公开(公告)号：JPS61195127A

公开(公告)日：1986-08-29

申请号：JP3453785

申请日：1985-02-25

Applicant: TORAY INDUSTRIES

Inventor： AYA TOSHIHIKO ,  KADOI AKIRA

IPC: C08G73/00 ,  C08G73/14

Abstract: PURPOSE:To provide the titled novel injection-moldable copolymer having high thermal stability as well as fluidity, giving a molded article having high toughness, and containing a specific trifunctional aromatic amide imide unit, a bifunctional aromatic amide and a bifunctional aromatic unit at specific ratios. CONSTITUTION:The objective copolymer composed of (A) the structural unit of formula I (Z is trifunctional aromatic group wherein 2 functional groups in the 3 functional groups are bonded to the adjacent carbon atoms), (B) the structural unit of formula II (Ar is aromatic group; R1 is methyl; b is 0, 1 or 2; X is phenylene, etc.) and (C) the structural unit of formula III, wherein the amount of the component B+C is 1mol per 1mol of the component A, the component C is 0.95-0mol per 0.05-1mol of the component B, the component A is bonded alternately with the component B or component C, and the amount of the bivalent residue of formula V is 0.95-0.30mol per 0.05-0.70mol of the bivalent residue of formula IV. The copolymer can be produced by charging 4,4'-diaminodiphenyl ether and terephthaloyl-m-aminoanilide in a reactor, adding a solvent thereto, cooling the mixture, and reacting with trimellitic anhydride monochloride, etc.

公开(公告)号：JPS60231759A

公开(公告)日：1985-11-18

申请号：JP8609284

申请日：1984-05-01

Applicant: TORAY INDUSTRIES

Inventor： AYA TOSHIHIKO ,  NISHIYA YOSHITAKA

IPC: C08L79/08 ,  C08G73/14

Abstract: PURPOSE:To provide a non-crystalline thermoplastic arom. polyamide-imide resin (PAI) having improved heat distortion temp. and mechanical properties, by blending a heat-resistant polyamide resin with PAI. CONSTITUTION:A resin compsn. consists of 20-97wt% non-crystalline thermoplastic polyamide-imide resin (A) wherein the reside (100mol%) of diamine or diisocyanate is composed of 0-100mol% of a group of formula I, 80-0mol% of a group of formula II and 60-0mol% of a group of formula III, and 80-3wt% heat-resistant polyamide resin (B) wherein 60-100mol% of the residue of diamine or diisocyanate is composed of a group of formula IV or V. In the formulas, R1 is a 1-4C alkyl; R2 is a 1-4C alkyl, halogen; X is -SO2-, -C(O)-, -C(CH3)2-; a is 1-25; b is 0.1-4; c is 0.1-2.

公开(公告)号：JPS60204758A

公开(公告)日：1985-10-16

申请号：JP6074684

申请日：1984-03-30

Applicant: TORAY INDUSTRIES

Inventor： SUEYOSHI TADAHIRO ,  FUSE TATSUJI ,  AYA TOSHIHIKO

IPC: C07D207/452

Abstract: PURPOSE:To purify an aliphatic double bond-containing imide compound containing impurities, particularly an amic acid compound, by separating and removing the impurity from the imide compound with an organic solvent selected from halogenated hydrocarbons, aliphatic esters and aliphatic ketones. CONSTITUTION:A polyamine expressed by the formula R-(NH2)n (R is organic group containing at least 2 carbon atoms; n is an integer >=2), e.g. 4,4'-diaminodiphenylmethane, is reacted with an aliphatic double bond-containing carboxylic acid anhydride or a derivative thereof, e.g. maleic anhydride, in an amount of 0.95mol or more based on 1mol NH2 group in the above-mentioned polyamine to give a crude double bond-containing imide compound, which is then dissolved in a solvent selected from halogenated hydrocarbons, aliphatic esters and aliphatic ketones, preferably methylene chloride, methyl acetate or acetone, to separate and remove insoluble impurities and purify the imide compound.

公开(公告)号：JPS59221329A

公开(公告)日：1984-12-12

申请号：JP9656083

申请日：1983-05-31

Applicant: TORAY INDUSTRIES

Inventor： FUSE TATSUJI ,  KADOI AKIRA ,  SUEYOSHI TADAHIRO ,  AYA TOSHIHIKO

IPC: C08G73/00 ,  C08G73/10 ,  C08G73/12

Abstract: PURPOSE:To obtain the titled prepolymer curable rapidly without foaming, with a single-step reaction, by carrying out the dehydrative imidation of a polyamine with an aliphatic carboxylic acid anhydride having double bond, using a specific imide cyclization agent in the form of a solution in s polar organic solvent. CONSTITUTION:The objective prepolymer can be prepared by the dehydrative imidation of (A) a polyamine of formula R-(NH2)n (R is >=2C organic group; n>=2) (e.g. m-phenylenediamine, 4,4'-diaminodiphenylmethane, etc.) with (B) 0.52-0.95mol, based on 1mol of the NH2 group of said polyamine, of an aliphatic carboxylic acid anhydride containing double bond or its derivative (e.g. maleic anhydride, itaconic anhydride, its halogen-substituted compound, etc.) in a polar solvent in the presence of (C) an oxide of P or S (e.g. P2O5, metaphosphoric acid, etc.) as an imide cyclization agent. In the above process, the imide cyclization agent is used in the form of a 10-50% solution by dissolving in a polar organic solvent (e.g. DMF) prior to the reaction.

公开(公告)号：JPS58167580A

公开(公告)日：1983-10-03

申请号：JP4920382

申请日：1982-03-29

Applicant: TORAY INDUSTRIES

Inventor： AYA TOSHIHIKO ,  NISHIYA YOSHITAKA

IPC: C07D307/89

Abstract: PURPOSE:In the production of the titled compound by reaction of trimellitic anhydride with an excessive amount of a chlorinating agent, a specific compound is made to act on the reaction mixture, before the rectification, to remove by- products, thus giving the titled compound without recrystallization for purification. CONSTITUTION:In the production of trimellitic anhydride monochloride by reaction of trimellitic anhydride with a chlorinating agent, the remaining chlorinating agent is removed, after the acid chloride formation, at least one, as a trichloride reducer, selected from water, organic carboxylic acids such as acetic, propionic or adipic acid, their anhydride and organic sulfonic acids such as methanesulfonic acid or benzenesulfonic acid is used in an adequate amount corresponding the by-product to remove trimellitic trichloride and the resultant product is distilled to separate and collect the objective compound through 4- step process in high purity.

公开(公告)号：JPS57151648A

公开(公告)日：1982-09-18

申请号：JP3529381

申请日：1981-03-13

Applicant: TORAY INDUSTRIES

Inventor： SUZUKI ATSUSHI ,  KUBO YASUSHI ,  AYA TOSHIHIKO

IPC: C08L81/00 ,  C08G73/00 ,  C08G73/10 ,  C08L79/08 ,  C08L81/02

Abstract: PURPOSE:To prepare the titled composition having remarkably improved heat resistance and useful as automobile parts, etc., by compounding a polyarylene sulfide resin with a polyamide-imide resin and fillers. CONSTITUTION:(A) 50-99pts.wt. of a polyarylene sulfide resin having a recurring unit of formula [Ar-S] (Ar is bivalent aromatic group having 6-membered ring) as main structural unit is mixed with (B) 1-50pts.wt. of a heat-resistance improving agent comprising a polyamide-imide resin having the recurring unit of formula (Ar' is trivalent aromatic residue having 6-membered ring; R is bivalent aromatic and/or aliphatic residue; R' is H, methyl or phenyl) as main structural unit (50-100mol%), and if necessary, (C) 0-49pts.wt., of fillers (e.g. abrasion resistance improving agent), under melting and kneading at 250-400 deg.C to obtain 100pts.wt. of the objective resin composition.

公开(公告)号：JPS57151647A

公开(公告)日：1982-09-18

申请号：JP3529281

申请日：1981-03-13

Applicant: TORAY INDUSTRIES

Inventor： SUZUKI ATSUSHI ,  KUBO YASUSHI ,  AYA TOSHIHIKO

IPC: C08L81/00 ,  C08G73/00 ,  C08G73/10 ,  C08L79/08 ,  C08L81/02

Abstract: PURPOSE:To prepare the titled composition having remarkably improved heat resistance and useful as automobile parts, etc., by adding a polyamide-imide resin to a polyarylene sulfide resin containing relatively large amount of fillers. CONSTITUTION:(A) 25-50pts.wt. of a polyarylene sulfide resin having the recurring unit of formula [Ar-S] (Ar is bivalent organic residue having 6-membered ring) as main structural unit, is mixed with (B) 45-70pts.wt. of fillers (e.g. abrasion resistance improving agent, etc.) and (C) 0.1-5pts.wt. of a heat-resistance improving agent comprising a polyamide-imide resin having the recurring unit of formula (Ar' is trivalent aromatic residue having 6-membered ring; R is bivalent aromatic and/or aliphatic residue; R' is H, methyl or phenyl) as the main structural unit (70-100mol%), under melting and kneading at 250-400 deg.C to obtain 100pts.wt. of the objective resin composition.

公开(公告)号：JPS55129421A

公开(公告)日：1980-10-07

申请号：JP3550379

申请日：1979-03-28

Applicant: TORAY INDUSTRIES

Inventor： AYA TOSHIHIKO ,  SASAGAWA KOUJI ,  KADOI AKIRA

IPC: C08G73/00 ,  C08G73/14

Abstract: PURPOSE:To obtain the title polymer having improved thermal stability and high fluidity at high temperatures, polymerizable in a high concentration, and injection- moldable, by reacting an aromatic tricarboxylic acid (or derivative) with a specific aromatic diamine mixture. CONSTITUTION:(A) An aromatic tricarboxylic acid (or derivative), e.g. trimellitic acid anhydride, having two carboxyl groups bonded to the adjacent carbon atoms, is reacted with (B) a mixture of (B1) 5-95mol% of an aromatic diamine of formula I: (a is 0 or 1; b is an integer 1-4; R1 is 1-4C alkyl group; R2 is 1-4C alkyl, halogen, or nitro group) and (B2) 95-5mol% of an aromatic diamine of formula II: (C is an integer 1-25; X is sulfonyl, carbonyl, or isopropylidene group) in the presence of a phosphorus compound, e.g. phosphoric acid, in a polar organic solvent, e.g. N-methyl-2-pyrrolidone, under heating.

公开(公告)号：JPS55118926A

公开(公告)日：1980-09-12

申请号：JP2565479

申请日：1979-03-07

Applicant: TORAY INDUSTRIES

Inventor： KADOI AKIRA ,  AYA TOSHIHIKO

IPC: C08G75/00 ,  C08G75/23 ,  C08L81/00 ,  C08L81/06

Abstract: PURPOSE:To obtain a graft copolymer useful as electrical parts, having inmproved heat resistance, mechanical properties, and flow characteritstics, by polymerizing a polyarylene ether sulfone forming monomer in the presence of an active vinyl polymer having functional groups in the side chain. CONSTITUTION:B) A polyarylene ether sulfone forming monomer (e.g., bisphenol A, 4,4'-dichlorodiphenylsulfone, etc.) is polymerized in the presence of A) an active vinyl polymer or copolymer (e.g., p-chloromethylstyrene copolymer, etc.) having one or more functional groups, e.g., acid halide, acid anhydride, glycidyl, halomethyl, sulfonyl halide group, etc. in the side chain in an aqueous solution of sodium chloride at a temperature from room temperature to 200 deg.C, preferably at 50-160 deg.C to give the desired graft copolymer.

公开(公告)号：JPS5562814A

公开(公告)日：1980-05-12

申请号：JP13572778

申请日：1978-11-06

Applicant: TORAY INDUSTRIES

Inventor： AYA TOSHIHIKO ,  SASAGAWA KOUJI

IPC: C01G51/04

Abstract: PURPOSE:To obtain high purity tricobalt tetroxide with high productivity by reacting an aq. soln. of divalent cobalt salt with an excess of alkali hydroxide after which the resulting cobalt hydroxide is dehydrated, dried, and washed with water by a predetermined method. CONSTITUTION:An aq. soln. of divalent cobalt salt or a slurry of divalent cobalt double salt is reacted with alkali hydroxide in an amt. more than 1.2 times as much as divalent cobalt ions by equivalent to form cobalt hydroxide precipitates. The precipitates are dehydrated, dried, and treated in an aq. system, whereby it is washed with water until the concn. of alkali metal ions in the washing water becomes 200, pref. 100ppm or less. This washed cobalt hydroxide is then dehydrated, dried, and optionally calcined at 300-900, pref. 350-850 deg.C.