公开(公告)号：JP2014137454A

公开(公告)日：2014-07-28

申请号：JP2013005605

申请日：2013-01-16

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MISHIMA ERI ,  NISHIMURA YUKIO ,  SHIMOKAWA TSUTOMU ,  YASHIRO TAKAO

IPC: G03F7/023 ,  C08F212/14 ,  C08F220/30 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive-type radiation-sensitive resin composition capable of forming a cured film excellent in storage stability and in addition, sufficiently satisfying general characteristics such as sensitivity, developing adhesion, heat resistance, chemical resistance, transmittance and dielectric constant while retaining good surface hardness.SOLUTION: The positive-type radiation-sensitive resin composition comprises: [A] a polymer having a structural unit (I) containing at least one selected from the group comprising groups represented by formula (1) mentioned below and groups represented by formula (2) mentioned below and a structural unit (II) containing a cyclic ether structure or a cyclic carbonate structure; and [B] an acid generator. In the formula (1) mentioned below, Rand Rare each independently a hydrogen atom, a 1-4C alkyl group or a 1-4C fluorinated alkyl group. In the formula (2) mentioned below, Rand Rare each independently a hydrogen atom, a halogen atom, a 1-4C alkyl group or a 1-4C fluorinated alkyl group.

Abstract translation: 要解决的问题：提供能够形成保存稳定性优异的固化膜的正型感光性树脂组合物，另外，充分满足一般特性如感光度，显影粘合性，耐热性，耐化学性，透光率和电介质 常数，同时保持良好的表面硬度。解决方案：正型辐射敏感树脂组合物包含：[A]具有结构单元（I）的聚合物，其含有选自下述式（1）表示的基团中的至少一种 和由下述式（2）表示的基团和含有环醚结构或环状碳酸酯结构的结构单元（II）; 和[B]酸生成剂。 在下述式（1）中，兰德尔芳基各自独立地为氢原子，1-4C烷基或1-4C氟化烷基。 在下述式（2）中，兰德尔芳基各自独立地为氢原子，卤素原子，1-4C烷基或1-4C氟化烷基。

公开(公告)号：JP2012108529A

公开(公告)日：2012-06-07

申请号：JP2012000692

申请日：2012-01-05

Applicant: JSR CORP

Inventor： KAKIZAWA TOMOHIRO ,  NAKAMURA ATSUSHI ,  SHIMOKAWA TSUTOMU ,  TAKAHASHI JUNICHI ,  ABE TAKEYOSHI ,  NAGAI TOMOKI

IPC: G03F7/039 ,  C08F220/18 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a highly practical radiation sensitive resin composition which can simply and efficiently form a finer pattern, and can be applied to a process of manufacturing a semiconductor.SOLUTION: The radiation sensitive resin composition contains (A) a resin having a repeating unit represented by general formula (1), (D) an acid generator, and (E) a photodegradable base represented by general formula (8) (in general formula (1), Rrepresents a hydrogen atom or a methyl group, and Rrepresents a hydrocarbon group, and in the general formula (8), Rto Reach independently represents an alkyl group, an alkoxyl group, a hydroxyl group or a halogen atom, and Zrepresents anion such as OH, R-COOand R-SO).

公开(公告)号：JP2010020204A

公开(公告)日：2010-01-28

申请号：JP2008182270

申请日：2008-07-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SHIMOKAWA TSUTOMU ,  EHATA TAKUMA ,  SAKAI KAORI

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition suitably usable as a chemically amplified resist and excellent in storage stability. SOLUTION: The radiation-sensitive resin composition includes: (A) an acid generator represented by general formula (1-1) or general formula (1-2); (B) an acid diffusion inhibitor represented by general formula (2); and (C) a copolymer. In the general formulae (1-1) and (1-2), R 1 denotes alkyl or the like; M + denotes a monovalent cation; R 1a and R 1b each independently denote an organic group or the like; and Y denotes a divalent organic group or the like. In the general formula (2), R 2 , R 3 and R 4 are alkyl or the like. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供适合用作化学放大抗蚀剂的辐射敏感性树脂组合物，并且具有优异的储存稳定性。 解决方案：辐射敏感性树脂组合物包括：（A）由通式（1-1）或通式（1-2）表示的酸产生剂; （B）由通式（2）表示的酸扩散抑制剂; 和（C）共聚物。 在通式（1-1）和（1-2）中，R“SP”表示烷基等; M 表示一价阳离子; R＆lt; SP＆gt; 1a＆lt; SP＆gt;和R＆lt; SP＆gt; 1b＆lt; / SP＆gt;各自独立地表示有机基团等; Y表示二价有机基团等。 在通式（2）中，R“SP 2”，R“SP 3”和“R 4”是烷基等。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2005306917A

公开(公告)日：2005-11-04

申请号：JP2004122246

申请日：2004-04-16

Applicant: Jsr Corp ,  Jsr株式会社 ,  Univ Kanagawa ,  学校法人神奈川大学

Inventor： NISHIKUBO TATATOMI ,  KUDO HIROTO ,  NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU ,  SUGIE NORIHIKO

IPC: G03F7/039 ,  C08B37/16 ,  C08L5/16 ,  C08L101/00 ,  H01L21/027

CPC classification number: C08G83/007

Abstract: PROBLEM TO BE SOLVED: To obtain a new substance which can be used as an acid-dissociating group-containing polymer having high transparency for radiations such as F2 excimer laser and satisfying basic performances required for resists, and to obtain a radiation-sensitive resin composition using the same.
SOLUTION: The subject polyrotaxane comprises a fluorine-containing cyclodextrin represented by formula (1) and a linear polymer which passes through the cavity of this cyclic compound. The radiation-sensitive resin composition comprises the fluorine-containing cyclodextrin or the polyrotaxane as the acid-dissociating group-containing polymer, and a radiation-sensitive acid-producing agent.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了获得可用作用于诸如F2准分子激光器的辐射具有高透明度的酸解离基团的聚合物并满足抗蚀剂所需的基本性能的新物质，并且获得辐射 - 敏感树脂组合物。 解决方案：本发明聚轮烷包含通式（1）表示的含氟环糊精和通过该环状化合物的空腔的线性聚合物。 辐射敏感性树脂组合物包含作为含酸解离基团的聚合物的含氟环糊精或聚轮烷，以及辐射敏感性的酸产生剂。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005029742A

公开(公告)日：2005-02-03

申请号：JP2003273289

申请日：2003-07-11

Applicant: Jsr Corp ,  Jsr株式会社 ,  Semiconductor Leading Edge Technologies Inc ,  株式会社半導体先端テクノロジーズ

Inventor： CHIBA TAKASHI ,  SHIMOKAWA TSUTOMU ,  HAYASHI AKIHIRO ,  ITANI TOSHIRO ,  MITSUYOSHI YASURO ,  FURUKAWA TAKAMITSU

IPC: G03F7/075 ,  C08G77/24 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new polysiloxane that has high transparency to the radial rays of ≤200 nm wavelength, high resolution and excellent coating properties and is useful as a resin component for resists and bears a fluorine-containing norbornane skeleton and provide a radiation-sensitive resin composition including the same.
SOLUTION: The polysiloxane comprises at least one of structural unit selected from a structural unit represented by formula (I) and a structural unit represented by formula (II) and at least one of structural unit selected from a structural unit represented by formula (III) and a structural unit represented by formula (IV) [wherein X
1 and X
2 are each H, a monovalent (halogenated) hydrocarbon, a halogen atom, or an amino; B is H or F; n and m are each 0 or 1, p is an integer of 1-10]. The radiation-sensitive resin composition includes the polysiloxane and the radiation-sensitive acid generator.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供对波长≤200nm的径向射线具有高透明度的高聚物，高分辨率和优异的涂布性能，并且可用作抗蚀剂和承载含氟降冰片烷骨架的树脂组分 并提供包含其的辐射敏感性树脂组合物。 解决方案：聚硅氧烷包括选自由式（I）表示的结构单元和由式（II）表示的结构单元的结构单元中的至少一种和选自由式 （III）和由式（IV）表示的结构单元[其中X 1 和X 2 分别为H，一价（卤代）烃，卤素原子或 氨基; B为H或F; n和m各自为0或1，p为1-10的整数]。 辐射敏感性树脂组合物包括聚硅氧烷和辐射敏感性酸发生剂。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004220009A

公开(公告)日：2004-08-05

申请号：JP2003426162

申请日：2003-12-24

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA ISAO ,  FUJIWARA KOICHI ,  KOBAYASHI HIDEKAZU ,  SHIMOKAWA TSUTOMU ,  NAKAMURA ATSUSHI ,  YONEDA EIJI ,  O ISAMU

IPC: G03F7/039 ,  C08F220/18 ,  G03F7/033 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition which has high transparency to radiations, and has excellent basic properties as a resist, such as sensitivity, dry etching resistance and pattern shapes, more particularly excellent solubility in a resist solvent and reduces the roughness of pattern side walls after development. SOLUTION: The radiation sensitive resin composition contains an acid dissociative group-containing resin which is insoluble in an alkali or hardly soluble in the alkali and is made easily soluble in the alkali by the effect of an acid and a radiation sensitive acid forming agent. The dissociative group-containing resin includes the recursive unit expressed by formula (1) and the ratio (Mw/Mn) of the weight average molecular weight and number average molecular weight thereof is COPYRIGHT: (C)2004,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种对辐射具有高透明度并且具有优异的抗蚀剂基础性能的敏感性，耐干蚀刻性和图案形状的辐射敏感性树脂组合物，在抗蚀剂溶剂中更特别优异的溶解度 并且在显影后降低图案侧壁的粗糙度。 解决方案：辐射敏感性树脂组合物含有不溶于碱或几乎不溶于碱的含酸解离基团的树脂，并且易于通过酸和辐射敏感的酸形成而易溶于碱 剂。 含离解基团的树脂包括由式（1）表示的递归单元，重均分子量和数均分子量的比（Mw / Mn）<1.5。 版权所有（C）2004，JPO＆NCIPI

公开(公告)号：JP2004210803A

公开(公告)日：2004-07-29

申请号：JP2002354142

申请日：2002-12-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAGAI TOMOKI ,  SHIMIZU DAISUKE ,  SHIMOKAWA TSUTOMU ,  MIYAJIMA FUMINAO ,  MIYAJI MASAAKI

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  H01L21/027

CPC classification number: C08F212/14 ,  C08F220/18 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation-sensitive resin composition which is useful as a chemical amplification type resist sensitive to far ultra-violet rays, has improved dry etching resistance, high resolution and high radiation transmissivity, to provide a copolymer useful as its component and a polymer mixture. SOLUTION: The radiation-sensitive resin composition comprises (A) a polymer component such as a copolymer having a (meth)acrylate repeating unit protected with a cycloalkyl-based acid dissociating group, a hydroxystyrene-based repeating unit and a hydroxystyrene-based repeating unit protected with a specific acid-dissociable group and (B) a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004168748A

公开(公告)日：2004-06-17

申请号：JP2003283561

申请日：2003-07-31

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SUGITA HIKARI ,  KONNO KEIJI ,  TANAKA MASATO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/11 ,  C07C33/38 ,  C07C69/157 ,  C08F12/22 ,  C08F12/32 ,  C08F32/08

Abstract: PROBLEM TO BE SOLVED: To provide an antireflection film forming composition especially high in an antireflection effect and not causing intermixing, to provide a polymer especially useful for the antireflection film forming composition, and to provide an acenaphthylene derivative especially useful as a raw material or an intermediate for the polymer. SOLUTION: The acenaphthylene derivative comprises acetoxymethylacenaphthylene and hydroxymethylacenaphthylene. The polymer has structural units represented by formula (3) (wherein R 1 is a hydrogen atom or a monovalent organic group; and R 2 and R 3 are each a monovalent atom or a monovalent organic group). The antireflection film forming composition contains a polymer having the structural units and/or structural units derived from a styrene or a vinylnaphthalene having a group: -CH 2 OR 4 (wherein R 4 is a hydrogen atom or a monovalent organic group) in a benzene ring and a solvent. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003337417A

公开(公告)日：2003-11-28

申请号：JP2002146290

申请日：2002-05-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  NISHIMURA ISAO ,  KOBAYASHI HIDEKAZU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F220/24 ,  C08F220/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a short-wavelength radiation typified by far UV, excellent in basic physical properties as a resist, such as sensitivity, resolution, dry etching resistance and pattern shape, and ensuring few development defects. SOLUTION: The radiation-sensitive resin composition comprises (A) a resin which becomes alkali-soluble by the action of an acid and is typified by a resin having a repeating unit derived from acrylic acid derivatives substituted by a perfluoroalkyl group in the α-position and typified by 2-methyladamantan-2- yl α-trifluoromethylacrylate and a repeating unit derived from a (meth)acrylic acid derivative having a lactone skeleton in a side chain ester structure and (B) a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：为了提供以远紫外线为代表的短波长辐射具有高透明度的辐射敏感性树脂组合物，作为抗蚀剂的基本物理性能优异，例如灵敏度，分辨率，耐干蚀刻性和图案 形状，确保少量开发缺陷。 解决方案：辐射敏感性树脂组合物包含（A）通过酸的作用变成碱溶性的树脂，并且以具有由在全氟烷基中被全氟烷基取代的丙烯酸衍生物衍生的重复单元的树脂 α-位置，以2-甲基金刚烷-2-基α-三氟甲基丙烯酸酯为代表，衍生自侧链酯结构中具有内酯骨架的（甲基）丙烯酸衍生物的重复单元，（B）辐射敏感性酸产生剂。 版权所有（C）2004，JPO

公开(公告)号：JP2003327560A

公开(公告)日：2003-11-19

申请号：JP2003059443

申请日：2003-03-06

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NAGAI TOMOKI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  C07C69/738 ,  C07C69/76 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new anthracene derivative as an additive for a radiation- sensitive resin composition useful for a chemical amplification resist optimally controlling the radiation transimmisivity and effectively suppressing a change in line breadth of a resist pattern due to fluctuation of film thickness of a resist film without especially deteriorating resolution performances and having excellent compatibility with other components in the composition with low sublimability.
SOLUTION: The anthracene derivative is represented by general formula (1) [wherein, R
1 s denote each a hydroxy group or a 1-20C monovalent organic group; n denotes an integer of 0-9; X denotes a single bond or a 1-12C bivalent organic group; and R
2 denotes a monovalent acid-dissociable group]. The radiation-sensitive resin composition comprises (A) the anthracene derivative, (B) an alkali-insoluble or a sparingly alkali-soluble resin which becomes readily soluble in alkalis in the presence of an acid and (C) a radiation-sensitive acid generator.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：为了提供新的蒽衍生物作为用于化学放大抗蚀剂的辐射敏感性树脂组合物的添加剂，其最佳地控制辐射透射率并且有效地抑制由于波动导致的抗蚀剂图案的线宽的变化 的抗蚀剂膜的膜厚度而没有特别劣化的分辨率性能，并且与低升华性的组合物中的其它组分具有优异的相容性。 解决方案：蒽衍生物由通式（1）表示[其中R 1表示羟基或1-20C单价有机基团; n表示0-9的整数; X表示单键或1-12C二价有机基团; 并且R 2 表示一价酸解离基团]。 辐射敏感性树脂组合物包含（A）蒽衍生物，（B）在酸存在下易溶于碱的碱不溶性或微溶碱性树脂，（C）辐射敏感性酸产生剂 。 版权所有（C）2004，JPO