公开(公告)号：CA2164448A1

公开(公告)日：1996-06-08

申请号：CA2164448

申请日：1995-12-05

Applicant: BAUR KARL GERHARD ,  PAPKALLA THOMAS ,  BASF AG

Inventor： BAUR KARL GERHARD ,  PAPKALLA THOMAS

IPC: C02F1/58 ,  C02F1/72

Abstract: Wastewaters containing organic halogen compounds are oxidized by reacting the wastewaters with nitric acid at from 100 to 350.degree.C under from 5 to 190 bar.

公开(公告)号：CA2109879A1

公开(公告)日：1994-05-26

申请号：CA2109879

申请日：1993-11-24

Applicant: BAUR KARL G ,  PAPKALLA THOMAS ,  KANNE ULRICH ,  STOPS PETER

Inventor： BAUR KARL G ,  PAPKALLA THOMAS ,  KANNE ULRICH ,  STOPS PETER

IPC: C02F1/58 ,  C02F1/72 ,  C02F11/08 ,  C02F101/16 ,  C02F101/30 ,  C02F1/02

Abstract: : A process for the oxidation of ammonium ions and organic carbon in wastewaters containing ammonium ions and organic carbon by means of nitric acid at from 100 to 350.degree.C, wherein the molar ratio between organic carbon and ammonium nitrogen is adjusted to a value in the range from 0.3:1 to 4:1 by addition of organic carbon or ammonium nitrogen.

公开(公告)号：WO1998015527A1

公开(公告)日：1998-04-16

申请号：PCT/EP1997005536

申请日：1997-10-08

Applicant: BASF AKTIENGESELLSCHAFT ,  EIERMANN, Matthias ,  PAPKALLA, Thomas

Inventor： BASF AKTIENGESELLSCHAFT

IPC: C07C303/14

CPC classification number: C07C303/14 ,  C07C309/04

Abstract: Process to manufacture methane sulfonic acid by irradiation of a mixture containing acetic acid, sulphur dioxide and oxygen with light. Accumulated irradiation density of light in 240-320 nm range on light entrance surface in reaction mixture is on average 0.05 to 50 nMol quantum/cm h.

Abstract translation: 一种用于通过乙酸，二氧化硫和照射制备的甲磺酸处理的光的混合物，用累积辐照度的范围为240至320nm处为0.05，平均反应混合物中的光的光入射面至50mmol量子洗脱/含氧 照射厘米<2>小时。