Abstract:
Provided are a piezoelectric thin film having good piezoelectricity in which a rhombohedral structure and a tetragonal structure are mixed, and a piezoelectric element using the piezoelectric thin film. The piezoelectric thin film includes a perovskite type metal oxide, in which the perovskite type metal oxide is a mixed crystal system of at least a rhombohedral structure and a tetragonal structure, and a ratio between an a-axis lattice parameter and a c-axis lattice parameter of the tetragonal structure satisfies 1.15=c/a=1.30. The piezoelectric element includes on a substrate: the above-mentioned piezoelectric thin film; and a pair of electrodes provided in contact with the piezoelectric thin film.
Abstract translation:提供一种压电薄膜,其具有混合菱方结构和四边形结构的压电性,以及使用压电薄膜的压电元件。 压电薄膜包括钙钛矿型金属氧化物,其中钙钛矿型金属氧化物是至少具有菱方结构和四方结构的混晶系,以及a轴晶格参数与c轴晶格之比 四方结构的参数满足1.15 = c / a = 1.30。 压电元件包括在基板上:上述压电薄膜; 以及设置成与压电薄膜接触的一对电极。
Abstract:
Provided are a piezoelectric thin film having good piezoelectricity in which a rhombohedral structure and a tetragonal structure are mixed, and a piezoelectric element using the piezoelectric thin film. The piezoelectric thin film includes a perovskite type metal oxide, in which the perovskite type metal oxide is a mixed crystal system of at least a rhombohedral structure and a tetragonal structure, and a ratio between an a-axis lattice parameter and a c-axis lattice parameter of the tetragonal structure satisfies 1.15=c/a=1.30. The piezoelectric element includes on a substrate: the above-mentioned piezoelectric thin film; and a pair of electrodes provided in contact with the piezoelectric thin film.
Abstract translation:提供一种压电薄膜,其具有混合菱方结构和四边形结构的压电性,以及使用压电薄膜的压电元件。 压电薄膜包括钙钛矿型金属氧化物,其中钙钛矿型金属氧化物是至少具有菱方结构和四方结构的混晶系,以及a轴晶格参数与c轴晶格之比 四方结构的参数满足1.15 = c / a = 1.30。 压电元件包括在基板上:上述压电薄膜; 以及设置成与压电薄膜接触的一对电极。
Abstract:
Provided are a piezoelectric thin film having good piezoelectricity in which a rhombohedral structure and a tetragonal structure are mixed, and a piezoelectric element using the piezoelectric thin film. The piezoelectric thin film includes a perovskite type metal oxide, in which the perovskite type metal oxide is a mixed crystal system of at least a rhombohedral structure and a tetragonal structure, and a ratio between an a-axis lattice parameter and a c-axis lattice parameter of the tetragonal structure satisfies 1.15≤c/a≤1.30. The piezoelectric element includes on a substrate: the above-mentioned piezoelectric thin film; and a pair of electrodes provided in contact with the piezoelectric thin film.