公开(公告)号：IL317119A

公开(公告)日：2025-01-01

申请号：IL31711924

申请日：2024-11-20

Applicant: ASML NETHERLANDS BV ,  SCHOLZ SANDY CLAUDIA ,  COENEN TEIS JOHAN ,  PORTER CHRISTINA LYNN ,  VAN RIJSWIJK LOES FREDERIQUE ,  MIDDLEBROOKS SCOTT ANDERSON ,  HELFENSTEIN PATRICK PHILIPP

Inventor： SCHOLZ SANDY CLAUDIA ,  COENEN TEIS JOHAN ,  PORTER CHRISTINA LYNN ,  VAN RIJSWIJK LOES FREDERIQUE ,  MIDDLEBROOKS SCOTT ANDERSON ,  HELFENSTEIN PATRICK PHILIPP

Abstract: Disclosed is a method comprising: obtaining measured data relating to at least one measurement by a measurement apparatus configured to irradiate radiation onto each of one or more structures on a substrate; decomposing the measured data using a decomposition method to obtain multiple measured data components; obtaining simulated data relating to at least one simulation based on the one or more structures; decomposing the simulated data using the decomposition method to obtain multiple simulated data components; matching between at least a portion of the simulated data components and at least a portion of the measured data components; and extracting a feature of the substrate based on the matching of at least a portion of the simulated data components and at least a portion of the measured data components.

公开(公告)号：IL316715A

公开(公告)日：2024-12-01

申请号：IL31671524

申请日：2024-10-30

Applicant: ASML NETHERLANDS BV ,  ONOSE ALEXANDRU ,  MIDDLEBROOKS SCOTT ANDERSON ,  VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA ,  BOTARI TIAGO ,  TSIATMAS ANAGNOSTIS

Inventor： ONOSE ALEXANDRU ,  MIDDLEBROOKS SCOTT ANDERSON ,  VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA ,  BOTARI TIAGO ,  TSIATMAS ANAGNOSTIS

IPC: G01N21/88 ,  G06V10/10 ,  G06V10/143 ,  G06V10/147 ,  G06V10/774 ,  G06V10/82 ,  G06V20/60

Abstract: A method is proposed of using low-resolution images of at least one product produced by one or more imaging processes, and imaging models characterizing the imaging processes, to determine values for plurality of numerical parameters which collectively define a product model of the at least one product. The determination of the values is performed by forming a loss function based on the acquired images, the imaging models, and the numerical parameters of the model, and performing a minimization algorithm to minimize the loss function with respect to the numerical parameters. Due to prior knowledge of the product encoded in the loss function, the product model may comprise reconstructed images which have a higher resolution than the low-resolution images.

公开(公告)号：WO2010034427A3

公开(公告)日：2011-03-24

申请号：PCT/EP2009006715

申请日：2009-09-17

Applicant: ASML NETHERLANDS BV ,  MOS EVERHARDUS CORNELIS ,  VAN DER SCHAAR MAURITS ,  MIDDLEBROOKS SCOTT ANDERSON

Inventor： MOS EVERHARDUS CORNELIS ,  VAN DER SCHAAR MAURITS ,  MIDDLEBROOKS SCOTT ANDERSON

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/70525

Abstract: A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate (W). In an embodiment, the scatterometer includes a measurement system (2) arranged to direct a beam of radiation (10) onto a target pattern on said substrate (W) and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement (P4) represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.

Abstract translation: 光刻系统包括光刻设备和散射仪。 在一个实施例中，光刻设备包括布置成照亮图案的照明光学系统和布置成将图案的图像投影到基板（W）上的投影光学系统。 在一个实施例中，散射仪包括测量系统（2），其被布置成将辐射束（10）引导到所述基板（W）上的目标图案上，并且获得代表从目标图案散射的辐射的瞳孔平面的图像 。 计算布置（P4）表示由一对正交基函数计算的瞳孔平面，并将力矩函数与光刻特征参数相关联以构建光刻系统识别。 控制装置使用系统识别来控制由光刻设备执行的后续光刻处理。

公开(公告)号：WO2009127355A1

公开(公告)日：2009-10-22

申请号：PCT/EP2009/002622

申请日：2009-04-08

Applicant: ASML NETHERLANDS B.V. ,  VAN DE KERKHOF, Marcus, Adrianus ,  KIERS, Antoine, Gaston, Marie ,  VAN DER SCHAAR, Maurits ,  VERSTAPPEN, Leonardus, Henricus, Marie ,  MIDDLEBROOKS, Scott, Anderson ,  FUCHS, Andreas

Inventor： VAN DE KERKHOF, Marcus, Adrianus ,  KIERS, Antoine, Gaston, Marie ,  VAN DER SCHAAR, Maurits ,  VERSTAPPEN, Leonardus, Henricus, Marie ,  MIDDLEBROOKS, Scott, Anderson ,  FUCHS, Andreas

IPC: G01B11/06 ,  G01J4/04 ,  G01N21/21 ,  G03F7/20

CPC classification number: G03F7/70616 ,  G01N21/47 ,  G01N21/9501

Abstract: A scatterometer configured to measure a property of a substrate, includes a radiation source configured to provide a radiation beam; and a detector configured to detect a spectrum of the radiation beam reflected from a target (30) on the surface of the substrate (W) and to produce a measurement signal representative of the spectrum. The apparatus includes a beam shaper (51, 53) interposed in the radiation path between the radiation source and the detector, the beam shaper being configured to adjust the cross section of the beam dependent on the shape and/or size of the target.

Abstract translation: 配置成测量衬底性质的散射仪包括被配置为提供辐射束的辐射源; 以及检测器，其被配置为检测从所述基板（W）的表面上的目标（30）反射的所述辐射束的光谱，并产生表示所述光谱的测量信号。 该装置包括插入在辐射源和检测器之间的辐射路径中的光束整形器（51,53），光束整形器被配置为根据目标的形状和/或尺寸来调节光束的横截面。

公开(公告)号：WO2010034427A2

公开(公告)日：2010-04-01

申请号：PCT/EP2009/006715

申请日：2009-09-17

Applicant: ASML NETHERLANDS B.V. ,  MOS, Everhardus, Cornelis ,  VAN DER SCHAAR, Maurits ,  MIDDLEBROOKS, Scott, Anderson

Inventor： MOS, Everhardus, Cornelis ,  VAN DER SCHAAR, Maurits ,  MIDDLEBROOKS, Scott, Anderson

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/70525

Abstract: A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.

Abstract translation: 光刻系统包括光刻设备和散射仪。 在一个实施例中，光刻设备包括布置成照亮图案的照明光学系统和布置成将图案的图像投影到基板上的投影光学系统。 在一个实施例中，散射仪包括测量系统，其布置成将辐射束引导到所述基板上的目标图案上，并且获得代表从目标图案散射的辐射的光瞳平面的图像。 计算装置表示由一对正交基函数计算的瞳孔平面，并将力矩函数与光刻特征参数相关联以构建光刻系统识别。 控制装置使用系统识别来控制由光刻设备执行的后续光刻处理。