electron beam shielding member. The intermediate electrode has an electron beam passage hole and a drift space.

公开(公告)号：US10950407B2

公开(公告)日：2021-03-16

申请号：US16897828

申请日：2020-06-10

Applicant: New Japan Radio Co., Ltd.

Inventor： Toru Kimura ,  Misao Iseki ,  Hideyuki Obata

IPC: H01J13/02 ,  H01J3/02 ,  H01J3/10

Abstract: An electron gun comprising a cathode having an electron emitting surface and whose planar shape is circular; a heater; an anode being arranged to oppose the cathode; and a heat resistant member. The anode applies a positive potential relative to the cathode to extract electrons in a predetermined direction. The cathode has, in a central portion thereof, a through hole along a central axis of the cathode. The heat resistant member has a first portion to close the through hole and a second portion being positioned between the cathode and the heater.

公开(公告)号：US10020160B2

公开(公告)日：2018-07-10

申请号：US15417887

申请日：2017-01-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Koichi Kuroda ,  Hajime Kawano ,  Makoto Suzuki ,  Yuzuru Mizuhara

IPC: G01N23/00 ,  H01J37/00 ,  H01J3/10 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2806 ,  H01J2237/2815

Abstract: An object of the present invention is to provide a charged particle beam device which can realize improved contrast of an elongated pattern in a specific direction, such as a groove-like pattern. In order to achieve the above-described object, the present invention proposes a charged particle beam device including a detector for detecting a charged particle obtained based on a charged particle beam discharged to a sample. The charged particle beam device includes a charged particle passage restricting member that has at least one of an arcuate groove and a groove having a longitudinal direction in a plurality of directions, and a deflector that deflects the charged particle discharged toward the groove from the sample. The charged particle discharged from the sample is deflected to a designated position of the groove.

公开(公告)号：US08586942B2

公开(公告)日：2013-11-19

申请号：US13639998

申请日：2012-01-20

Applicant: Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

Inventor： Taizo Honda ,  Hisashi Harada ,  Yuehu Pu ,  Masahiro Ikeda ,  Kazushi Hanakawa ,  Toshihiro Otani ,  Tadashi Katayose ,  Yukiko Yamada

IPC: H01J3/10

CPC classification number: A61N5/1048 ,  A61N5/1043 ,  A61N5/1071 ,  A61N2005/1074 ,  A61N2005/1087 ,  G01T1/29 ,  G21K5/00 ,  G21K5/02

Abstract: A charged particle beam position monitor is provided with a plurality of position monitors and a beam data processing device that performs calculation processing of the state of a charged particle beam, based on a plurality of signals outputted from the position monitors. The beam data processing device includes a plurality of channel data conversion units that perform AD conversion processing of the plurality of signals outputted from the position monitors; a position size processing unit, for each of the position monitors, that calculates the beam position of the beam, based on voltage information obtained through the AD conversion processing; and an integrated control unit that controls the plurality of channel data conversion units in such a way that while the beam is irradiated onto an irradiation subject, AD conversion processing of the signals is performed at different timings for the respective position monitors.

Abstract translation: 带电粒子束位置监视器具有多个位置监视器和根据从位置监视器输出的多个信号执行带电粒子束的状态的计算处理的波束数据处理装置。 所述波束数据处理装置包括对从所述位置监视器输出的所述多个信号进行AD转换处理的多个信道数据变换部; 基于通过AD转换处理获得的电压信息，对位置监视器中的每一个计算光束位置的位置尺寸处理单元; 以及集成控制单元，其以这样的方式控制多个通道数据转换单元，即当将光束照射到照射对象时，对于各个位置监视器，在不同的定时执行信号的AD转换处理。

公开(公告)号：US06853653B2

公开(公告)日：2005-02-08

申请号：US10036925

申请日：2001-12-21

Applicant: Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

Inventor： Ronald L. Spangler ,  Jacob P. Lipcon ,  John A. Rule ,  Robert N. Jacques ,  Armen Kroyan ,  Ivan Lalovic ,  Igor V. Fomenkov ,  John M. Algots

IPC: B41C20060101 ,  B41C1/00 ,  G03F7/20 ,  H01L21/027 ,  H01S3/036 ,  H01S3/038 ,  H01S3/04 ,  H01S3/041 ,  H01S3/08 ,  H01S3/081 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/10 ,  H01S3/102 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/11 ,  H01S3/13 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/22 ,  H01S3/223 ,  H01S3/225 ,  H01J3/10

CPC classification number: G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258

Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.