公开(公告)号：ATA23786A

公开(公告)日：1988-12-15

申请号：AT23786

申请日：1986-01-31

Applicant: IMS IONEN MIKROFAB SYST

IPC: G03F7/20 ,  H01J37/153 ,  H01J37/30 ,  H01J37/317 ,  H01L21/027 ,  H01J3/12

Abstract: A multipole corrective element with the individual poles being electromagnetically energized individually and selectively to create a variable field around a charged particle beam projected through a mask and a lens system onto a substrate, e.g. an ion-beam or electron-beam microlithography. The corrective element is provided independently of the ion-optical lens system between the latter and the mask, preferably proximal to the mask.

公开(公告)号：DE255981T1

公开(公告)日：1988-06-09

申请号：DE87305696

申请日：1987-06-25

Applicant: KRATOS ANALYTICAL LTD., URMSTON, MANCHESTER, GB ,  VSW SCIENTIFIC INSTRUMENTS LTD., OLD TRAFFORD, MANCHESTER, GB

Inventor： KING GEORGE CHRISTOPHER, KING GEORGE CHRISTOPHER, STOCKPORT SK4 3AZ, GB ,  READ, FRANK HENRY, CHESHIRE SK11 0ND, GB

IPC: H01J37/153 ,  H01J3/12 ,  H01J49/06 ,  H01J49/20 ,  H01J49/22 ,  H01J49/48 ,  H01J1/46

Abstract: A charged particle optical system, e.g. an energy or mass analyser or a lens system, has a plurality of corrector electrodes (20 to 23) spaced apart across a particle beam passing from a monoenergetic source (4) to a focus (6) and dividing the beam into individual portions with central trajectories (30,31,32) the connector electrodes being electrically biassed to deflect the particles of the beam so as to reduce the aberration caused by portions with central trajectories intersecting the optical axis at different distances from the desired focus.

公开(公告)号：GB2035680B

公开(公告)日：1982-12-08

申请号：GB7936795

申请日：1979-10-23

Applicant: CONTROL DATA CORP

IPC: H01J3/18 ,  H01J9/02 ,  H01J3/12 ,  H01J29/18 ,  H01J29/46 ,  H01J29/62 ,  H01J29/74 ,  H01J29/80 ,  H01J3/30

Abstract: A combined fine focusing micro lens array and micro deflector assembly for use in electron beam tubes of the fly's eye type is provided. The assembly comprises a fine focusing micro lens array sub-assembly formed from a plurality of spaced-apart stacked parallel thin planar apertured silicon semiconductor lens plates each having an array of micro lens aperture openings. The lens plates each have highly conductive surfaces and are secured to glass rods for holding the plates in stacked parallel spaced-apart relationship with the apertures axially aligned in parallel. A micro deflector assembly is adjacent to the micro lens array sub-assembly. A micro deflector element axially aligned with each respective fine focusing lens element serves for deflecting an electron beam passing through along orthogonal x-y directional axes of movement normal to the electron beam path. The deflector elements are comprised by two orthogonally arrayed sets of parallel spaced-apart deflector bars with alternate bars of each set of deflector bars being interconnected electrically for common connection to a respective source of fine x-y deflection potential. The thin planar apertured silicon lens plates comprising the micro lens array are held together in stacked parallel assembled relationship by spaced-apart glass support rods whose longitudinal axes extend at right angles to the plates and to which the planar silicon lens plates are secured at their periphery. The two orthogonally arrayed sets of parallel spaced-apart deflection bars forming the sets of micro-deflector elements likewise preferably comprise parallel plates or bars of polycrystalline silicon having a highly conductive metalized surface. The micro deflector bars likewise are held in assembled spaced-apart parallel relationship by respective sets of spaced-apart parallel supporting glass rods whose longitudinal axes extend in a plane parallel to the plane of the deflector bars but at right angles thereto and to which the ends of the deflector bars are thermally bonded. The fine focusing micro lens array and micro deflector sub-assembly thus comprised, are secured together in assembled relation by additional glass support rods being disposed about the outer peripheries of the micro lens and micro deflector sub-assemblies and being secured thereto by thermal bonding such as by fusion.

公开(公告)号：GB2091938B

公开(公告)日：1982-12-01

申请号：GB8203751

申请日：1979-10-23

Applicant: CONTROL DATA CORP

IPC: H01J3/18 ,  H01J3/12 ,  H01J9/02 ,  H01J29/18 ,  H01J29/46 ,  H01J29/62 ,  H01J29/74 ,  H01J29/80 ,  H01J3/30

Abstract: A combined fine focusing micro lens array and micro deflector assembly for use in electron beam tubes of the fly's eye type is provided. The assembly comprises a fine focusing micro lens array sub-assembly formed from a plurality of spaced-apart stacked parallel thin planar apertured silicon semiconductor lens plates each having an array of micro lens aperture openings. The lens plates each have highly conductive surfaces and are secured to glass rods for holding the plates in stacked parallel spaced-apart relationship with the apertures axially aligned in parallel. A micro deflector assembly is adjacent to the micro lens array sub-assembly. A micro deflector element axially aligned with each respective fine focusing lens element serves for deflecting an electron beam passing through along orthogonal x-y directional axes of movement normal to the electron beam path. The deflector elements are comprised by two orthogonally arrayed sets of parallel spaced-apart deflector bars with alternate bars of each set of deflector bars being interconnected electrically for common connection to a respective source of fine x-y deflection potential. The thin planar apertured silicon lens plates comprising the micro lens array are held together in stacked parallel assembled relationship by spaced-apart glass support rods whose longitudinal axes extend at right angles to the plates and to which the planar silicon lens plates are secured at their periphery. The two orthogonally arrayed sets of parallel spaced-apart deflection bars forming the sets of micro-deflector elements likewise preferably comprise parallel plates or bars of polycrystalline silicon having a highly conductive metalized surface. The micro deflector bars likewise are held in assembled spaced-apart parallel relationship by respective sets of spaced-apart parallel supporting glass rods whose longitudinal axes extend in a plane parallel to the plane of the deflector bars but at right angles thereto and to which the ends of the deflector bars are thermally bonded. The fine focusing micro lens array and micro deflector sub-assembly thus comprised, are secured together in assembled relation by additional glass support rods being disposed about the outer peripheries of the micro lens and micro deflector sub-assemblies and being secured thereto by thermal bonding such as by fusion.

公开(公告)号：GB2019640B

公开(公告)日：1982-06-03

申请号：GB7910527

申请日：1979-03-26

Applicant: ATOMIC ENERGY AUTHORITY UK

IPC: H01J27/02 ,  H01J27/08 ,  H01J3/04 ,  H01J3/12

公开(公告)号：PL221717A1

公开(公告)日：1981-08-07

申请号：PL22171780

申请日：1980-01-31

Applicant: OS BAD ROZWOJOWY PRZETWORNIKOW

Inventor： BACHTIN ANDRZEJ J ,  WOJTKIEWICZ TEODOR

IPC: H01J20060101 ,  H01J3/12 ,  H01J41/02 ,  H02M20060101 ,  H02M ,  H01J

公开(公告)号：DE2738856B2

公开(公告)日：1981-02-05

申请号：DE2738856

申请日：1977-08-29

Applicant: SIEMENS AG, 1000 BERLIN UND 8000 MUENCHEN

Inventor： HEINZ, LOTHAR, ING.(GRAD.) ,  TAUMANN, LEONHARD, DIPL.-PHYS.

IPC: A61B6/06 ,  A61N5/10 ,  G21K1/02 ,  G21K1/04 ,  G21K5/04 ,  H01J3/12

Abstract: A beam defining system for an electron accelerator has an adjustable collimator with an accessory holder attached thereto for retaining an electron applicator. The electron applicator has an applicator wall which encloses an electron beam cone from the collimator. A frame-shaped spacer which can be brought into contact with the patient is attached to the applicator wall. A frame-shaped limiting aperture additional to limiting members in the collimator are provided on the applicator wall in order to limit the electron-beam cone at marginal regions facing away from the beam defining system.

公开(公告)号：DE2649393C3

公开(公告)日：1980-11-13

申请号：DE2649393

申请日：1976-10-29

Applicant: N.V. PHILIPS' GLOEILAMPENFABRIEKEN, EINDHOVEN (NIEDERLANDE)

Inventor： PEACOCK, JACK, LINDFIELD, HAYWARDS HEATH, SUSSEX (VER. KOENIGREICH)

IPC: G01N23/00 ,  G21K1/02 ,  G21K1/04 ,  H01J21/14 ,  H01J37/05 ,  H01J3/12

Abstract: 1530449 Irradiation apparatus M E L EQUIPMENT CO Ltd 13 Nov 1975 46891/75 Heading H5R An electron beam collimator comprises a polygonal section tubular structure having at least two parallel sides, e.g. rectangular as shown, the sides being defined by angular sections A, B, C, D, having portions such as Al, A2 forming parts of adjacent sides and planar sections El, E2, E3, E4 in sliding overlapping relationship with the angular sections to permit variation of the collimator crosssection. Fig. 3 (not shown) illustrates an adjusting and supporting system for the wall sections comprising two orthogonal and movable pairs of rods, the angular sections being slidably mounted at the intersections of the rods and the planar sections secured at the mid-points of the rods.

公开(公告)号：GB2035680A

公开(公告)日：1980-06-18

申请号：GB7936795

申请日：1979-10-23

Applicant: CONTROL DATA CORP

IPC: H01J3/18 ,  H01J9/02 ,  H01J29/18 ,  H01J3/12 ,  H01J29/46 ,  H01J29/62 ,  H01J29/74 ,  H01J29/80 ,  H01J3/30

Abstract: A combined fine focusing micro lens array and micro deflector assembly for use in electron beam tubes of the fly's eye type is provided. The assembly comprises a fine focusing micro lens array sub-assembly formed from a plurality of spaced-apart stacked parallel thin planar apertured silicon semiconductor lens plates each having an array of micro lens aperture openings. The lens plates each have highly conductive surfaces and are secured to glass rods for holding the plates in stacked parallel spaced-apart relationship with the apertures axially aligned in parallel. A micro deflector assembly is adjacent to the micro lens array sub-assembly. A micro deflector element axially aligned with each respective fine focusing lens element serves for deflecting an electron beam passing through along orthogonal x-y directional axes of movement normal to the electron beam path. The deflector elements are comprised by two orthogonally arrayed sets of parallel spaced-apart deflector bars with alternate bars of each set of deflector bars being interconnected electrically for common connection to a respective source of fine x-y deflection potential. The thin planar apertured silicon lens plates comprising the micro lens array are held together in stacked parallel assembled relationship by spaced-apart glass support rods whose longitudinal axes extend at right angles to the plates and to which the planar silicon lens plates are secured at their periphery. The two orthogonally arrayed sets of parallel spaced-apart deflection bars forming the sets of micro-deflector elements likewise preferably comprise parallel plates or bars of polycrystalline silicon having a highly conductive metalized surface. The micro deflector bars likewise are held in assembled spaced-apart parallel relationship by respective sets of spaced-apart parallel supporting glass rods whose longitudinal axes extend in a plane parallel to the plane of the deflector bars but at right angles thereto and to which the ends of the deflector bars are thermally bonded. The fine focusing micro lens array and micro deflector sub-assembly thus comprised, are secured together in assembled relation by additional glass support rods being disposed about the outer peripheries of the micro lens and micro deflector sub-assemblies and being secured thereto by thermal bonding such as by fusion.

公开(公告)号：CA1059656A

公开(公告)日：1979-07-31

申请号：CA245963

申请日：1976-02-17

Applicant: MINNESOTA MINING & MFG

Inventor： RUSCH THOMAS W ,  SIEVERS JERRY A

IPC: G01N23/225 ,  G21K1/087 ,  H01J37/063 ,  H01J37/08 ,  H01J37/26 ,  H05H7/08 ,  H01J33/02 ,  H01J3/12

Abstract: A charged particle beam (e.g., ions or electrons) apparatus including two electrostatic focusing lenses and an electrode having a diameter limiting aperture positioned between the lenses is further provided with two electrode assemblies which interact with an extractor electrode and with a source of charged particles such that the trajectories of the particles in the beam passing through the second of the two assemblies are substantially parallel. This feature and other disclosed improvements facilitate the production of a substantially monoenergetic beam which under a first set of conditions can be focused to provide a small-diameter, spherical-aberration limited beam and which under another set of conditions, can be focused to provide a high current beam.