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    Method and apparatus for scanning a laser beam to examine the surface of semiconductor wafer
    83.
    发明公开
    Method and apparatus for scanning a laser beam to examine the surface of semiconductor wafer 失效
    用于通过激光扫描检查半导体晶片的表面的方法和装置。

    公开(公告)号：EP0260522A2

    公开(公告)日：1988-03-23

    申请号：EP87112749.4

    申请日：1987-09-01

    Applicant: KABUSHIKI KAISHA TOSHIBA

    Inventor： Miyoshi, Motosuke c/o Patent Division ,  Okumura, Katsuya c/o Patent Division ,  Ogawa, Shigeru c/o Patent Division

    IPC: G02B21/00 ,  G01N21/88

    CPC classification number: G01N21/9501 ,  G01N2201/1045

    Abstract: An apparatus for scanning a laser beam to examine the surface of a semiconductor wafer comprises a stage (20) onto which a semiconductor wafer (11) is mounted and a laser beam scanning unit (26, 28, 30) for repeat­edly rectilinearly scanning a laser beam in a predeter­mind direction on the semiconductor wafer (11). This scanning apparatus further has a drive unit (22, 24, 33) for rotating the semiconductor wafer (11) and for moving the semiconductor wafer (11) by only a predetermined distance in the predetermined direction every rotation of the wafer. The laser beam scanning unit (26, 28, 30) rectilinearly scans the laser beam at a swing width of a predetermined amount.

    Abstract translation: 用于扫描的激光束来检查半导体晶片的表面的装置，包括其上的半导体晶片（11）安装一个台（20）和激光束扫描单元（26，28，30），用于重复地直线扫描激光 光束在所述半导体晶片（11）上的方向predetermind。 该扫描装置还具有用于将半导体晶片（11）的旋转和用于通过仅一预定距离在所述预定方向上的晶片的每次旋转移动所述半导体晶片（11）的驱动单元（22，24，33）。 的激光束扫描单元（26，28，30）直线地扫描在一个预定量的摆动宽度的激光束。

    Detecting irregularities in a coating on a substrate
    84.
    发明公开
    Detecting irregularities in a coating on a substrate 失效
    检测基材涂层中的不正常现象

    公开(公告)号：EP0083942A3

    公开(公告)日：1984-05-09

    申请号：EP83100170

    申请日：1983-01-11

    Applicant: JAPAN CROWN CORK CO. LTD.

    Inventor： Reich, Frederich R.

    IPC: G01N21/88 ,  G01N21/21 ,  G01N21/49

    CPC classification number: G01N21/88 ,  G01N21/21 ,  G01N2021/8427 ,  G01N2201/1045

    Abstract: Irregularities of a coating on a substrate in which the coating includes optical scattering centers can be detected by irradiating the coating with polarized light and examining light from the coating through a filter which removes light having the same polarization as the initial beam. Light scattered by the optical scattering centers is transmitted through the filter, while specularly reflected light from the top surface of the coating, from the substrate exposed by gaps in the coating, or reflected by alien material on the coating is filtered out. As a result irregularities can be detected as intensity minima of the transmitted radiation.

    Detecting irregularities in a coating on a substrate
    85.
    发明公开
    Detecting irregularities in a coating on a substrate 失效
    方法和装置用于检测在一个基片的涂层不规则性。

    公开(公告)号：EP0083942A2

    公开(公告)日：1983-07-20

    申请号：EP83100170.6

    申请日：1983-01-11

    Applicant: JAPAN CROWN CORK CO. LTD.

    Inventor： Reich, Frederich R.

    IPC: G01N21/88 ,  G01N21/21 ,  G01N21/49

    CPC classification number: G01N21/88 ,  G01N21/21 ,  G01N2021/8427 ,  G01N2201/1045

    Abstract: Irregularities of a coating on a substrate in which the coating includes optical scattering centers can be detected by irradiating the coating with polarized light and examining light from the coating through a filter which removes light having the same polarization as the initial beam. Light scattered by the optical scattering centers is transmitted through the filter, while specularly reflected light from the top surface of the coating, from the substrate exposed by gaps in the coating, or reflected by alien material on the coating is filtered out. As a result irregularities can be detected as intensity minima of the transmitted radiation.

    Surface inspection apparatus
    89.
    发明专利
    Surface inspection apparatus 失效
    表面检查装置

    公开(公告)号：JPS6128846A

    公开(公告)日：1986-02-08

    申请号：JP14861484

    申请日：1984-07-19

    Applicant: Toshiba Corp

    Inventor： OGAWA SHIGERU ,  YAMAJI HIROSHI ,  KANO MASAAKI

    IPC: G01N21/88 ,  G01B11/30 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66

    CPC classification number: G01N21/9501 ,  G01N21/94 ,  G01N2201/065 ,  G01N2201/1045

    Abstract: PURPOSE:To perform the quantitative detection of a flaw at a high speed with high accuracy, by scanning an object to be inspected in a concentric circular pattern and condensing the scattered light thereof by an integrating sphere while comparing the peak value thereof with a specific level at every definite period. CONSTITUTION:An object 8 to be inspected is sucked to the turntable 14 pivotally supported by a bearing body 15 by a sucking part 20 and the table 14 is rotated by a motor 16 while the bearing body 15 is provided so as to be capable of advancing and retracting in the diameter direction by a feed part 18 and a laser beam oscillation part 28 is connected to the integrating sphere 27 arranged in close vicinity to the object 8 to be inspected to make it possible to irradiate the object 8 to be inspected. The scattered reflected light thereof is received by a photoelectric converter 29 to be converted photoelectrically and irradiates the predetermined radius position of the object 8 to be inspected on the rotating table 14 to calculate the average valve VA of the output of the converter 29 at every predetermined rotary angle while a threshold level is set on the basis of this average value VA by CPU40 and compared with the peak value by a peak detection part 33 at every definite period to detect a flaw.

    Abstract translation: 目的：以高精度定量检测缺陷，通过以同心圆形图案扫描被检查物体，并将其散射光与积分球聚焦，同时将其峰值与特定水平进行比较 在每一个确定的时期。 构成：被检查体8被吸引部20吸引到由轴承体15枢转支承的转台14上，并且台14由马达16转动，而轴承体15设置成能够前进 并且通过进给部18在直径方向上缩回，并且激光束振荡部28连接到布置成靠近被检查物体8的积分球27，以使得可以照射被检查物体8。 其散射的反射光被光电转换器29接收以被光电转换，并且在旋转台14上照射待检查对象物8的预定半径位置，以计算每个预定的转换器29的输出的平均阀VA。 旋转角度，同时基于CPU40的该平均值VA设定阈值水平，并且在每个确定的周期与峰值检测部33的峰值进行比较，以检测缺陷。

    Laser scattering defect inspection apparatus and laser scattering defect inspection method
    90.
    发明专利
    Laser scattering defect inspection apparatus and laser scattering defect inspection method 有权

    公开(公告)号：JP5332478B2

    公开(公告)日：2013-11-06

    申请号：JP2008259804

    申请日：2008-10-06

    Applicant: 株式会社Sumco

    Inventor： 栄治 神山 ,  丈弘 常森 ,  一弘 山本 ,  健司 青木

    IPC: G01N21/956

    CPC classification number: G01N21/9501 ,  G01N2201/1045 ,  G01N2201/106

    Abstract: A laser scattering defect inspection system includes: a stage unit that rotates a workpiece W and transports the workpiece W in one direction; a laser light source that emits a laser beam LB toward the workpiece W mounted on the stage unit; an optical deflector that scans the laser beam LB emitted from the laser light source on the workpiece W; an optical detector that detects the laser beam LB scattered from the surface of the workpiece W; a storage unit that stores defect inspection conditions for each inspection step of a manufacturing process of the workpiece W, where the conditions include the rotation speed and the moving speed of the workpiece W by the stage unit, the scan width on the workpiece W and the scan frequency by the optical deflector; and a control unit that reads the defect inspection conditions stored for each inspection step in the storage unit and controls the driving of the stage unit and the optical deflector under the conditions.

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