Abstract:
In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.
Abstract:
In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.
Abstract:
An OLED display provided with a matrix of pixels, wherein the pixels each contain at least an anode and a cathode with a light-emitting layer between them, which light-emitting layer emits light when a voltage difference is applied between the anode and the cathode of the respective pixel, wherein, per pixel, an individually controllable control element is present, wherein the control element comprises a layer of material with a programmable resistance. The invention further provides a method for operating and manufacturing such an OLED display.
Abstract:
Methods and systems for inspection of an object include the use of spectroscopic techniques for the detection of unwanted particles on an object's surface, based on the different responses of the unwanted particles as compared with the object to be inspected due to their different materials. Time resolved spectroscopy and/or energy resolved spectroscopy of secondary photon emission from the surface of the object can be used to obtain Raman and photoluminescence spectra. The objects to be inspected can for example be a patterning device as used in a lithographic process, for example a reticle, in which case the presence of metal, metal oxide or organic particles can be detected, for example. The methods and apparatus are highly sensitive, for example, being able to detect small particles (sub 100 nm, particularly sub 50 nm) on the patterned side of an EUV reticle.
Abstract:
A thermoelectric element (40), comprising a dielectric substrate (100) having a hole (120), wherein the hole has a first opening on a first side of the dielectric substrate and a second opening on a second side of the dielectric substrate; a first metallisation pad (111) and a second metallisation pad (112) on the first side, wherein the first opening is between the first metallisation pad and the second metallisation pad; a planar thermoelectric layer (101) above the hole, wherein the planar thermoelectric layer has an interface with the first metallisation pad and an interface with the second metallisation pad, wherein both interfaces are in the same plane.
Abstract:
Thermoelektrisches Element, umfassend ein dielektrisches Substrat mit einem Loch, ein erstes Metallisierungspad und ein zweites Metallisierungspad auf einer ersten Seite des dielektrischen Substrats, ein drittes Metallisierungspad und ein viertes Metallisierungspad auf einer zweiten Seite des dielektrischen Substrats, wobei eine erste thermoelektrische Schicht in direktem Kontakt mit dem ersten Metallisierungspad und dem zweiten Metallisierungspad steht, eine zweite thermoelektrische Schicht, die in direktem Kontakt mit dem dritten Metallisierungspad und dem vierten Metallisierungspad steht, wobei die erste thermoelektrische Schicht und die zweite thermoelektrische Schicht unterschiedliche Leitfähigkeitstypen aufweisen, einander in dem Loch kontaktieren und dadurch einen p-n-Übergang bilden.