ELECTRODEPOSITION OF CHROMIUM AND ITS ALLOYS

    公开(公告)号:ZA828366B

    公开(公告)日:1983-09-28

    申请号:ZA828366

    申请日:1982-11-15

    Applicant: IBM

    Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

    ELECTRODEPOSITION OF CHROMIUM
    90.
    发明专利

    公开(公告)号:AU9068282A

    公开(公告)日:1983-05-26

    申请号:AU9068282

    申请日:1982-11-18

    Applicant: IBM

    Abstract: A chromium electroplating electrolyte comprising a source of trivalent chromium ions, a complexant, a buffer agent and a sulphur species selected from sulphites and dithionites, the complexant being selected so that the stability constant K1 of the chromium complex as defined herein is in the range 10 M preferably the chromium ions have a molar concentration lower than 0.01M. Complexants within this range include aspartic acid, iminodiacetic acid, nitrilotriacetic acid, 5-sulphosalicylic acid and citric acid.

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