公开(公告)号：WO2006112887A2

公开(公告)日：2006-10-26

申请号：PCT/US2005042568

申请日：2005-11-22

Applicant: WISCONSIN ALUMNI RES FOUND ,  NEALEY PAUL F ,  KIM SANGOUK ,  EDWARDS ERIK W ,  STOYKOVICH MARK P ,  DE PABLO JUAN J

Inventor： NEALEY PAUL F ,  KIM SANGOUK ,  EDWARDS ERIK W ,  STOYKOVICH MARK P ,  DE PABLO JUAN J

IPC: G03C5/00

CPC classification number: G03F7/40 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/265

Abstract: The present invention provides improved and compositions methods for replicating substrate patterns including patterns containing irregular features. The methods of the invention involve depositing block copolymer materials on a patterned substrate and ordering components in the material to replicate the pattern. In some embodiments, ordering is facilitated through the use of blends of the copolymer material and/or configuring substrate patterns so that regions of the substrate pattern interact in a highly preferential manner with at least one of the components in the copolymer material. The invention also provides compositions containing a substrate pattern with irregular features replicated in a block copolymer material.

Abstract translation: 本发明提供了用于复制衬底图案的改进和组合方法，包括含有不规则特征的图案。 本发明的方法包括在图案化的衬底上沉积嵌段共聚物材料并排序该材料中的组分以复制该图案。 在一些实施方案中，通过使用共聚物材料的共混物和/或配置基底图案来促进排序，使得基底图案的区域以高度优先的方式与共聚物材料中的至少一种组分相互作用。 本发明还提供了含有在嵌段共聚物材料中复制的具有不规则特征的基底图案的组合物。

公开(公告)号：WO2006112887A3

公开(公告)日：2006-10-26

申请号：PCT/US2005/042568

申请日：2005-11-22

Applicant: WISCONSIN ALUMNI RESEARCH FOUNDATION ,  NEALEY, Paul, F. ,  KIM, SangOuk ,  EDWARDS, Erik, W. ,  STOYKOVICH, Mark, P. ,  DE PABLO, Juan, J.

Inventor： NEALEY, Paul, F. ,  KIM, SangOuk ,  EDWARDS, Erik, W. ,  STOYKOVICH, Mark, P. ,  DE PABLO, Juan, J.

IPC: B05D1/38 ,  B05D3/06 ,  B32B9/04

Abstract: Replicating substrate patterns containing irregular features by method (800) comprising: providing a patterned substrate with irregular feature(s) (801); depositing block copolymer materials on the patterned substrate (802); and ordering the block copolymer material in accordance with the underlying pattern (803). In some embodiments, ordering is facilitated through use of blends of the copolymer material and/or configuring substrate patterns so that regions of the substrate pattern interact in a highly preferential manner with at least one of the components in the copolymer material. Method (800) yields a substrate pattern with irregular features replicated in a block copolymer material.