SYSTEM FOR DETECTION OF WAFER DEFECTS
    1.
    发明申请
    SYSTEM FOR DETECTION OF WAFER DEFECTS 审中-公开
    用于检测缺陷的系统

    公开(公告)号:WO2004063698A3

    公开(公告)日:2007-11-01

    申请号:PCT/IL2004000023

    申请日:2004-01-11

    Abstract: The invention concerns on-line electro-optical detection of wafer defects by illuminating a continuously moving wafer with a light pulse from a pulsed laser and imaging the moving wafer onto a focal plane assembly formed as a continuous surface of photo-detectors at the focal plane of the optical imaging system. The laser pulses are of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. A fiber optical illumination delivery system, which reduces the effects of source coherence, is described. Other aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for auto- focusing of the wafer imaging system, and methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    Abstract translation: 本发明涉及通过用来自脉冲激光的光脉冲照射连续移动的晶片并将移动的晶片成像到焦平面组件上的焦平面组件来形成晶片缺陷的在线电光检测,该焦平面组件形成为焦平面处的光电检测器的连续表面 的光学成像系统。 激光脉冲的持续时间显着短于像素停留时间,使得在晶片运动期间没有有效的图像污迹。 描述了减少源相干效应的光纤照明传送系统。 该系统的其他方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅里叶平面去除图像的重复特征的方法 过滤,以便更容易地检测晶片缺陷。

    SYSTEM FOR DETECTION OF WAFER DEFECTS
    2.
    发明申请
    SYSTEM FOR DETECTION OF WAFER DEFECTS 审中-公开
    用于检测缺陷的系统

    公开(公告)号:WO2004063698A2

    公开(公告)日:2004-07-29

    申请号:PCT/IL2004/000023

    申请日:2004-01-11

    IPC: G01N

    Abstract: Fast on-line electro-optical detection of wafer defects by illuminating with a short light pulse from a repetitively pulsed laser, a section of the wafer while it is moved across the field of view of an imaging system, and imaging the moving wafer onto a focal plane assembly, optically forming a continuous surface of photo-detectors at the focal plane of the optical imaging system. The continuously moving wafer is illuminated by a laser pulse of duration significantly shorter than the pixel dwell time, such that there is effectively no image smear during the wafer motion. The laser pulse has sufficient energy and brightness to impart the necessary illumination to each sequentially inspected field of view required for creating an image of the inspected wafer die. A novel fiber optical illumination delivery system, which is effective in reducing the effects of source coherence is described. Other novel aspects of the system include a system for compensating for variations in the pulse energy of a Q-switched laser output, methods for autofocussing of the wafer imaging system, and novel methods for removal of repetitive features of the image by means of Fourier plane filtering, to enable easier detection of wafer defects.

    Abstract translation: 通过用来自重复脉冲激光器的短光脉冲照射晶片缺陷的快速在线电光检测,晶片的一部分在成像系统的视场内移动,并将移动的晶片成像到 焦平面组件,在光学成像系统的焦平面处光学地形成光电检测器的连续表面。 持续移动的晶片被持续时间明显短于像素停留时间的激光脉冲照亮,使得在晶片运动期间实际上没有图像污迹。 激光脉冲具有足够的能量和亮度,以对于产生被检查的晶片管芯的图像所需的每个顺序检查的视场赋予必要的照明。 描述了一种有效减少源相干效应的新型光纤照明传输系统。 该系统的其他新颖的方面包括用于补偿Q开关激光输出的脉冲能量变化的系统,用于晶片成像系统的自动聚焦的方法,以及通过傅立叶平面去除图像的重复特征的新颖方法 过滤,以便更容易地检测晶片缺陷。

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