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Patent Agency Ranking
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公开(公告)号：KR1020070081718A
公开(公告)日：2007-08-17
申请号：KR1020060013887
申请日：2006-02-13
Applicant: 삼성전자주식회사
IPC: H01L21/304
Abstract: An apparatus for cleaning a semiconductor substrate is provided to supply uniformly a cleaning solution onto the entire surface of the substrate by spraying the solution toward the substrate from an upper center portion of the substrate. A cleaning apparatus includes a bath(310) for cleaning a substrate, and a spraying part(330) positioned over the substrate which is located in the bath during the cleaning process, to spray a cleaning solution onto the substrate. The spray part is moved out of the bath by a transfer unit(340), so that a support member holding plural substrates comes in or goes out of the bath. The spray part has supply tubes(332) supplying the cleaning solution, spray tubes(334), and spray nozzles each installed on the spray tubes.
Abstract translation: 提供了一种用于清洁半导体衬底的设备，用于通过从衬底的上部中心部分向衬底喷射溶液来均匀地将清洁溶液提供到衬底的整个表面上。 清洁装置包括用于清洁基底的浴（310）和位于清洁过程中位于浴中的基底上的喷射部分（330），以将清洁溶液喷射到基底上。 通过转移单元（340）将喷射部件移出浴液，从而保持多个基板的支撑部件进入或流出浴室。 喷射部分具有供应清洁溶液的供应管（332），喷射管（334）和各自安装在喷射管上的喷嘴。
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