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公开(公告)号:IL317634A
公开(公告)日:2025-02-01
申请号:IL31763424
申请日:2024-12-11
Applicant: ASML NETHERLANDS BV , EL GAWHARY OMAR , HELFENSTEIN PATRICK PHILIPP , VAN RIJSWIJK LOES FREDERIQUE , GEYPEN NIELS , JONQUIERE HUGO LAURENT , INVERNIZZI ANDREA , CRAMER HUGO AUGUSTINUS JOSEPH
Inventor: EL GAWHARY OMAR , HELFENSTEIN PATRICK PHILIPP , VAN RIJSWIJK LOES FREDERIQUE , GEYPEN NIELS , JONQUIERE HUGO LAURENT , INVERNIZZI ANDREA , CRAMER HUGO AUGUSTINUS JOSEPH
Abstract: Disclosed is a method of determining at least one parameter of interest relating to a structure formed in at least one respective layer on a substrate, the method comprising: obtaining a measured metrology data relating to a measurement of the structure; obtaining a model, the model describing the structure in terms of a plurality of model parameters, the model parameters comprising estimated values; and performing in sequence a plurality of optimization steps, based on the measured metrology data, to determine the plurality of model parameters, each of the plurality of optimization steps determining a subset of the plurality of model parameters.
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2.
公开(公告)号:IL317119A
公开(公告)日:2025-01-01
申请号:IL31711924
申请日:2024-11-20
Applicant: ASML NETHERLANDS BV , SCHOLZ SANDY CLAUDIA , COENEN TEIS JOHAN , PORTER CHRISTINA LYNN , VAN RIJSWIJK LOES FREDERIQUE , MIDDLEBROOKS SCOTT ANDERSON , HELFENSTEIN PATRICK PHILIPP
Inventor: SCHOLZ SANDY CLAUDIA , COENEN TEIS JOHAN , PORTER CHRISTINA LYNN , VAN RIJSWIJK LOES FREDERIQUE , MIDDLEBROOKS SCOTT ANDERSON , HELFENSTEIN PATRICK PHILIPP
Abstract: Disclosed is a method comprising: obtaining measured data relating to at least one measurement by a measurement apparatus configured to irradiate radiation onto each of one or more structures on a substrate; decomposing the measured data using a decomposition method to obtain multiple measured data components; obtaining simulated data relating to at least one simulation based on the one or more structures; decomposing the simulated data using the decomposition method to obtain multiple simulated data components; matching between at least a portion of the simulated data components and at least a portion of the measured data components; and extracting a feature of the substrate based on the matching of at least a portion of the simulated data components and at least a portion of the measured data components.
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