公开(公告)号：US08317929B2

公开(公告)日：2012-11-27

申请号：US11367693

申请日：2006-03-06

Applicant: Tatyana Victorovna Rakhimova ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Johannes Hubertus Johannes Moors ,  Aleksander Sergeevich Kovalev ,  Dmitriy Victorovich Lopaev

Inventor： Tatyana Victorovna Rakhimova ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Johannes Hubertus Johannes Moors ,  Aleksander Sergeevich Kovalev ,  Dmitriy Victorovich Lopaev

IPC: B08B3/12 ,  B08B6/00 ,  B08B7/00 ,  B08B7/02 ,  C25F1/00 ,  C25F3/30 ,  C25F5/00

CPC classification number: G03F7/70925 ,  G03F7/70933 ,  G21K2201/06

Abstract: A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.

Abstract translation: 用于清洁光刻设备的元件的方法，例如诸如集光镜的光学元件，包括提供含氮的气体; 从至少部分气体产生氮自由基，从而形成含有自由基的气体; 以及将至少部分含自由基的气体提供给所述装置的一个或多个元件。 光刻设备包括源和光学元件，以及布置成产生射频放电的放电发生器。

公开(公告)号：US20120236985A1

公开(公告)日：2012-09-20

申请号：US13514061

申请日：2010-12-03

Applicant: Sebastian Schusser ,  Gereon Vogtmeier

Inventor： Sebastian Schusser ,  Gereon Vogtmeier

IPC: G21K1/06 ,  A61B6/00 ,  A61B6/03 ,  G01N23/04

CPC classification number: G21K1/06 ,  A61B6/484 ,  G21K2201/06 ,  G21K2207/005

Abstract: The present invention relates to X-rayimage acquisition technology in general. Employing phase-contrast imaging for X-rayimage acquisition may significantly enhance the visibility of structures in images acquired. However, phase-contrast information may only be obtainable in a small detector region with subsequent image acquisitions requiring individual phase stepping states to allow reconstruction of an X-ray image. Accordingly, a grating arrangement for phase-contrast imaging is provided which may allow on the fly phase stepping during a field of view scan. According to the present invention a grating arrangement (1) for phase-contrast imaging is provided, comprising a first grating element (8) and a second grating element (10). Each of the first grating element (8) and the second grating element (10) comprises a trench structure. The trench structure comprises at least one trench region (9) and at least one barrier region (3). The at least one trench region (9) and the at least one barrier region (3) are at least locally arranged in parallel. The first grating element (8) and the second grating element (10) are arranged such that the trench structure of the first grating element (8) and the trench structure of the second grating element (10) are non-parallel comprising an angle α.

Abstract translation: 本发明一般涉及X射线图像采集技术。 采用X射线图像采集的相位对比成像可以显着增强获得的图像中结构的可视性。 然而，相位对比度信息只能在小的检测器区域中获得，随后的图像采集需要各个相位步进状态以允许重建X射线图像。 因此，提供了用于相位对比成像的光栅装置，其可以在视野扫描期间在飞行阶段上进行步进。 根据本发明，提供了一种用于相位对比成像的光栅装置（1），包括第一光栅元件（8）和第二光栅元件（10）。 第一光栅元件（8）和第二光栅元件（10）中的每一个包括沟槽结构。 沟槽结构包括至少一个沟槽区（9）和至少一个势垒区（3）。 至少一个沟槽区域（9）和至少一个阻挡区域（3）至少局部地平行布置。 第一光栅元件（8）和第二光栅元件（10）被布置成使得第一光栅元件（8）的沟槽结构和第二光栅元件（10）的沟槽结构不平行，包括角度α 。

公开(公告)号：US20120162627A1

公开(公告)日：2012-06-28

申请号：US13370829

申请日：2012-02-10

Applicant: Damian Fiolka ,  Ralf Stuetzle

Inventor： Damian Fiolka ,  Ralf Stuetzle

IPC: G03B27/72 ,  G02B5/30 ,  G02B5/09

CPC classification number: G03F7/70233 ,  G02B27/0905 ,  G02B27/0977 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70566 ,  G21K1/06 ,  G21K1/16 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/067

Abstract: An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.

Abstract translation: 照明光学单元包括集光镜，其在照明光学单元的操作期间产生施加到第一刻面光学元件的偏振分布。 存在施加具有不同极化的辐射的至少两个第一小面元件。 第一刻面光学元件具有至少一个第一状态，其中第一面元件的反射表面的法向矢量被选择为使得在照明光学单元的操作期间在物场的位置处产生第一预定偏振分布 。

公开(公告)号：US20120050704A1

公开(公告)日：2012-03-01

申请号：US12807165

申请日：2010-08-30

Applicant: Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard A. Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03B27/42 ,  H05G2/00

CPC classification number: G21K1/067 ,  G03F7/70033 ,  G03F7/70166 ,  G21K2201/06 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.

公开(公告)号：US20110268253A1

公开(公告)日：2011-11-03

申请号：US12975135

申请日：2010-12-21

Applicant: Jean-Pierre Brasile

Inventor： Jean-Pierre Brasile

IPC: G21K1/10

CPC classification number: H01J35/08 ,  G21K2201/06 ,  H01J35/28 ,  H01J2235/082 ,  H01J2235/088 ,  H05G2/00

Abstract: A compact device for generating X-rays by scattering includes a means for producing a beam of electrons, which comprises a grid of wires arranged in a useful scattering cone, so that the beam of electrons encounters at least one of the wires of the wire grid.

Abstract translation: 用于通过散射产生X射线的紧凑装置包括用于产生电子束的装置，其包括布置在有用的散射锥体中的电线格栅，使得电子束遇到线栅中的至少一根线 。

公开(公告)号：US20110199600A1

公开(公告)日：2011-08-18

申请号：US13124501

申请日：2009-09-03

Applicant: Wouter Anthon Soer

Inventor： Wouter Anthon Soer

IPC: G03B27/54

CPC classification number: G03F7/70825 ,  G03F7/70175 ,  G21K2201/06

Abstract: A collector assembly includes a first collector mirror for reflecting radiation from a radiation emission point, such as an extreme ultraviolet radiation emission point, to an intermediate focus from where the radiation is used in the lithography apparatus for device manufacture. A second collector mirror, forward of the radiation emission point, collects additional radiation, reflecting it back to a third mirror and from there to the intermediate focus. The mirrors may allow radiation to be collected with high efficiency and without increase in the etendue. The collector assembly may reduce or remove non-uniformity in the collected radiation, for instance arising from obscuration of collected radiation by a laser beam stop used to prevent laser excitation radiation from entering the lithographic apparatus.

Abstract translation: 收集器组件包括用于将来自辐射发射点（例如极紫外辐射发射点）的辐射反射到用于设备制造的光刻设备中的辐射的中间焦点的第一收集器镜。 辐射发射点前方的第二个收集镜收集额外的辐射，将其反射回第三个反射镜并从那里到中间焦点。 反射镜可以允许以高效率收集辐射，而不增加光密度。 收集器组件可以减少或消除收集的辐射中的不均匀性，例如由于用于防止激光激发辐射进入光刻设备的激光束停止而收集的辐射的遮蔽而引起的。

公开(公告)号：US20110158493A1

公开(公告)日：2011-06-30

申请号：US13060112

申请日：2009-10-28

Applicant: Kentaro Nagai ,  Toru Den

Inventor： Kentaro Nagai ,  Toru Den

IPC: G06K9/00

CPC classification number: G06T7/0002 ,  A61B6/4291 ,  A61B6/484 ,  G01J9/02 ,  G01N23/04 ,  G01N23/20075 ,  G01N2223/401 ,  G21K1/06 ,  G21K2201/06 ,  G21K2201/067

Abstract: An analysis method for use in a radiation imaging apparatus employing intensity information of interference fringes of radiation rays that have passed through a detected object includes the steps of generating first phase information of the detected object wrapped into a range of 2π from the intensity information of the interference fringes; generating information on an absorption intensity gradient of the detected object from the intensity information of the interference fringes; generating a weighting function on the basis of an absolute value of a gradient in the information on the absorption intensity gradient; and generating second phase information by unwrapping the first phase information by using the weighting function.

Abstract translation: 一种在使用已经通过检测对象的辐射线的干涉条纹的强度信息的放射线成像装置中的分析方法包括以下步骤：产生被检测物体的第一相位信息，包含在2＆amp; 从干涉条纹的强度信息; 根据干涉条纹的强度信息生成关于被检测物体的吸收强度梯度的信息; 基于关于吸收强度梯度的信息中的梯度的绝对值生成加权函数; 以及通过使用所述加权函数展开所述第一相位信息来产生第二相位信息。

公开(公告)号：US07732793B2

公开(公告)日：2010-06-08

申请号：US11705954

申请日：2007-02-13

Applicant: Alexander I. Ershov ,  William F. Marx ,  Norbert Bowering ,  Bjorn A. M. Hansson ,  Oleh Khodykin ,  Igor V. Fomenkov

Inventor： Alexander I. Ershov ,  William F. Marx ,  Norbert Bowering ,  Bjorn A. M. Hansson ,  Oleh Khodykin ,  Igor V. Fomenkov

IPC: C25F1/00

CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

Abstract translation: 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

公开(公告)号：US07720197B2

公开(公告)日：2010-05-18

申请号：US12130574

申请日：2008-05-30

Applicant: Licai Jiang

Inventor： Licai Jiang

IPC: G21K1/06

CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

Abstract: An x-ray optical system for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic. Accordingly, the system may use a source that has a circular emission profile or a large source to provide increased flux to a sample.

Abstract translation: 一种用于产生高强度X射线束的X射线光学系统。 该系统包括具有通过围绕不同于光学器件的几何对称轴线的旋转轴线旋转限定轮廓而形成的表面的光学元件。 因此，系统可以使用具有圆形发射轮廓或大的源的源来向样品提供增加的通量。

公开(公告)号：US07651270B2

公开(公告)日：2010-01-26

申请号：US11848700

申请日：2007-08-31

Applicant: Bonglea Kim

Inventor： Bonglea Kim

IPC: A61B6/08

CPC classification number: G03F7/7085 ,  G03F7/70008 ,  G21K1/02 ,  G21K2201/06

Abstract: A system for x-ray optical alignment. The system includes an x-ray source, an optic, a collimation element, and alignment sensors. The x-ray source generates an x-ray beam that is directed by the optic at a sample. The collimation element is located between the optic and the sample to define the profile of the x-ray beam. The sensors receive the x-ray beam from the optic and generated signal indicative of the system alignment. The sensors may be located on a surface of the collimation element facing the optic. The inner edge of the sensors may be located at equal intervals radially about the collimation element and may form an aperture having a symmetric shape.

Abstract translation: 一种用于x射线光学对准的系统。 该系统包括X射线源，光学元件，准直元件和对准传感器。 x射线源产生由光学元件在样本处引导的X射线束。 准直元件位于光学元件和样品之间以限定X射线束的轮廓。 传感器从光学器件接收X射线束并产生指示系统对准的信号。 传感器可以位于准直元件面向光学元件的表面上。 传感器的内边缘可以围绕准直元件径向相等的间隔定位并且可以形成具有对称形状的孔。