Abstract:
The present invention relates to compounds of formula (I): wherein R 1 is H, or a C 1 -C 10 linear, branched or cyclic alkyl group which is unsubstituted or substituted with fluorine; R 2 is an alicyclic group having 5 to 20 carbon atoms which is unsubstituted or substituted with fluorine; and R 3 represents a C 1 -C 10 linear or branched alkylène which is unsubstituted or substituted with fluorine. Processes for preparing such compounds are also disclosed. The compounds of the present invention can be used as monomers in the fields of photolithography and semiconductor fabrication.
Abstract translation:本发明涉及式(I)的化合物:其中R 1是H或C 1 -C 10直链,支链或 未取代或被氟取代的环状烷基; R 2是未被取代或被氟取代的碳原子数5〜20的脂环族基团; R 3表示未被取代或被氟取代的C 1 -C 10直链或支链烷基。 还公开了制备这些化合物的方法。 本发明的化合物可以用作光刻和半导体制造领域中的单体。
Abstract:
The present invention relates to photoactive compositions comprising about 20 to about 80 mol % of trihydroxybenzophenone having at least 70 % of the hydroxyl groups converted into 2,1,5-diazonaphthoquinone sulfonic acid esters. The compositions also comprise about 80 to about 20 mol % of a mixture comprising a backbone molecule, and/or the backbone molecule having hydroxyl groups partially and/or completely converted into 2,1,5-diazonaphthoquinone sulfonic acid esters. Processes for preparing such compositions are also disclosed.