公开(公告)号：KR1020080040205A

公开(公告)日：2008-05-08

申请号：KR1020060107854

申请日：2006-11-02

Applicant: 삼성전자주식회사

Inventor： 김정민 ,  이승건 ,  박연수 ,  백균탁 ,  송주헌

IPC: H01L21/304

Abstract: A wet station apparatus is provided to enhance efficiency by reducing an exchang time of a wafer supporting unit. A bath(120) is arranged in an inside of a sink(110). A wafer supporting unit is installed in the sink so that a loaded wafer is arranged in the inside of the bath. An alignment member(200) is formed at the sink to guide a coupling position of the wafer supporting unit. The wafer supporting unit includes a loading part, an arm part(132), and a coupling part(133). The wafer is loaded on a groove which is formed in the loading unit. The arm part is extended from both sides of the loading part and is coupled with the sink. The loading part is arranged in the inside of the bath. The coupling part is formed at an end of the arm part.

Abstract translation: 提供湿站装置，以通过减少晶片支撑单元的交换时间来提高效率。 浴槽（120）布置在水槽（110）的内部。 晶片支撑单元安装在接收器中，使得加载的晶片布置在浴槽的内部。 对准构件（200）形成在水槽处以引导晶片支撑单元的联接位置。 晶片支撑单元包括装载部分，臂部分（132）和联接部分（133）。 晶片装载在形成于装载单元中的槽上。 臂部分从装载部分的两侧延伸并与水槽耦合。 装载部分布置在浴缸的内部。 联接部形成在臂部的端部。

公开(公告)号：KR1020070081031A

公开(公告)日：2007-08-14

申请号：KR1020060012737

申请日：2006-02-09

Applicant: 삼성전자주식회사

Inventor： 김정민 ,  이승건 ,  정재흥 ,  최성국 ,  김순오 ,  박연수

IPC: H01L21/304

Abstract: An apparatus for processing a substrate is provided to maximize dry efficiency by injecting dry gas to the upper part and both lateral surfaces of an inner bath. Substrates are received in a process bath(112). A cleaning solution supply part supplies a cleaning solution, positioned in the lower part of the process bath. A gas supply part injects dry gas to the process bath to remove the moisture remaining on the substrate, including a first gas injection part installed in the upper part of the process chamber and a second gas injection part installed in the lateral part of the process chamber. The first gas injection part can include upper nozzles disposed in parallel with the direction crossing the substrates. The upper nozzles include injection holes for vertically injecting the dry gas downward.

Abstract translation: 提供一种用于处理基底的装置，以通过将干燥气体注入内浴的上部和两个侧表面来使干燥效率最大化。 衬底被接收在处理槽（112）中。 清洁溶液供应部件提供位于处理槽下部的清洁溶液。 气体供给部将干燥气体注入到处理槽中以去除残留在基板上的水分，包括安装在处理室的上部的第一气体注入部分和安装在处理室的侧部的第二气体注入部分 。 第一气体注入部分可以包括与穿过基底的方向平行布置的上部喷嘴。 上喷嘴包括用于将干燥气体向下垂直喷射的喷射孔。

公开(公告)号：KR1020070081718A

公开(公告)日：2007-08-17

申请号：KR1020060013887

申请日：2006-02-13

Applicant: 삼성전자주식회사

Inventor： 김순오 ,  이승건 ,  김정민 ,  박연수 ,  조민수

IPC: H01L21/304

Abstract: An apparatus for cleaning a semiconductor substrate is provided to supply uniformly a cleaning solution onto the entire surface of the substrate by spraying the solution toward the substrate from an upper center portion of the substrate. A cleaning apparatus includes a bath(310) for cleaning a substrate, and a spraying part(330) positioned over the substrate which is located in the bath during the cleaning process, to spray a cleaning solution onto the substrate. The spray part is moved out of the bath by a transfer unit(340), so that a support member holding plural substrates comes in or goes out of the bath. The spray part has supply tubes(332) supplying the cleaning solution, spray tubes(334), and spray nozzles each installed on the spray tubes.

Abstract translation: 提供了一种用于清洁半导体衬底的设备，用于通过从衬底的上部中心部分向衬底喷射溶液来均匀地将清洁溶液提供到衬底的整个表面上。 清洁装置包括用于清洁基底的浴（310）和位于清洁过程中位于浴中的基底上的喷射部分（330），以将清洁溶液喷射到基底上。 通过转移单元（340）将喷射部件移出浴液，从而保持多个基板的支撑部件进入或流出浴室。 喷射部分具有供应清洁溶液的供应管（332），喷射管（334）和各自安装在喷射管上的喷嘴。

公开(公告)号：KR1020050115634A

公开(公告)日：2005-12-08

申请号：KR1020040040830

申请日：2004-06-04

Applicant: 삼성전자주식회사

Inventor： 박연수 ,  김종국 ,  정명훈 ,  조영수

IPC: H01L21/205

CPC classification number: C23C16/45523 ,  C23C16/402

Abstract: 본 발명은 생산 수율을 증대 또는 극대화 할 수 있는 플라즈마 강화 화학기상증착설비를 이용한 화학기상증착방법에 관한 것으로, 그의 방법은, 챔버 상하부에 위치되는 각 전극에 고주파 전원를 인가하여 플라즈마 반응으로 웨이퍼 상에 유전막을 형성하는 플라즈마 강화 화학기상증착(PECVD)설비를 이용한 화학기상증착방법에 있어서; 상기 챔버 내에 상기 웨이퍼를 위치시키는 단계; 상기 챔버에 적어도 두 개 이상의 반응가스들을 공급하여 상기 플라즈마 반응으로 상기 웨이퍼 상에 제 1 유전막을 형성하는 단계; 및 상기 플라즈마 반응을 유지하면서 상기 챔버에 공급되는 상기 반응가스들 중 적어도 하나 이상의 반응가스의 공급을 중단하고, 상기 챔버 내로 계속 공급되는 상기 반응가스와 공급이 중단되어 상기 챔버 내에 잔류된 반응가스를 이용하여 상기 제 1 유전막 상에 상기 제 1 유전막보다 밀도가 높은 제 2 유전막을 형성하는 단계를 포함함에 의해 상기 제 2 유전막 상에 미세 입자의 유발을 방지할 수 있기 때문에 생산수율을 향상시킬 수 있다.

公开(公告)号：KR1020070080513A

公开(公告)日：2007-08-10

申请号：KR1020060011877

申请日：2006-02-07

Applicant: 삼성전자주식회사

Inventor： 정재흥 ,  최영철 ,  박연수 ,  송주헌 ,  조민수

IPC: H01L21/02

Abstract: An FOUP(Front Opening Unified Pod) opener is provided to improve the preciseness of door opening/closing processes by driving an opening/closing member using a gear and chain type mechanism. An FOUP opener includes an opening/closing member(110) connected with a door, a transfer screw(124) for moving the opening/closing member, and a driving unit. The driving unit(130) drives the transfer screw. The driving unit is composed of a motor(132), a first gear(134a) rotated by the motor, a second gear, and a chain. The second gear(134b) is connected with the transfer screw. The second gear rotates the transfer screw by using the torque of the first gear. The chain(136) enclose the first and the second gears in order to transfer the torque of the first gear to the second gear.

Abstract translation: 提供了一种FOUP（前开式统一荚）开启装置，通过使用齿轮和链式机构驱动开/关构件来提高门打开/关闭过程的精确度。 FOUP开启器包括与门连接的打开/关闭构件（110），用于移动打开/关闭构件的转印螺钉（124）和驱动单元。 驱动单元（130）驱动转移螺钉。 驱动单元由马达（132），由马达旋转的第一齿轮（134a），第二齿轮和链条构成。 第二齿轮（134b）与转印螺杆连接。 第二齿轮通过使用第一档的扭矩来旋转传递螺杆。 链条（136）围绕第一和第二齿轮，以将第一档位的转矩传递到第二档位。

公开(公告)号：KR1020030020657A

公开(公告)日：2003-03-10

申请号：KR1020010054074

申请日：2001-09-04

Applicant: 삼성전자주식회사

Inventor： 박연수

IPC: H01L21/02

Abstract: PURPOSE: A device for moving storage elevator and a chemical vapor deposition apparatus using this device are provided to lengthen a period of generation of process errors by using a plurality of sealing members. CONSTITUTION: A storage elevator is located in the inside of a load lock chamber(140). An apparatus for shifting the storage elevator is formed with a stage(160), a lift shaft(170), a plurality of sealing members(200), and a driving portion(180). The storage elevator is loaded on the stage(160) located in the inside of the load lock chamber(140). The stage(160) is shifted to an upper portion or a lower portion by the lift shaft(170). The driving portion(180) is connected with one end portion of the lift shaft(170). The sealing members(200) are used for preventing the permeation of particles into the inside of the load lock chamber(140).

Abstract translation: 目的：提供一种用于移动存储电梯的装置和使用该装置的化学气相沉积装置，以通过使用多个密封构件来延长产生过程误差的周期。 构成：存储电梯位于负载锁定室（140）的内部。 用于移动存储电梯的装置形成有台架（160），升降杆（170），多个密封构件（200）和驱动部分（180）。 存储电梯装载在位于负载锁定室（140）内部的平台（160）上。 台架160由提升轴170移动到上部或下部。 驱动部分（180）与提升轴（170）的一个端部连接。 密封构件（200）用于防止颗粒渗透到负载锁定室（140）的内部。