Abstract:
The present invention is a method for chemical-mechanical planarization of semiconductor wafers that is highly useful for planarizing stop-on-feature design wafers. Initially, the wafer is positioned against a liquid solution over a planarizing surface of a polishing pad. At least one of the wafer or the pad is moved with respect to the other at a relatively low velocity to maintain a substantially continuous film of liquid solution between the wafer and the pad. The temperature of a pad platen is also controlled to maintain a relatively low temperature of the liquid solution at which the solution is highly selective to a layer of material on the wafer.
Abstract:
The present invention reduces the area on a die required for rows and columns of redundant memory cells by sharing compare circuitry with banks of redundant memory cells based on division of the primary memory array into two or more "planes". Pass gates or multiplexers coupled between at least two banks of fuses and one compare circuit selectively couple the appropriate fuse bank to the compare circuit. Preferably, a bit in the address (e.g., address bit RA9 in a row address word having address bits A0-RA9) is received by and controls the multiplexer to select between the two banks of fuses. Additionally, the planes span blocks of memory in the memory array, where each block is divided by shared sense amplifiers. As a result, while eight lines are coupled to 16 rows or columns, only eight rows or columns will be active at any one time because isolation gates will enable only eight of the 16 rows or columns within two planes of memory. As a result, the present invention saves on the number of lines required to intercouple the compare circuits to the redundant rows/columns.
Abstract:
This invention improves the quality of gate oxide dielectric layers using a two-pronged approach, thus permitting the use of much thinner silicon dioxide gate dielectric layers required for lower-voltage, ultra-dense integrated circuits. In order to eliminate defects caused by imperfections in bulk silicon, an in-situ grown epitaxial layer is formed on active areas following a strip of the pad oxide layer used beneath the silicon nitride islands used for masking during the field oxidation process. By growing an epitaxial silicon layer prior to gate dielectric layer formation, defects in the bulk silicon substrate are covered over and, hence, isolated from the oxide growth step. In order to maintain the integrity of the selective epitaxial growth step, the wafers are maintained in a controlled, oxygen-free environment until the epitaxial growth step is accomplished. In order to eliminate defects caused by a native oxide layer, the wafers are maintained in a controlled, oxygen-free environment until being subjected to elevated temperature in a controlled, oxidizing environment. In one embodiment, the oxidizing environment comprises diatomic oxygen, while in another embodiment, the oxidizing environment comprises diatomic oxygen and ozone.
Abstract:
The present invention is a polishing pad for use in chemical-mechanical planarization of semiconductor wafers, and a method for making the polishing pad. The polishing pad has a body, molecular bonding links, and abrasive particles dispersed substantially uniformly throughout the body. The body is made from a polymeric matrix material and the molecular bonding links are covalently bonded to the matrix material. Substantially all of the abrasive particles are covalently bonded to at least one molecular bonding link. The molecular bonding links securely affix the abrasive particles to the matrix material to enhance the uniformity of the distribution of the abrasive particles throughout the pad and to substantially prevent the abrasive particles from breaking away from the pad.
Abstract:
Optical alignment techniques, such as those used in "flip chip" bonding, are used to establish ohmic contact with die (24) by means of raised portions on contact members (20). This permits accurate alignment with a temporary die fixture (10) in order to test the die (24). The tested die (24) can then be qualified under a known good die program as having an acceptable degree of reliability. This permits the die (24) to be characterized prior to assembly, so that the die (24) may then be transferred in an unpackaged form. This ohmic contact is preferably established by applying a compression force to the die (24) using an interconnect insert (14) resulting in a limited penetration of the contact member (20) into the bondpads (22). The arrangement may be used for establishing electrical contact with a burn-in oven.
Abstract:
A memory circuit is described which includes memory cells for storing data. The memory circuit can be read from or written to by an external system such as a microprocessor or core logic chip set. The microprocessor provides memory cell address data to the memory circuit and can request that data be output on communication lines for reading therefrom. The memory circuit reduces the time needed to read data stored in the memory by providing a valid output data signal. The valid output data signal indicates that data coupled to the communication lines has stabilized and is therefore valid. Different valid output data signals and trigger circuits for producing the signals are described.
Abstract:
A circuit regulates a voltage by controlling a voltage generator. A voltage divider is coupled between the regulated voltage (Vint) and a supply voltage (Vdd), and generates a sense voltage. A clamp circuit (22) is coupled to the divider (24), and reduces the sensitivity between the supply voltage (Vdd) and the regulated voltage (Vint) by substantially prohibiting the voltage across itself from exceeding a predetermined value. A detector circuit (38) is coupled between the divider (24) and the voltage generator, and provides a control signal that deactivates the generator when the sense voltage reaches a first predetermined threshold, and activates the generator when the sense voltage reaches a second predetermined threshold.
Abstract:
An ATM switch including a multi-port memory is described. The multi-port memory having a dynamic random access memory (DRAM) and a plurality of input and output serial access memories (SAMs). Efficient, flexible transfer circuits and methods are described for transferring ATM data between the SAMs and the DRAM. The transfer circuits and methods include helper flip/flops to latch ATM data for editing prior to storage in the DRAM. Editing of ATM data transferred from the DRAM is also described. Dynamic parity generation and checking is described to detect errors induced during switching.
Abstract:
A memory device includes an array of randomly addressable registers. Blocks of the addressable registers are addressable by an address for block writing during a block write cycle. The blocks are of the size n, wherein n is the number of bits per plane of memory being written during the block write cycle. The device further includes a sequential counter for incrementing the address by n during burst mode when a block write is performed during a block write cycle to address a next addressable register of the array of randomly addressable registers.