公开(公告)号：US4315195A

公开(公告)日：1982-02-09

申请号：US147447

申请日：1980-05-07

Applicant: Karl-Georg Redel ,  Gerd Deppisch

Inventor： Karl-Georg Redel ,  Gerd Deppisch

IPC: H01J37/24 ,  H05B7/148 ,  H02H7/20

CPC classification number: H01J37/241

Abstract: A high-voltage power supply for an electron-beam gun with a heatable cathode and an anode and of the type having an electronic switch connected in the current circuit for the cathode and controllable for blocking the current to the cathode, includes an impulse protecting filter connected in the current circuit for the cathode. The filter comprises a capacitor connected in parallel to the cathode, a choke connected in series with the cathode current circuit, a blocking diode and a discharge resistor connected in series therewith, with the diode and resistor connected in parallel with the choke.

Abstract translation: 一种用于具有可加热阴极和阳极的电子束枪的高压电源，并且具有连接在用于阴极的电流电路中并且可控制用于阻断到阴极的电流的电子开关的类型的高压电源包括脉冲保护滤波器 连接在阴极的电流电路中。 滤波器包括与阴极并联连接的电容器，与阴极电流电路串联连接的扼流器，与串联连接的阻塞二极管和放电电阻器，二极管和电阻器与扼流器并联连接。

公开(公告)号：US4199689A

公开(公告)日：1980-04-22

申请号：US971043

申请日：1978-12-19

Applicant: Tadahiro Takigawa

Inventor： Tadahiro Takigawa

IPC: H01J37/24 ,  H01J37/30 ,  H01J37/00

CPC classification number: H01J37/241 ,  H01J37/3007

Abstract: The diameter of an electron beam at a crossover point can be set to a predetermined value by adjusting a heater current through a heater of an electron gun and a voltage between an emitter of the electron gun and wehnelt electrode. The diameter of the electron beam incident onto an object to be exposed can be varied by varying the diameter of the electron beam at the crossover point. This can be done without adjusting an electron beam lens and deflection electrode of an electron beam exposing apparatus. The diameter of the electron beam incident onto an object to be exposed can be set to a predetermined value dependent upon a pattern to be described.

Abstract translation: 通过调节通过电子枪的加热器的加热器电流和电子枪的发射极与电极之间的电压，可以将交叉点处的电子束的直径设定为预定值。 入射到待曝光物体上的电子束的直径可以通过在交叉点处改变电子束的直径来改变。 这可以在不调整电子束曝光装置的电子束透镜和偏转电极的情况下进行。 入射到待曝光物体上的电子束的直径可以根据要描述的图案设定为预定值。

公开(公告)号：US4058697A

公开(公告)日：1977-11-15

申请号：US628891

申请日：1975-11-03

Applicant: Boris Grigorievich Sokolov ,  Georgy Fomich Zaboronok

Inventor： Boris Grigorievich Sokolov ,  Georgy Fomich Zaboronok

IPC: B23K15/02 ,  H01J37/063 ,  H01J37/24

CPC classification number: H01J37/063 ,  B23K15/02 ,  H01J37/241

Abstract: An electron beam unit for heat treatment by the electron bombardment technique wherein the resistor for limiting the discharge current arising in the vacuum chamber between the cathode and the accelerating electrode of the electron beam gun is connected between the positive pole of the power supply and the accelerating electrode, the accelerating electrode being insulated from the material being processed by means of an insulator.

Abstract translation: 一种用于通过电子轰击技术进行热处理的电子束单元，其中用于限制在电子束枪的阴极和加速电极之间的真空室中产生的放电电流的电阻器连接在电源的正极和加速 电极，加速电极通过绝缘体与被加工的材料绝缘。

公开(公告)号：US3938001A

公开(公告)日：1976-02-10

申请号：US445955

申请日：1974-02-26

Applicant: Susumu Ota ,  Ryuzo Aihara

Inventor： Susumu Ota ,  Ryuzo Aihara

IPC: H01J37/073 ,  H01J37/24 ,  H01J37/248 ,  H01J29/70

CPC classification number: H01J37/241 ,  H01J37/073 ,  H01J37/248

Abstract: An electron gun comprising a changeover chamber and changeover circuit between the gun chamber and the insulated cable which connects the power supply circuits to the electrodes which enables adjustment of electrode potentials to accomplish electrode treatment without excessive gun currents.

Abstract translation: 一种电子枪，包括转换室和枪室和绝缘电缆之间的转换电路，其将电源电路连接到电极，其能够调节电极电位以在没有过多的枪电流的情况下实现电极处理。

公开(公告)号：US3909663A

公开(公告)日：1975-09-30

申请号：US47039574

申请日：1974-05-16

Applicant: LEYBOLD HERAEUS VERWALTUNG

Inventor： THOMAS FRIEDRICH WERNER ,  VOCK GERHARD

IPC: G05F1/44 ,  H01J37/24 ,  H05B7/02 ,  B23K15/00

CPC classification number: H01J37/241 ,  G05F1/44

Abstract: An arrangement for regulating the operating parameters of an electron beam generator in which the main cathode is indirectly heated by a directly-heated auxiliary cathode. A regulating circuit connected to the auxiliary cathode has three individual regulators connected in tandem for regulating the auxiliary cathode. Three separate signals corresponding to the accelerating voltage of the auxiliary cathode, the emission current of the auxiliary cathode, and the emission current of the main cathode are applied respectively to the inputs of the three individual regulators in feedback arrangement.

Abstract translation: 用于调节电子束发生器的操作参数的装置，其中主阴极由直接加热的辅助阴极间接加热。 连接到辅助阴极的调节电路具有串联连接用于调节辅助阴极的三个单独调节器。 对应于辅助阴极的加速电压，辅助阴极的发射电流和主阴极的发射电流的三个独立信号分别应用于反馈布置中的三个单独调节器的输入。

公开(公告)号：US3909662A

公开(公告)日：1975-09-30

申请号：US47039474

申请日：1974-05-16

Applicant: LEYBOLD HERAEUS VERWALTUNG

Inventor： THOMAS FRIEDRICH WERNER ,  VOCK GERHARD

IPC: G05F1/44 ,  H01J37/24 ,  H05B7/02 ,  B23K15/00

CPC classification number: G05F1/44 ,  H01J37/241

Abstract: An arrangement for regulating the operating parameters of an electron beam generator in which the main cathode is indirectly heated by a directly-heated auxiliary cathode. A regulating circuit connected to the auxiliary cathode has three individual regulators connected in tandem for regulating the auxiliary cathode. Three separate signals corresponding to the heating current of the auxiliary cathode, the emission current of the auxiliary cathode, and the emission current of the main cathode are applied respectively to the inputs of the three individual regulators in feedback arrangement.

Abstract translation: 用于调节电子束发生器的操作参数的装置，其中主阴极由直接加热的辅助阴极间接加热。 连接到辅助阴极的调节电路具有串联连接用于调节辅助阴极的三个单独调节器。 对应于辅助阴极的加热电流，辅助阴极的发射电流和主阴极的发射电流的三个独立信号分别应用于反馈布置中的三个单独调节器的输入。

公开(公告)号：US3758816A

公开(公告)日：1973-09-11

申请号：US3758816D

申请日：1971-09-17

Applicant: BRUKOVSKY I ,  YAKOVLEV P ,  IVANOVSKY J ,  ZHUKOV V ,  NEKRASOVA L ,  GUTTERMAN K ,  PEROV A

Inventor： BRUKOVSKY I ,  YAKOVLEV P ,  GUTTERMAN K ,  NEKRASOVA L ,  IVANOVSKY J ,  PEROV A ,  ZHUKOV V

IPC: G05F3/04 ,  H01J37/24 ,  H02M7/06 ,  H05B41/16

CPC classification number: G05F3/04 ,  H01J37/241 ,  H02M7/06

Abstract: A power supply of an electron beam unit has switching components and comprises means which enables the power supply to operate both as a current source and as a voltage source, said means being in the form of at least one reactive component connected in the circuit of the power supply by at least one of its switching components.

Abstract translation: 电子束单元的电源具有开关部件，并且包括使得电源能够作为电流源和作为电压源工作的装置，所述装置是至少一个无功部件的形式，其连接在电路 至少其一个开关元件供电。

公开(公告)号：KR1020160006616A

公开(公告)日：2016-01-19

申请号：KR1020150095857

申请日：2015-07-06

Applicant: 스미도모쥬기가이 이온 테크놀로지 가부시키가이샤

Inventor： 가가와다다노부 ,  유미야마도시오 ,  구로세다케시

IPC: H01J37/317 ,  H01J37/24 ,  H01J37/147

CPC classification number: H01J37/241 ,  H01J37/3171

Abstract: 전극장치에인가되는전압의정밀도를높인다. 이온주입장치는, 고전압전원(90)과, 고전압전원(90)의출력전압(HV)을제어하는지령신호를생성하는제어장치(104)와, 출력전압(HV)이인가되는전극장치(80)와, 전극장치(80)에인가되는실전압(HV)을계측하기위한측정장치(120)를구비한다. 제어장치(104)는, 고전압전원(90)에목표전압을출력시키기위한제1 지령신호를생성하는제1 생성부(110)와, 측정장치(120)에의하여계측되는실전압(HV)이목표전압또는목표전압에가까운전압이되도록제1 지령신호를보완하는제2 지령신호를생성하는제2 생성부(112)와, 고전압전원(90)에, 제1 지령신호및 제2 지령신호를합성하여얻어지는합성지령신호를출력하는지령부(114)를포함한다.

Abstract translation: 施加到电极装置的电压的精度增加。 离子注入装置包括：高压电源（90）; 产生用于控制高压电源（90）的高压输出（HVO）的指令信号的控制装置（104）。 所述电极装置（80）接收所述HVO; 以及测量施加到电极装置（80）的高压电阻（HVR）的仪表装置（120）。 控制装置（104）包括：第一生成单元（110），其生成向高压电源（90）输出目标电压的第一命令; 生成用于补偿第一命令信号的第二命令信号以使得由仪表装置（120）测量的HVR更接近目标电压或者成为目标电压的第二代单元（112） 以及通过向高电压电源（90）产生第一和第二命令信号而输出合成指令的指令单元（114）。

公开(公告)号：KR1020080099677A

公开(公告)日：2008-11-13

申请号：KR1020070045536

申请日：2007-05-10

Applicant: 에스케이하이닉스 주식회사

Inventor： 신기수

IPC: H01L21/205 ,  H01L21/3065

CPC classification number: H01L21/02 ,  H01J37/241 ,  H01J37/3244

Abstract: The characteristic deterioration of device can be prevented by removing charges using corona of the substrate surface after the substrate processing process using plasma. Provided is the manufacturing method of the semiconductor device. A step is for loading a substrate within the chamber. A step is for performing the substrate by generating the plasma within the chamber. A step is for generating the corona within the chamber. The photosensitive film removing formed in the substrate surface, or the substrate is washed, or the process of injecting the ion into substrate is performed.

Abstract translation: 在使用等离子体的基板处理工艺之后，可以通过使用基板表面的电晕去除电荷来防止器件的特性劣化。 提供半导体器件的制造方法。 步骤是将衬底装载在腔室内。 步骤是通过在室内产生等离子体来执行衬底。 一个步骤是在室内产生电晕。 在基板表面形成的感光性膜除去或基板被清洗，或者进行将离子注入基板的工序。

公开(公告)号：KR100202968B1

公开(公告)日：1999-06-15

申请号：KR1019980047775

申请日：1998-11-09

Applicant: 후지쯔 가부시끼가이샤

Inventor： 야마다아키오 ,  사고우사토루 ,  와타나베히토시 ,  야마자키사토루 ,  사카모토키이치

IPC: G03F7/20

CPC classification number: G03F7/20 ,  G03F1/20 ,  G03F7/7065 ,  H01J37/241 ,  H01J37/3174