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公开(公告)号：US5141786A
公开(公告)日：1992-08-25
申请号：US485954
申请日：1990-02-27
Applicant: Takaaki Shimizu , Masatoshi Takita
Inventor： Takaaki Shimizu , Masatoshi Takita
CPC classification number: C03C3/06 , C03B19/06 , C03B19/066 , C03B19/1065 , C03B19/12 , C03B20/00 , C03C1/006 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/23 , C03C2201/23 , C03C2203/26 , Y10S65/90 , Y10T428/131 , Y10T428/1314
Abstract: A synthetic silica glass article made by hydrolyzing an alkoxysilane and thermally sintering the resulting silica; this synthetic silica glass article has a viscosity of not lower than 10.sup.10 poise at 140.degree. C., and contains, as metallic impurities, less than 1 ppm at Al, less than 0.2 ppm of Fe, less than 0.2 ppm of Na, less than 0.2 ppm of K, less than 0.01 ppm of Li, less than 0.2 ppm of Ca, less than 0.02 ppm of Ti, less than 0.01 ppm of B, less than 0.01 of P, less than 0.01 ppm of As.
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公开(公告)号：US5106402A
公开(公告)日：1992-04-21
申请号：US590431
申请日：1990-09-27
Applicant: Peter E. E. Geittner , Hans-Jurgen E. Hagemann , Hans-Jurgen Lydtin
Inventor： Peter E. E. Geittner , Hans-Jurgen E. Hagemann , Hans-Jurgen Lydtin
IPC: G02B6/00 , C03B37/012 , C03B37/018
CPC classification number: C03B37/018 , C03B37/01211 , C03B2201/03 , C03B2201/04 , C03B2203/24
Abstract: In the manufacture of preforms for optical fibres, the materials of the core (.alpha.) and of the light-conducting cladding layer (.beta..sub.1) are previously deposited from the gaseous phase. Deposition time is here considerably reduced in that only the materials of the core (.alpha.) and a part of the light-conducting cladding layer (.beta..sub.1) are deposited from the gaseous phase and the remaining light-conducting cladding material (.beta..sub.2 +.beta..sub.3) is supplied as pre-formed tubes of cladding material.
Abstract translation: 在制造光纤预成型件时，预先从气相沉积芯（α）和导光包层（β1）的材料。 在这里沉积时间显着减少，因为只有芯（α）的材料和导光包层（β1）的一部分从气相和剩余的导光包层材料（β2+β 3）作为预成型的包层材料管提供。
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83.发明申请FUSED QUARTZ TUBING FOR PHARMACEUTICAL PACKAGING AND METHODS FOR MAKING THE SAME 审中-公开用于药物包装的熔融石墨管及其制造方法公开(公告)号：US20150218047A1
公开(公告)日：2015-08-06
申请号：US14174439
申请日：2014-02-06
Applicant: Guangjun Xu , Robert Koch
Inventor： Guangjun Xu , Robert Koch
CPC classification number: C03B20/00 , C03B17/04 , C03B32/00 , C03B2201/03 , C03B2201/30 , C03C3/06 , C03C23/0075 , C03C2201/02 , C03C2201/30 , C03C2203/10 , C03C2203/52
Abstract: A method for forming high purity silica articles. The high purity silica articles can be particularly suitable for forming packaging such as packaging for pharmaceutical applications. The method for forming high purity silica articles can comprise, in one embodiment, (a) forming a fused quartz melt from a SiO2 raw material; (b) forming a quartz tube from the fused quartz melt; (c) treating the quartz tube with an acid composition; (d) heat treating the quartz tube subsequent to treating with the acid composition; and (e) optionally treating the quartz article with an acid composition subsequent to the heat treating operation. The method can enhance the purity of silica glass articles and products made therefrom.
Abstract translation: 一种形成高纯度二氧化硅制品的方法。 高纯度二氧化硅制品可以特别适用于形成用于制药应用的包装的包装。 在一个实施方案中，形成高纯度二氧化硅制品的方法可以包括（a）从SiO 2原料形成熔融石英熔体; （b）从熔融石英熔体形成石英管; （c）用酸组合物处理石英管; （d）用酸组合物处理之后对石英管进行热处理; 和（e）任选地在热处理操作之后用酸组合物处理石英制品。 该方法可以提高石英玻璃制品的纯度和由其制成的产品。
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公开(公告)号：US20150059407A1
公开(公告)日：2015-03-05
申请号：US14390991
申请日：2013-03-20
Applicant: Heraeus Quarzglas GmbH & Co KG
Inventor： Walter Lehmann , Thomas Kayser
CPC classification number: C03B20/00 , C03B19/095 , C03B19/1005 , C03B19/107 , C03B19/1095 , C03B2201/02 , C03B2201/03 , C03C23/0075
Abstract: The production of quartz glass granules comprises the granulation of pyrogenically produced silicic acid and the formation of a SiO2 granulate (9), the drying and cleaning of the SiO2 granulate (9) by heating in an atmosphere containing halogen, and the vitrification of the SiO2 granulate (9) under a treatment gas which contains at least 30% by volume of helium and/or hydrogen. This process is time-consuming and expensive. In order to provide a method which, starting from a porous SiO2 granulate (9), allows the cost-effective production of dense, synthetic quartz glass granules suitable for melting bubble-free components of quartz glass, the invention proposes that the cleaning and vitrification of the SiO2 granulate (9) and a post-treatment of the vitrified quartz glass granules are carried out in each case in a rotary tube (6) of a rotary kiln (1), said rotary tube rotating about a central axis (7), wherein the rotary tube (6) comprises an inner wall made of a ceramic material during vitrification, and wherein the vitrified quartz glass granules are subjected to a post-treatment during a treatment period of at least 10 minutes in an atmosphere which contains less than 20% of helium or hydrogen at a treatment temperature of 300° C. or more.
Abstract translation: 石英玻璃颗粒的生产包括热解产生的硅酸的成粒和SiO 2颗粒的形成（9），通过在含卤素的气氛中加热来干燥和清洁SiO 2颗粒（9），并且SiO 2的玻璃化 颗粒（9）在含有至少30体积％的氦和/或氢气的处理气体下。 这个过程是耗时且昂贵的。 为了提供从多孔SiO 2颗粒（9）开始的方法，可以成本有效地生产适合于熔化石英玻璃的无气泡组分的致密合成石英玻璃颗粒，本发明提出了清洁和玻璃化 的二氧化硅颗粒（9）的后处理和玻璃化的石英玻璃颗粒的后处理在每种情况下在旋转窑（1）的旋转管（6）中进行，所述旋转管围绕中心轴线（7）旋转， 其中旋转管（6）在玻璃化期间包括由陶瓷材料制成的内壁，并且其中所述玻璃化石英玻璃颗粒在至少10分钟的处理期间在包含小于 在300℃或更高的处理温度下，20％的氦气或氢气。
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公开(公告)号：US08541326B2
公开(公告)日：2013-09-24
申请号：US13459624
申请日：2012-04-30
Applicant: Ryusuke Morita , Takuya Nakagawa , Kei Iwata , Masaaki Takata
Inventor： Ryusuke Morita , Takuya Nakagawa , Kei Iwata , Masaaki Takata
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03C4/0085 , C03C2201/21 , C03C2201/23 , G03F1/50 , G03F7/70958 , Y02P40/57
Abstract: The present invention relates to an optical member for deep ultraviolet having a wavelength of 250 nm or shorter, containing a synthetic silica glass which does not substantially contain a halogen element, has a maximum OH group content of less than 10 ppm by weight, has contents of ODC (oxygen deficient centers) and E-prime center of each less than 1×1014 cm−3, does not substantially contain SiH and peroxy linkage, and has a fictive temperature of 1,050° C. or lower.
Abstract translation: 本发明涉及一种波长为250nm以下的深紫外线用光学构件，其含有基本上不含卤素元素的合成石英玻璃，其OH基含量的最大值小于10重量ppm，含有 的ODC（缺氧中心）和E-prime中心各自小于1×1014cm-3，基本上不含有SiH和过氧键，并且具有1050℃或更低的假想温度。
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Patent Agency Ranking
公开(公告)号：US08539793B2
公开(公告)日：2013-09-24
申请号：US13567837
申请日：2012-08-06
Applicant: Masafumi Mizuguchi , Tetsuya Abe
Inventor： Masafumi Mizuguchi , Tetsuya Abe
CPC classification number: G01N21/64 , C03B11/08 , C03B23/0013 , C03B40/02 , C03B2201/03 , C03C3/06 , C03C23/0075 , C03C2201/32 , C03C2201/40 , C03C2203/52 , G01N21/6402 , Y02P40/57
Abstract: A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method including: washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm2 or less; heating high purity carbon powders with a content of copper and aluminium; heating the mold at a temperature condition of 1700° C. to 1900° C.; applying the powders before accommodating the block in the mold; and molding the block in a predetermined form by pressing the block while heating within a hold temperature range of 1500° C. to 1700° C., after accommodating the washed block in the mold.
Abstract translation: 一种合成石英玻璃成型体的成型体，其通过将合成石英玻璃块容纳在具有按压部的模具中，并且在加热的同时加压块而成型，其特征在于，包括：洗涤合成石英玻璃块，使铜 存在于合成石英玻璃块的表面上的浓度为2ng / cm 2以下; 加热含有铜和铝的高纯度碳粉; 在1700℃至1900℃的温度条件下加热模具。 在将块容纳在模具中之前施加粉末; 并且在将洗涤的块体容纳在模具中之后，在1500℃至1700℃的保持温度范围内加热的同时通过压制块将模块成型为预定形式。
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公开(公告)号：US20120297833A1
公开(公告)日：2012-11-29
申请号：US13567837
申请日：2012-08-06
Applicant: Masafumi MIZUGUCHI , Tetsuya Abe
Inventor： Masafumi MIZUGUCHI , Tetsuya Abe
IPC: C03B11/12
CPC classification number: G01N21/64 , C03B11/08 , C03B23/0013 , C03B40/02 , C03B2201/03 , C03C3/06 , C03C23/0075 , C03C2201/32 , C03C2201/40 , C03C2203/52 , G01N21/6402 , Y02P40/57
Abstract: A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method including: washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm2 or less; heating high purity carbon powders with a content of copper and aluminium; heating the mold at a temperature condition of 1700° C. to 1900° C.; applying the powders before accommodating the block in the mold; and molding the block in a predetermined form by pressing the block while heating within a hold temperature range of 1500° C. to 1700° C., after accommodating the washed block in the mold.
Abstract translation: 一种合成石英玻璃成型体的成型体，其通过将合成石英玻璃块容纳在具有按压部的模具中，并且在加热的同时加压块而成型，其特征在于，包括：洗涤合成石英玻璃块，使铜 存在于合成石英玻璃块的表面上的浓度为2ng / cm 2以下; 加热含有铜和铝的高纯度碳粉; 在1700℃至1900℃的温度条件下加热模具。 在将块容纳在模具中之前施加粉末; 并且在将洗涤的块体容纳在模具中之后，在1500℃至1700℃的保持温度范围内加热的同时通过压制块将模块成型为预定形式。
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公开(公告)号：US08230702B2
公开(公告)日：2012-07-31
申请号：US13113498
申请日：2011-05-23
Applicant: Guangjun Xu , Larry Zeng , Ivo Flammer , Dennis Robert Simons , Cedric Gonnet , Rob Hubertus Matheus Deckers
Inventor： Guangjun Xu , Larry Zeng , Ivo Flammer , Dennis Robert Simons , Cedric Gonnet , Rob Hubertus Matheus Deckers
IPC: C03B37/012
CPC classification number: C03B37/01876 , C03B32/00 , C03B37/01892 , C03B2201/03 , C03C3/06 , C03C2203/52 , Y02P40/57
Abstract: Disclosed is a method of heat treating quartz glass deposition tubes at between 900° C. and 1200° C. for at least 115 hours. The resulting deposition tubes are useful in forming optical preforms that can yield optical fibers having reduced added loss.
Abstract translation: 公开了在900℃至1200℃之间对石英玻璃沉积管进行热处理至少115小时的方法。 所得到的沉积管可用于形成光学预成型件，其可以产生具有减小的添加损失的光纤。
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公开(公告)号：US07841211B2
公开(公告)日：2010-11-30
申请号：US10535935
申请日：2003-11-28
Applicant: Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
Inventor： Tatsuhiro Sato , Takahiro Kaitou , Akira Fujinoki , Toshiyuki Kato , Tohru Segawa , Nobumasa Yoshida
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/24 , C03C2201/02 , C03C2201/11 , C03C2201/23 , C03C2201/24 , C03C2201/26
Abstract: First of all, there is provided a production process of a synthetic quartz glass which has less impurity, has a high-temperature viscosity characteristic equal to or more than that of a natural quartz glass, and hardly deforms even in a high-temperature environment, and especially a production process of a highly heat resistant synthetic quartz glass which is free from the generation of bubbles and is dense. Secondly, there is provided a highly heat resistant synthetic quartz glass body which is easily obtained by the production process of the present invention, and especially a transparent or black quartz glass body which is free from the generation of bubbles, is dense, has high infrared absorption rate and emission rate, and has an extremely high effect for preventing diffusion of alkali metal. The process is a process of producing a highly heat resistant quartz glass body having an absorption coefficient at 245 nm of 0.05 cm−1 or more, and the silica porous body was subjected to a reduction treatment, followed by baking, thereby forming a dense glass body.
Abstract translation: 首先，提供了杂质少，具有等于或高于天然石英玻璃的高温粘度特性的合成石英玻璃的制造方法，即使在高温环境下也几乎不变形， 特别是高度耐热的合成石英玻璃的生产过程，其不产生气泡并且致密。 其次，提供了通过本发明的制造方法容易获得的高耐热性合成石英玻璃体，特别是不产生气泡的透明或黑色石英玻璃体，具有高红外 吸收率和排放率，对防止碱金属的扩散具有极高的效果。 该方法是制造吸收系数在245nm为0.05cm -1以上的高耐热性石英玻璃体的工序，对二氧化硅多孔体进行还原处理，然后进行烧成，由此形成致密的玻璃 身体。
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90.发明授权Granules based on pyrogenically prepared silicon dioxide, method for their preparation and use thereof 有权基于热解制备的二氧化硅的颗粒，其制备方法和用途公开(公告)号：US07780937B2
公开(公告)日：2010-08-24
申请号：US11885742
申请日：2006-02-15
Applicant: Jürgen Meyer , Monika Oswald , Klaus Deller
Inventor： Jürgen Meyer , Monika Oswald , Klaus Deller
CPC classification number: C09C1/3036 , C01B33/18 , C01P2006/11 , C01P2006/12 , C01P2006/14 , C01P2006/17 , C01P2006/19 , C03B19/106 , C03B19/108 , C03B2201/03 , Y10T428/2982 , Y10T428/2991 , Y10T428/2993 , Y10T428/2995
Abstract: Granules based on silicon dioxide and having the properties: Average grain size:10 to 120 μm BET surface area:40 to 400 m2/g Pore volume:0.5 to 2.5 ml/g Pore size distribution:less than 5% of the total pore volume exists of pores with a diameter
Abstract translation: 基于二氧化硅的颗粒，具有以下性质：平均粒径：10〜120μmBET表面积：40〜400m2 / g孔体积：0.5〜2.5ml / g孔径分布：小于总孔体积的5％ 存在直径小于5nm的孔，静置中孔和大孔pH值：3.6至8.5抽头密度：220至700g / l它们通过将二氧化硅分散在水中，喷雾干燥，任选地加热和/或硅烷化来制备。 而BET表面积为30〜90m2 / g，DBP指数为80以下，平均聚集面积小于25000nm 2，平均聚集体周长小于1000nm的热解二氧化硅粉末，其中至少 70％的聚集体具有小于1300nm的圆周，或者通过使具有小于30ppb的金属含量的四氯化硅与方法制备具有小于0.2μg/ g的金属含量的高纯度热解法制备的二氧化硅 使用火焰水解。
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