公开(公告)号：JP2000034470A

公开(公告)日：2000-02-02

申请号：JP20538498

申请日：1998-07-21

Applicant: KAO CORP

Inventor： TAIRA KOJI ,  FUJII SHIGEO ,  OOSHIMA YOSHIAKI

IPC: C09K3/14 ,  B24B37/00 ,  G11B5/84

Abstract: PROBLEM TO BE SOLVED: To obtain an abrasive fluid composition capable of reducing surface roughness, to provide a method for abrading a substrate which can improve the abrading speed and reduce surface roughness without causing defects such as scratches and pits in the surface of the substrate to be abraded, and a method for producing a substrate for precision parts which can prevent the occurrence of scratches and pits. SOLUTION: An abrasive fluid composition comprises at least one member selected from the group consisting of tungstic acid and a tungstate salt, an abrasive material and water. A method for abrading a substrate comprises abrading the substrate with the use of the abrasive fluid composition, and a method for producing a substrate for precision parts comprises the step of abrading the substrate with the use of the abrasive fluid composition.

公开(公告)号：JPH11161941A

公开(公告)日：1999-06-18

申请号：JP32913497

申请日：1997-11-28

Applicant: KAO CORP

Inventor： FUJII SHIGEO ,  SUZUKI KENICHI ,  IGAKI MICHIHITO

IPC: G11B5/706 ,  G11B5/73 ,  G11B5/738 ,  G11B5/704

Abstract: PROBLEM TO BE SOLVED: To provide a magnetic recording medium having good surface smoothness and excellent output (S/N) characteristic and overwrite characteristic. SOLUTION: This magnetic recording medium has a nonmagnetic base and plural layers disposed on this nonmagnetic base. These plural layers include a first magnetic layer disposed as the uppermost layer and a second layer disposed adjacently to this first magnetic layer. Ferromagnetic powder contg. at least rare earths and aluminum is incorporated into the first magnetic layer of the magnetic recording medium described above. In addition, inorg. powder contg. at least the rare earths and aluminum is incorporated into the second layer.

公开(公告)号：JPH09171913A

公开(公告)日：1997-06-30

申请号：JP34873495

申请日：1995-12-18

Applicant: KAO CORP

Inventor： IGAKI MICHIHITO ,  FUJII SHIGEO ,  ICHIKAWA HIROTSUGU ,  KAWABUCHI KENJI

IPC: B22F9/22 ,  B22F1/00 ,  C22C38/00 ,  G11B5/706 ,  H01F1/047

Abstract: PROBLEM TO BE SOLVED: To satisfy static magnetic characteristics and to improve dispersing property, filling property and oxidation resistance by using metal magnetic powder in a needle or spindle shape, wherein Fe is contained by specified weight% or more, a rear earth element is contained within the range of specified weight% with respect to Fe and the contents of S and Cl are decreased to specified ppm or less. SOLUTION: No.3 sodium silicate is added to the slurry of goethite containing Fe by 50wt.% or more at an axial ratio of 10.4, and pH is adjusted. Thus, SiO2 compound is formed on the surface of particles. After the aqueous solution of hydrate of calcium acetate 1 is added, the aqueous solution of the lanthanum acetate is added so that La/Fe becomes 0.1-5weight%. Furthermore, after the aqueous solution of aluminum nitride is dropped, pH is adjusted, and the compound, whose main component is the hydroxide of La and Al, is formed. Washing is performed by ion exchange water until the contents of S and Cl of the slurry become 200ppm or less. The particles of a metal precursor are aligned. After high-temperature treatment, reduction and surface oxidation are performed. Thus, the metal magnetic powder having the excellent static magnetic property and oxidation resistance and the high filling property is obtained.

公开(公告)号：JP2009245580A

公开(公告)日：2009-10-22

申请号：JP2009119022

申请日：2009-05-15

Applicant: Kao Corp ,  花王株式会社

Inventor： FUJII SHIGEO ,  SUENAGA KENICHI

IPC: G11B5/84 ,  B24B37/00 ,  C09K3/14

Abstract: PROBLEM TO BE SOLVED: To provide a polishing liquid composition with which abrasive grains and polishing residues produced during polishing scarcely remain on a polished substrate after the finish of polishing, which has high polishing speed, and with which the smoothness of the substrate is maintained, and to provide a method of manufacturing the substrate for which the polishing liquid composition is used. SOLUTION: The method of manufacturing the substrate for a hard disk has steps to supply the polishing liquid composition comprising an organic nitrogen compound having two or more amino groups and/or imino groups in the molecule, an organic polybasic acid, an abrasive, and water to the substrate, and to polish the substrate by using a polishing pad. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种研磨液组合物，其研磨结束后抛光时的磨粒和抛光残留物几乎不残留在抛光基板上，抛光速度高，并且基板的平滑度 并且提供制造使用了研磨液组合物的基板的方法。 解决方案：制造用于硬盘的基底的方法具有以下步骤：在分子中提供包含具有两个或更多个氨基和/或亚氨基的有机氮化合物的抛光液组合物，有机多元酸，研磨剂 ，和水到基板，并通过使用抛光垫来抛光基板。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009079228A

公开(公告)日：2009-04-16

申请号：JP2008281509

申请日：2008-10-31

Applicant: Kao Corp ,  花王株式会社

Inventor： KITAYAMA HIROAKI ,  FUJII SHIGEO

IPC: C09K3/14 ,  B24B37/00 ,  G11B5/84

Abstract: PROBLEM TO BE SOLVED: To provide: a polishing liquid composition that has high polishing speed and reduces the waviness of a substrate to be polished; a method for reducing the waviness of the substrate to be polished using the polishing liquid composition; and a method for producing a high-quality substrate with reduced waviness using the polishing liquid composition. SOLUTION: The polishing liquid composition comprises α-alumina, intermediate alumina, an oxidizing agent and water. The method for reducing the waviness of the substrate to be polished uses the polishing liquid composition. The method for producing the substrate has a step of polishing the substrate to be polished using the polishing liquid composition. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供：具有高抛光速度并降低待抛光基材波纹的抛光液组合物; 使用研磨液组合物降低待研磨基板波纹的方法; 以及使用研磨液组合物制造具有降低波纹的高质量基材的方法。 解决方案：抛光液组合物包含α-氧化铝，中间氧化铝，氧化剂和水。 用于减少待抛光的基底的波纹的方法使用抛光液组合物。 制造基板的方法具有使用研磨液组合物研磨待研磨基板的工序。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006326760A

公开(公告)日：2006-12-07

申请号：JP2005154486

申请日：2005-05-26

Applicant: Kao Corp ,  花王株式会社

Inventor： SUENAGA KENICHI ,  FUJII SHIGEO

IPC: B24B37/00 ,  B24B37/005 ,  B24B37/20 ,  B24B57/02 ,  H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a processing method of a polishing pad and the polishing pad where the rising time of the polishing speed after changing the polishing pad is short, and the life of the polishing pad is long. SOLUTION: Polishing liquid and the polishing pad are used in the continuous manufacturing method of a substrate. The polishing pad is processed by a preparatory polishing using the polishing liquid A where a supernatant layer of the waste polishing liquid by a standard test becomes 8 to 60 vol.% of the entire waste polishing liquid. Next, the continuous polishing of the substrate is performed by the main polishing using the polishing liquid B where the supernatant layer of the waste polishing liquid by the standard test becomes 0.01 to 5 vol.% of the entire waste polishing liquid. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供在改变抛光垫之后抛光速度的上升时间短的抛光垫和抛光垫的处理方法，并且抛光垫的寿命长。 解决方案：抛光液和抛光垫用于基板的连续制造方法。 抛光垫通过使用抛光液体A进行准备抛光处理，抛光液A通过标准测试将废抛光液的上清液层变成整个废抛光液的8至60体积％。 接下来，通过使用研磨液B进行主抛光来进行基板的连续研磨，抛光液B通过标准试验将废抛光液的上清层变成废弃抛光液的0.01〜5体积％。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005063532A

公开(公告)日：2005-03-10

申请号：JP2003290697

申请日：2003-08-08

Applicant: Kao Corp ,  花王株式会社

Inventor： FUJII SHIGEO ,  KITAYAMA HIROAKI

IPC: B24B37/00 ,  C09K3/14 ,  C09K13/04 ,  G11B5/84

Abstract: PROBLEM TO BE SOLVED: To provide a polishing liquid composition for reducing contamination of a substrate, having high polishing speed and for reducing waviness, to provide a polishing method by which waviness of a substrate to be polished is reduced using the polishing liquid composition, and to provide a manufacturing method for the substrate, using the polishing liquid composition. SOLUTION: The polishing liquid composition for a magnetic disk contains alumina, water, an oxidizing agent and an inorganic acid (A) containing neither phosphorus nor nitrogen. In the polishing method for the substrate to be polished, the polishing liquid composition is used, and the manufacturing method for the substrate has a step of polishing the substrate to be polished by using the polishing liquid composition. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于减少基材的污染的抛光液组合物，具有高的抛光速度和减少波纹，从而提供一种抛光方法，通过该方法，抛光液体的抛光液体的波纹减小 并且提供使用该研磨液组合物的基板的制造方法。 解决方案：用于磁盘的抛光液组合物包含氧化铝，水，氧化剂和不含磷和氮的无机酸（A）。 在研磨用基材的研磨方法中，使用研磨液组合物，基板的制造方法具有使用研磨液组合物研磨待研磨基板的工序。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004204117A

公开(公告)日：2004-07-22

申请号：JP2002376443

申请日：2002-12-26

Applicant: Kao Corp ,  花王株式会社

Inventor： KITAYAMA HIROAKI ,  FUJII SHIGEO

IPC: B24B37/00 ,  C09K3/14 ,  C09K13/04 ,  C09K13/06 ,  G11B5/84

Abstract: PROBLEM TO BE SOLVED: To provide a fine waviness reduction agent which efficiently reduces the fine waviness of a substrate, a polishing fluid composition containing the fine waviness reduction agent, a method of reducing the waviness of a substrate for a precision part by using the polishing fluid composition, and a method for manufacturing a substrate by using the above polishing fluid composition. SOLUTION: The polishing fluid composition for a precision part substrate comprises a fine waviness reduction agent for polishing a precision part substrate composed of a polycarboxylic acid compound having an OH group or an SH group and a total carbon number of 2-15 or its salt, a polishing material, and water. The method of reducing the fine waviness of a precision part substrate uses the polishing fluid composition. The method for manufacturing a substrate comprises a step of polishing a substrate to be polished with the use of the above polishing fluid composition. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004067928A

公开(公告)日：2004-03-04

申请号：JP2002231362

申请日：2002-08-08

Applicant: Kao Corp ,  花王株式会社

Inventor： KITAYAMA HIROAKI ,  HAGIWARA TOSHIYA ,  FUJII SHIGEO

IPC: B24B37/00 ,  C09K3/14 ,  G11B5/84 ,  H01L21/304

Abstract: PROBLEM TO BE SOLVED: To provide a polishing fluid composition which can reduce roll-off, a method for manufacturing a base by using the polishing fluid composition, and a method of reducing the roll-off of the base to be polished by using the above polishing fluid composition. SOLUTION: The polishing fluid composition comprises 0.03-0.5 wt.% organic acid or its salt, a polishing agent, and water, and the surface potential of the polishing agent is -140 to 200 mV. The method for manufacturing the base comprises a step of polishing the base to be polished, and the method of reducing the roll-off of the base to be polished uses the polishing fluid composition. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003041239A

公开(公告)日：2003-02-13

申请号：JP2001226322

申请日：2001-07-26

Applicant: Kao Corp ,  花王株式会社

Inventor： YOSHIDA HIROYUKI ,  FUJII SHIGEO ,  HAGIWARA TOSHIYA

IPC: B24B37/00 ,  B24B53/017 ,  C09K3/14

Abstract: PROBLEM TO BE SOLVED: To provide a grinding liquid composition which can reduce clogging of a grinding pad; a method for reducing clogging of a grinding pad by using the grinding liquid composition; and a method for producing a substrate comprising a process for polishing the substrate by using the grinding liquid composition. SOLUTION: The grinding liquid composition comprises a polishing material and water, wherein the composition has a precipitation index of 80 or more and 100 or less. The method for reducing clogging of a grinding pad comprises using the grinding liquid composition. The method for producing a substrate comprising a process for polishing the substrate comprises using the grinding liquid composition.

Abstract translation: 要解决的问题：提供一种能够减少研磨垫堵塞的研磨液组合物， 通过使用研磨液组合物减少研磨垫堵塞的方法; 以及用于制造基材的方法，包括通过使用研磨液组合物来研磨基材的方法。 解决方案：研磨液组合物包含抛光材料和水，其中组合物的沉淀指数为80以上且100以下。 减少研磨垫堵塞的方法包括使用研磨液组合物。 包括用于研磨基材的方法的基材的制造方法包括使用研磨液组合物。