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    DEPOSITION DEVICE AND DEPOSITION METHOD
    1.
    发明申请
    DEPOSITION DEVICE AND DEPOSITION METHOD 有权
    沉积装置和沉积方法

    公开(公告)号：US20150118410A1

    公开(公告)日：2015-04-30

    申请号：US14403084

    申请日：2013-05-21

    Applicant: LABOTEC LIMITED

    Inventor： Hirofumi Nakano

    IPC: C23C14/32

    CPC classification number: C23C14/32 ,  C23C14/0605 ,  H01J37/32018 ,  H01J37/32055 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32568 ,  H01J37/32899

    Abstract: A deposition device that deposits material particles includes an ionization section that ionizes the material particles utilizing a photoelectric effect in a reaction chamber to which the material particles are supplied, and an electrode section that guides the ionized material particles to a given area utilizing a Coulomb force.

    Abstract translation: 沉积材料颗粒的沉积装置包括：电离部分，其利用材料颗粒被供应的反应室中的光电效应使材料颗粒电离;以及电极段，其利用库仑力将电离材料颗粒引导到给定区域 。

    DEPOSITION DEVICE AND DEPOSITION METHOD
    3.
    发明公开
    DEPOSITION DEVICE AND DEPOSITION METHOD 有权
    ABSCHEIDUNGSVORRICHTUNG在ABSCHEIDUNGSVERFAHREN

    公开(公告)号：EP2840163A1

    公开(公告)日：2015-02-25

    申请号：EP13819352.9

    申请日：2013-05-21

    Applicant: Labotec Limited

    Inventor： NAKANO, Hirofumi

    IPC: C23C14/32

    CPC classification number: C23C14/32 ,  C23C14/0605 ,  H01J37/32018 ,  H01J37/32055 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32568 ,  H01J37/32899

    Abstract: A deposition device (100) that deposits material particles (P) includes an ionization section (20) that ionizes the material particles (P) utilizing a photoelectric effect in a reaction chamber to which the material particles (P) are supplied, and an electrode section (32, 34) that guides the ionized material particles (P) to a given area utilizing a Coulomb force.

    Abstract translation: 沉积材料颗粒（P）的沉积装置（100）包括在供给材料颗粒（P）的反应室中利用光电效应使材料颗粒（P）离子化的电离部分（20） （32,34），其利用库仑力将电离材料颗粒（P）引导到给定区域。

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