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公开(公告)号：MY136689A
公开(公告)日：2008-11-28
申请号：MYPI20011882
申请日：2001-04-20
Applicant: KAO CORP
Inventor： HAGIHARA TOSHIYA , FUJII SHIGEO , OSHIMA YOSHIAKI
IPC: C09G1/02
Abstract: A ROLL-OFF REDUCING AGENT COMPRISING ONE OR MORE COMPOUNDS SELECTED FROM THE GROUP CONSISTING OF CARBOXYLIC ACIDS HAVING 2 TO 20 CARBON ATOMS HAVING EITHER OH GROUP OR GROUPS OR SH GROUP OR GROUPS, MONOCARBOXYLIC ACIDS HAVING 1 TO 20 CARBON ATOMS, AND DICARBOXYLIC ACIDS HAVING 2 TO 3 CARBON ATOMS, AND SALTS THEREOF; AND A ROLL-OFF REDUCING AGENT COMPOSITION COMPRISING A ROLL OFF-REDUCING AGENT COMPRISING ONE OR MORE COMPOUNDS SELECTED FROM THE GROUP CONSISTING OF CARBOXYLIC ACIDS HAVING 2 TO 20 CARBON ATOMS HAVING EITHER OH GROUP OR GROUPS OR SH GROUP OR GROUPS, MONOCARBOXYLIC ACIDS HAVING 1 TO 20 CARBON ATOMS, AND DICARBOXYLIC ACIDS HAVING 2 TO 3 CARBON ATOMS, AND SALTS THEREOF; AN ABRASIVE; AND WATER.
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公开(公告)号：GB2403725B
公开(公告)日：2007-10-24
申请号：GB0413699
申请日：2004-06-18
Applicant: KAO CORP
Inventor： FUJII SHIGEO , KITAYAMA HIROAKI
Abstract: A polishing composition containing an alpha-alumina, an intermediate alumina, an oxidizing agent and water; a method for reducing waviness of a substrate to be polished, including the step of applying the polishing composition to the substrate to be polished; and a method for manufacturing a substrate, including the step of polishing a substrate to be polished with the polishing composition. The polishing composition is suitable for polishing substrates for precision parts such as substrates for magnetic recording media for magnetic discs, optical discs, opto-magnetic discs, and the like; photomask substrates; glass for liquid crystals; optical lenses; optical mirrors; optical prisms; and semiconductor substrates.
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公开(公告)号：GB2404921A
公开(公告)日：2005-02-16
申请号：GB0415976
申请日：2004-07-16
Applicant: KAO CORP
Inventor： KITAYAMA HIROAKI , FUJII SHIGEO
Abstract: A polishing composition for a magnetic disk, comprising alumina, water, a peroxide and an organic acid; a polishing process for a substrate to be polished, comprising the step of polishing the substrate to be polished with the polishing composition; and a process for manufacturing a substrate, comprising the step of polishing a substrate to be polished with the polishing composition. The polishing composition can be suitably used for the manufacture of a magnetic disk substrate for high-quality hard disks and the like. The organic acid may be selected from sulphur-containing organic acids, carboxylic acids, and phosphorus containing acids. The polishing composition may further contain an inorganic acid.
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公开(公告)号：GB2403725A
公开(公告)日：2005-01-12
申请号：GB0413699
申请日：2004-06-18
Applicant: KAO CORP
Inventor： FUJII SHIGEO , KITAYAMA HIROAKI
Abstract: A polishing composition containing an a -alumina, an intermediate alumina, an oxidizing agent and water; a method for reducing waviness of a substrate to be polished, including the step of applying the polishing composition to the substrate to be polished; and a method for manufacturing a substrate, including the step of polishing a substrate to be polished with the polishing composition. The polishing composition is suitable for polishing substrates for precision parts such as substrates for magnetic recording media for magnetic discs, optical discs, opto-magnetic discs, and the like; photomask substrates; glass for liquid crystals; optical lenses; optical mirrors; optical prisms; and semiconductor substrates.
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公开(公告)号：GB2393186A
公开(公告)日：2004-03-24
申请号：GB0317225
申请日：2003-07-23
Applicant: KAO CORP
Inventor： KITAYAMA HIROAKI , FUJII SHIGEO , HAGIHARA TOSHIYA
Abstract: A polishing composition comprising 0.03 to 0.5% by weight of an organic acid or a salt thereof, an abrasive and water, wherein the abrasive has a surface potential of from -140 to 200 mV; and a roll-off reducing agent comprising an inorganic compound having a property of controlling a surface potential of an abrasive in a polishing composition, wherein a surface potential of the abrasive in a standard polishing composition is controlled to -110 to 250 mV by the presence of the inorganic compound, wherein the standard polishing composition is prepared which comprises 20 parts by weight of an abrasive, the abrasive being high-purity alumina having Al2O3 purity of 98.0% by weight or more composed of a -type co-random crystal, 1 part by weight of citric acid, 78 parts by weight of water and 1 part by weight of an inorganic compound. The polishing composition or the roll-off reducing agent composition can be favorably used in polishing the substrate for precision parts.
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Patent Agency Ranking
公开(公告)号：MY154309A
公开(公告)日：2015-05-29
申请号：MYPI20064713
申请日：2006-12-19
Applicant: KAO CORP
Inventor： FUJII SHIGEO , SUENAGA KENICHI
IPC: C09C1/68
Abstract: POLISHING CAIPOSITION FOR HARD DISK SUBSTRATE THE PRESENT INVENTION PREFERABLY PROVIDES A POLISHING COMPOSITION FOR A 5 HARD DISK SUBSTRATE, CONTAINING ALUMINUM OXIDE PARTICLES AND WATER, WHEREIN SECONDARY PARTICLES OF THE ALUMINUM OXIDE PARTICLES HAVE A VOLUME-MEDIAN PARTICLE SIZE OF FROM 0.1 TO 0.7 [TM, AND PARTICLES HAVING PARTICLE SIZES OF 1 L.1M OF MORE OF THE ALUMINUM OXIDE PARTICLES ARE CONTAINED IN AN AMOUNT OF 0.2BY WEIGHT OR LESS OF THE POLISHING COMPOSITION; AND A METHOD FOR MANUFACTURING A 10 HARD DISK SUBSTRATE USING THE POLISHING COMPOSITION. BY USING THE POLISHING COMPOSITION AND THE METHOD FOR MANUFACTURING A SUBSTRATE OF THE PRESENT INVENTION, FOR EXAMPLE, A HARD DISK SUBSTRATE SUITABLE FOR HIGH RECORDING DENSITY CAN BE, PROVIDED IN HIGH PRODUCTIVITY. 15 0 V-@
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公开(公告)号：GB2433515B
公开(公告)日：2011-05-04
申请号：GB0625233
申请日：2006-12-18
Applicant: KAO CORP
Inventor： FUJII SHIGEO , SUENAGA KENICHI
Abstract: The present invention preferably provides a polishing composition for a hard disk substrate, containing aluminum oxide particles and water, wherein secondary particles of the aluminum oxide particles have a volume-median particle size of from 0.1 to 0.7 μm, and particles having particle sizes of 1 μm or more of the aluminum oxide particles are contained in an amount of 0.2% by weight or less of the polishing composition; and a method for manufacturing a hard disk substrate using the polishing composition. By using the polishing composition and the method for manufacturing a substrate of the present invention, for example, a hard disk substrate suitable for high recording density can be provided in high productivity.
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公开(公告)号：MY139682A
公开(公告)日：2009-10-30
申请号：MYPI20043151
申请日：2004-08-04
Applicant: KAO CORP
Inventor： FUJII SHIGEO , KITAYAMA HIROAKI
Abstract: A METHOD FOR MANUFACTURING A SUBSTRATE FOR A MAGNETIC DISK, INCLUDING THE STEPS OF (A) POLISHING A SUBSTRATE WITH A POLISHING COMPOSITION A CONTAINING ALUMINA ABRASIVES HAVING AN AVERAGE PARTICLE SIZE OF FROM 0.05 TO 0.5 UM, AND AN OXIDIZING AGENT, AND (B) POLISHING THE SUBSTRATE WITH A POLISHING COMPOSITION B CONTAINING SILICA PARTICLES HAVING AN AVERAGE PARTICLE SIZE OF FROM 0.005 TO 0.1 UM; A SUBSTRATE FOR A MAGNETIC DISK, OBTAINABLE BY THE METHOD FOR MANUFACTURING A SUBSTRATE FOR A MAGNETIC DISK; AND A SUBSTRATE FOR A MAGNETIC DISK HAVING THE FOLLOWING SURFACE PROPERTIES OF A LONG-WAVELENGTH WAVINESS OF 0.05 NM OR MORE AND 0.3 NM OR LESS, AND AN AFM SURFACE ROUGHNESS OF 0.03 NM OR MORE AND 0.2 NM OR LESS. THE SUBSTRATE FOR A MAGNETIC DISK MAY BE SUITABLY USED IN THE MANUFACTURE OF A HARD DISK HAVING A HIGH RECORDING DENSITY. ESPECIALLY, A HARD DISK HAVING A RECORDING DENSITY OF 50 G BITS OR MORE PER SQUARE INCH MAY BE INDUSTRIALLY MANUFACTURED.
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公开(公告)号：MY139590A
公开(公告)日：2009-10-30
申请号：MYPI20043152
申请日：2004-08-04
Applicant: KAO CORP
Inventor： KITAYAMA HIROAKI , FUJII SHIGEO
Abstract: A POLISHING COMPOSITION FOR A MAGNETIC DISK, COMPRISING ALUMINA, WATER, A PEROXIDE AND AN ORGANIC ACID; A POLISHING PROCESS FOR A SUBSTRATE TO BE POLISHED, COMPRISING THE STEP OF POLISHING THE SUBSTRATE TO BE POLISHED WITH THE POLISHING COMPOSITION; AND A PROCESS FOR MANUFACTURING A SUBSTRATE, COMPRISING THE STEP OF POLISHING A SUBSTRATE TO BE POLISHED WITH THE POLISHING COMPOSITION. THE POLISHING COMPOSITION CAN BE SUITABLY USED FOR THE MANUFACTURE OF A MAGNETIC DISK SUBSTRATE FOR HIGH-QUALITY HARD DISKS AND THE LIKE.
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公开(公告)号：GB2421244B
公开(公告)日：2009-03-18
申请号：GB0523438
申请日：2005-11-17
Applicant: KAO CORP
Inventor： FUJII SHIGEO , SUENAGA KENICHI
IPC: C09G1/02 , B24B37/00 , B24B37/005 , B24B57/02 , C09K3/14 , H01L21/304
Abstract: The present invention provides a polishing composition containing an organic nitrogen-containing compound, an organic polybasic acid, an abrasive, and water, wherein the organic nitrogen-containing compound has in the molecule two or more amino groups, two or more imino groups, or one or more amino groups and one or more imino groups; a method for manufacturing a substrate with the polishing composition; and a method for reducing surface stains of a substrate with the polishing composition. The polishing composition can be suitably used, for example, in the manufacturing step for a substrate for a hard disk such as a memory hard disk.
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