NON-AMINIC PHOTORESIST ADHESION PROMOTERS FOR MICROELECTRONIC APPLICATIONS
    1.
    发明公开
    NON-AMINIC PHOTORESIST ADHESION PROMOTERS FOR MICROELECTRONIC APPLICATIONS 失效
    NICHTAMINISCHE PHOTORESISTE ADHESIONSPROMOTERFÜRMIKROELEKTRONISCHE ANWENDUNGEN

    公开(公告)号:EP0792195A4

    公开(公告)日:1999-05-26

    申请号:EP95941397

    申请日:1995-11-14

    CPC classification number: G03F7/0751 H01L21/312

    Abstract: A method for providing an inorganic substrate having improved adherence for polymeric films is disclosed. The method entails reacting at least one organosilane compound having at least one alkylsilyl moiety therein and at least one hydrolyzable group capable of reacting with the substrate to silylate the substrate. Hydrolyzable by-products from the reaction, if any, have a pH less than or equal to about 7.

    Abstract translation: 公开了一种用于提供具有改进的聚合物膜附着性的无机基材的方法。 该方法需要使至少一种具有至少一个烷基甲硅烷基部分的有机硅烷化合物与至少一种能够与基材反应以使基材甲硅烷基化的至少一种可水解基团反应。 来自反应的可水解的副产物(如果有的话)具有小于或等于约7的pH。

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