公开(公告)号：WO1997002924A1

公开(公告)日：1997-01-30

申请号：PCT/US1996011356

申请日：1996-07-02

Applicant: COMMERCE, UNITED STATES OF AMERICA, represented by THE SECRETARY U.S. DEPARTMENT OF COMMERCE

Inventor： COMMERCE, UNITED STATES OF AMERICA, represented by THE SECRETARY U.S. DEPARTMENT OF COMMERCE ,  EVANS, Christopher, James ,  PARKS, Robert, Edson

IPC: B24B05/00

CPC classification number: B24B37/26

Abstract: A polishing lap as shown in Figure (5) which is resistant to attack from corrosive and reactive polishing media and which has a surface which is sufficiently resilient to provide good finishes without hindering dimensional controlling and accuracy of the texturing comprises: a lap substrate (1) wherein the surface of the lap substrate (1) has an overall shape and a localized texture; and a replaceable lap film (5) applied to the lap substrate (1) surface and which is deformed to correspond to the localized texture of the lap substrate surface. The polishing lap can be easily reconditioned if contaminated or easily modified for use with different abrasives and polishing media.

Abstract translation: 如图（5）所示的抛光片，其耐腐蚀性和反应性抛光介质的侵蚀，并且具有足够的弹性以提供良好的表面而不妨碍尺寸控制和纹理的精确度的表面包括：搭接衬底（1） ），其中所述搭接基板（1）的表面具有整体形状和局部纹理; 以及施加到搭接基板（1）表面上的可更换的搭接膜（5），并且其变形以对应于搭接基板表面的局部纹理。 如果污染或易于修改以便与不同的研磨剂和抛光介质一起使用，则可以容易地修复抛光圈。