公开(公告)号：CA2962318A1

公开(公告)日：2017-09-29

申请号：CA2962318

申请日：2017-03-28

Applicant: SILCOTEK CORP

Inventor： SMITH DAVID A

IPC: C23C8/28 ,  C10G75/04 ,  C22C19/05 ,  C22C21/00 ,  C22C38/18 ,  C22C38/22 ,  C23F14/02 ,  F16L58/04 ,  F28F19/02

Abstract: Treated articles and a process of producing the treated articles, systems having treated articles, and processes incorporating treated articles are disclosed. The treated articles include a metal or metallic substrate, and a surface treatment of the metal or metallic substrate, the surface treatment having fluorine, silicon, and carbon. The systems include a flow path, with the surface treatment being within the flow path. The processes include flowing a fluid through the flow path.

公开(公告)号：SG10201506694QA

公开(公告)日：2016-04-28

申请号：SG10201506694Q

申请日：2015-08-24

Applicant: SILCOTEK CORP

Inventor： MIN YUAN ,  DAVID A SMITH ,  PAUL H SILVIS ,  JAMES B MATTZELA

公开(公告)号：MX2017004045A

公开(公告)日：2018-08-20

申请号：MX2017004045

申请日：2017-03-28

Applicant: SILCOTEK CORP

Inventor： DAVID A SMITH

IPC: B05D1/08 ,  B08B17/06

Abstract: Se describen artículos tratados y un proceso para producir los artículos tratados, sistemas que tienen artículos tratados, y procesos que incorporan artículos tratados. Los artículos tratados incluyen un metal o sustrato metálico, y un tratamiento de superficie del metal o sustrato metálico, el tratamiento de superficie que tiene flúor, silicio, y carbono. Los sistemas incluyen una trayectoria de flujo, con el tratamiento de superficie estando dentro de la trayectoria de flujo. Los procesos incluyen hacer fluir un fluido a través de la trayectoria de flujo.

公开(公告)号：SG10201700441SA

公开(公告)日：2017-08-30

申请号：SG10201700441S

申请日：2017-01-19

Applicant: SILCOTEK CORP

Inventor： THOMAS F VEZZA ,  STEVEN A CONDO ,  NICHOLAS PETER DESKEVICH ,  JAMES B MATTZELA ,  PAUL H SILVIS

Abstract: Thermal chemical vapor deposition coated articles and thermal chemical vapor deposition processes are disclosed. The article includes a substrate and a thermal chemical vapor deposition coating on the substrate. The thermal chemical vapor deposition coating includes properties from being produced by diffusion-rate-limited thermal chemical vapor deposition. The thermal chemical vapor deposition process includes introducing a gaseous species to a vessel and producing a thermal chemical vapor deposition coating on an article within the vessel by a diffusion-rate-limited reaction of the gaseous species.

公开(公告)号：SG10201506020UA

公开(公告)日：2016-03-30

申请号：SG10201506020U

申请日：2015-07-31

Applicant: SILCOTEK CORP

Inventor： NICHOLAS PETER DESKEVICH ,  WILLIAM DAVID GROVE

Abstract: A chemical vapor deposition system, method and arrangement of systems are disclosed. The system includes a coating chamber, a fluid introduction system, and an arrangement of radiant heating elements. The coating chamber has an enclosing border extending around a coating region and an access portion positioned in an axial orientation relative to the enclosing border, the coating chamber being in a fixed and horizontal position. The fluid introduction system includes a vacuum pump and a fluid introduction arrangement arranged and disposed to introduce a fluid to the coating chamber for chemical vapor deposition coating of an article in the coating chamber. The arrangement of radiant heating elements is positioned outside of the coating chamber and is thermally connected with the enclosing border of the coating chamber to heat zones within the coating chamber. The method uses the system. The arrangement includes more than one of the chemical vapor deposition systems.

公开(公告)号：AU2010251782B2

公开(公告)日：2011-11-10

申请号：AU2010251782

申请日：2010-12-13

Applicant: SILCOTEK CORP

Inventor： ABBOTT SMITH DAVID

IPC: B01J31/02 ,  B01J15/00 ,  B01J20/10 ,  B32B5/02 ,  B32B9/04 ,  C08L83/05 ,  C23C16/24 ,  C23C16/30 ,  C23C16/42

Abstract: Abstract A process of modifying a solid's surface, comprising a first step of depositing hydrogenated armophous silicon on the surface by thermal decomposition at an elevated 5 temperature of silicon hydride gas to form silane radicals which recombine to coat the surface with hydrogenated armophous silicon. A second step of surface funtionalization of the hydrogenated armophous silicon in the presence of a binding agent including hydrosilylation, disproportionation and radical quenching.

公开(公告)号：US12291778B2

公开(公告)日：2025-05-06

申请号：US18743370

申请日：2024-06-14

Applicant: SILCOTEK CORP.

Inventor： Gary A. Barone

IPC: C23C16/24 ,  C23C16/455 ,  C23C16/04

Abstract: Liquid chromatography systems and liquid chromatography components are disclosed. In an embodiment, a liquid chromatography system includes a liquid chromatography component. The liquid chromatography component includes a substrate and an amorphous coating on the substrate. The amorphous coating has a base layer and a surface layer. The base layer includes carboxysilane.

公开(公告)号：US12037685B2

公开(公告)日：2024-07-16

申请号：US17411545

申请日：2021-08-25

Applicant: SILCOTEK CORP.

Inventor： Gary A. Barone

IPC: C23C16/24 ,  C23C16/455 ,  C23C16/04

CPC classification number: C23C16/45523 ,  C23C16/24 ,  C23C16/045

Abstract: Liquid chromatography systems and liquid chromatography components are disclosed. In an embodiment, a liquid chromatography system includes a liquid chromatography component. The liquid chromatography component includes a substrate and an amorphous coating on the substrate. The amorphous coating has a base layer and a surface layer. The base layer includes carboxysilane.

公开(公告)号：US20240117495A1

公开(公告)日：2024-04-11

申请号：US17768249

申请日：2020-10-13

Applicant: SILCOTEK CORP.

Inventor： Geoffrey K. WHITE ,  Nicholas P. DESKEVICH ,  James B. MATTZELA ,  Gary A. BARONE ,  David A. SMITH ,  Pierre A. LECLAIR ,  Min YUAN ,  Jesse BISCHOF

IPC: C23C16/52 ,  C23C16/44 ,  C23C16/455 ,  C23C16/46

CPC classification number: C23C16/52 ,  C23C16/4404 ,  C23C16/45523 ,  C23C16/46

Abstract: Cold thermal chemical vapor deposition coatings, articles, and processes are disclosed. Specifically, a cold thermal chemical vapor deposition process includes positioning an article, heating a precursor gas to at least a decomposition temperature of the precursor gas to produce a deposition gas, introducing the deposition gas to a coating vessel, and depositing a coating from the deposition gas onto the article within the coating vessel. The article remains at a temperature below the decomposition temperature throughout the introducing and depositing of the deposition gas. The coating on the article has a gradient formed by the depositing of the coating having no flow for a period of time. The coated article includes a thermally-sensitive substrate (the thermally-sensitive substrate capable of being modified by a temperature of 300 degrees Celsius) and a coating the thermally-sensitive substrate.

公开(公告)号：US20230383126A1

公开(公告)日：2023-11-30

申请号：US18331647

申请日：2023-06-08

Applicant: SILCOTEK CORP.

Inventor： David A. SMITH ,  James B. MATTZELA ,  Paul H. SILVIS ,  Gary A. BARONE ,  Martin E. HIGGINS

IPC: C09D5/00 ,  C23C16/30 ,  C23C16/56 ,  C23C16/40 ,  C23C30/00 ,  C23C16/02 ,  C23C16/18

CPC classification number: C09D5/00 ,  C23C16/30 ,  C23C16/56 ,  C23C16/401 ,  Y10T428/31612 ,  C23C16/0272 ,  C23C16/18 ,  Y10T428/265 ,  Y10T428/31663 ,  C23C30/00

Abstract: Amorphous coatings and coated articles having amorphous coatings are disclosed. The amorphous coating comprises a first layer and a second layer, the first layer being proximal to a metal substate compared to the second layer, the second layer being distal from the metal substrate compared to the first layer. The first layer and the second layer comprise carbon, hydrogen, and silicon. The first layer further comprises oxygen.