公开(公告)号：WO2007057263A1

公开(公告)日：2007-05-24

申请号：PCT/EP2006/067371

申请日：2006-10-13

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION ,  IBM UNITED KINGDOM LIMITED ,  BROCK, Philip, Joe ,  CHA, Jennifer ,  GIL, Dario ,  LARSON, Carl, Eric ,  SUNDBERG, Linda, Karin ,  WALLRAFF, Gregory

Inventor： BROCK, Philip, Joe ,  CHA, Jennifer ,  GIL, Dario ,  LARSON, Carl, Eric ,  SUNDBERG, Linda, Karin ,  WALLRAFF, Gregory

IPC: C09D129/00 ,  C09D131/04 ,  G03F7/00

CPC classification number: G03F7/2041 ,  C09D129/04 ,  C09D131/04 ,  G03F7/11 ,  C08L2666/04

Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises a polymer which is sparingly soluble or insoluble in water at a temperature of 25°C or below but soluble in water at a temperature of 60° C or above. The polymer contains polyvinyl alcohol monomer unit and a polyvinyl acetate or poly.vinyl ether monomer unit having the following polymer structure: wherein R is an aliphatic or alicyclic radical; m and n are independently integers, and are the same or different; and p is zero or 1. The topcoat material may be used m lithography processes, therein the topcoat material is applied on a photoresist layer. The topcoat material is particularly useful in immersion lithography techniques using water as the imaging medium. The topcoat material of the present invention are also useful for immersion lithography employing organic liquid as immersion medium.

Abstract translation: 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包括在25℃或更低的温度下微溶或不溶于水的聚合物，但在60℃或更高的温度下可溶于水。 聚合物含有聚乙烯醇单体单元和具有以下聚合物结构的聚乙酸乙烯酯或聚乙烯基醚单体单元：其中R是脂族或脂环族基团; m和n独立地是整数，并且相同或不同; 并且p为零或1.面漆材料可以用于光刻工艺，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料在使用水作为成像介质的浸没式光刻技术中特别有用。 本发明的面漆材料也可用于使用有机液体作为浸渍介质的浸渍光刻。

公开(公告)号：WO2006091648A3

公开(公告)日：2006-08-31

申请号：PCT/US2006/006225

申请日：2006-02-22

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION ,  ALLEN, Robert, David ,  BROCK, Phillip, Joe ,  GIL, Dario ,  HINSBERG, William, Dinan ,  LARSON, Carl, Eric ,  SUNDBERG, Linda, Karin ,  WALLRAFF, Gregory, Michael

Inventor： ALLEN, Robert, David ,  BROCK, Phillip, Joe ,  GIL, Dario ,  HINSBERG, William, Dinan ,  LARSON, Carl, Eric ,  SUNDBERG, Linda, Karin ,  WALLRAFF, Gregory, Michael

IPC: G03C1/00

Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 A/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: (I) wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is 10 preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.

公开(公告)号：WO2012079919A1

公开(公告)日：2012-06-21

申请号：PCT/EP2011/070579

申请日：2011-11-21

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION ,  DE SILVA, Ekmini, Anuja ,  SUNDBERG, Linda, Karin ,  SOORIYAKUMARAN, Ratnam ,  BREYTA, Gregory ,  BOZANO, Luisa, Dominica ,  HINSBERG, William

Inventor： DE SILVA, Ekmini, Anuja ,  SUNDBERG, Linda, Karin ,  SOORIYAKUMARAN, Ratnam ,  BREYTA, Gregory ,  BOZANO, Luisa, Dominica ,  HINSBERG, William

IPC: C07C39/367 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0046 ,  C07C39/42 ,  C07C69/96 ,  C07C2603/92 ,  G03F7/0382 ,  G03F7/0392

Abstract: Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.

Abstract translation: 酚醛分子杯如杯芳烃包括至少一种含氟代醇单元。 含氟代醇的分子玻璃可用于光致抗蚀剂组合物中。 还公开了使用光致抗蚀剂组合物在基板上产生抗蚀剂图像的方法。

公开(公告)号：WO2011073013A1

公开(公告)日：2011-06-23

申请号：PCT/EP2010/068316

申请日：2010-11-26

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION ,  CHENG, Joy ,  HINSBERG, William ,  WALLRAFF, Gregory, Michael ,  TRUONG, Hoa ,  SUNDBERG, Linda, Karin ,  ITO, Hiroshi ,  SANDERS, Daniel, Paul ,  KIM, Ho-Cheol ,  NA, Young-Hye

Inventor： CHENG, Joy ,  HINSBERG, William ,  WALLRAFF, Gregory, Michael ,  TRUONG, Hoa ,  SUNDBERG, Linda, Karin ,  ITO, Hiroshi ,  SANDERS, Daniel, Paul ,  KIM, Ho-Cheol ,  NA, Young-Hye

IPC: B81C1/00 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20

CPC classification number: B82Y40/00 ,  B81C1/00031 ,  B81C2201/0149 ,  G03F7/0392 ,  G03F7/09 ,  G03F7/091 ,  G03F7/165 ,  G03F7/325 ,  G03F7/327 ,  G03F7/40

Abstract: A method of forming a layered structure comprising a domain pattern of a self-assembled material comprises: disposing on a substrate a photoresist layer comprising a non-crosslinking photoresist; optionally baking the photoresist layer; pattern- wise exposing the photoresist layer to first radiation; optionally baking the exposed photoresist layer; and developing the exposed photoresist layer with a non-alkaline developer to form a negative-tone patterned photoresist layer comprising non-crosslinked developed photoresist; wherein the developed photoresist is not soluble in a given organic solvent suitable for casting a given material capable of self-assembly, and the developed photoresist is soluble in an aqueous alkaline developer and/or a second organic solvent. A solution comprising the given material capable of self-assembly dissolved in the given organic solvent is casted on the patterned photoresist layer, and the given organic solvent is removed. The casted given material is allowed to self-assemble while optionally heating and/or annealing the casted given material, thereby forming the layered structure comprising the domain pattern of the self-assembled given material.

Abstract translation: 形成包括自组装材料的畴图案的层状结构的方法包括：在基底上设置包含非交联光致抗蚀剂的光致抗蚀剂层; 任选地烘烤光致抗蚀剂层; 将光致抗蚀剂层以图形方式曝光到第一辐射; 任选地烘烤曝光的光致抗蚀剂层; 以及用非碱性显影剂显影曝光的光致抗蚀剂层以形成包含非交联显影光致抗蚀剂的负色图案光刻胶层; 其中显影的光致抗蚀剂不溶于适于铸造能够自组装的给定材料的给定有机溶剂中，并且显影的光致抗蚀剂可溶于碱性显影液和/或第二有机溶剂。 将包含溶解在给定有机溶剂中的能够自组装的给定材料的溶液浇铸在图案化的光致抗蚀剂层上，并且除去给定的有机溶剂。 铸造的给定材料允许自组装，同时任选地加热和/或退火铸造的给定材料，从而形成包括自组装给定材料的畴图案的分层结构。

公开(公告)号：WO2007014882A3

公开(公告)日：2007-02-08

申请号：PCT/EP2006/064640

申请日：2006-07-25

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION ,  IBM UNITED KINGDOM LIMITED ,  HEDRICK, James, Lupton ,  MAGBITANG, Teddie, Peregrino ,  SANKARAPANDIAN, Muthumanickam ,  VOLKSEN, Willi ,  KIM, Ho-Cheol ,  LEE, Victor, Yee-Way ,  MILLER, Robert, Dennis ,  SUNDBERG, Linda, Karin ,  DUBOIS, Geraud, Jean-Michel

Inventor： HEDRICK, James, Lupton ,  MAGBITANG, Teddie, Peregrino ,  SANKARAPANDIAN, Muthumanickam ,  VOLKSEN, Willi ,  KIM, Ho-Cheol ,  LEE, Victor, Yee-Way ,  MILLER, Robert, Dennis ,  SUNDBERG, Linda, Karin ,  DUBOIS, Geraud, Jean-Michel

IPC: C08L101/12 ,  H01L21/312

Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising; a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.

公开(公告)号：WO2007014882A2

公开(公告)日：2007-02-08

申请号：PCT/EP2006064640

申请日：2006-07-25

Applicant: IBM ,  IBM UK ,  HEDRICK JAMES LUPTON ,  MAGBITANG TEDDIE PEREGRINO ,  SANKARAPANDIAN MUTHUMANICKAM ,  VOLKSEN WILLI ,  KIM HO-CHEOL ,  LEE VICTOR YEE-WAY ,  MILLER ROBERT DENNIS ,  SUNDBERG LINDA KARIN ,  DUBOIS GERAUD JEAN-MICHEL

Inventor： HEDRICK JAMES LUPTON ,  MAGBITANG TEDDIE PEREGRINO ,  SANKARAPANDIAN MUTHUMANICKAM ,  VOLKSEN WILLI ,  KIM HO-CHEOL ,  LEE VICTOR YEE-WAY ,  MILLER ROBERT DENNIS ,  SUNDBERG LINDA KARIN ,  DUBOIS GERAUD JEAN-MICHEL

CPC classification number: C08L101/12 ,  H01L21/02118 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/31695 ,  H01L21/76807 ,  H01L21/7682 ,  H01L2221/1047

Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising; a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.

Abstract translation: 使用该组合物制造的物质组成和结构。 该组合物包含： 树脂; 分散在树脂中的聚合物纳米颗粒，每种聚合物纳米颗粒包含多臂芯聚合物和连接到多臂芯聚合物上的侧链聚合物，与树脂不混溶的多臂芯聚合物和可混溶的侧链聚合物 与树脂; 和溶剂，所述溶剂在第一温度下是挥发性的，所述树脂在第二温度下可交联，所述聚合物纳米颗粒可在第三温度下分解，所述第三温度高于所述第二温度，所述第二温度高于所述第一温度 其中在将所述层从所述第二温度加热到所述第三温度之间，所述组合物层的厚度收缩小于约3.5％。

公开(公告)号：WO2006091648A2

公开(公告)日：2006-08-31

申请号：PCT/US2006006225

申请日：2006-02-22

Applicant: IBM ,  ALLEN ROBERT DAVID ,  BROCK PHILLIP JOE ,  GIL DARIO ,  HINSBERG WILLIAM DINAN ,  LARSON CARL ERIC ,  SUNDBERG LINDA KARIN ,  WALLRAFF GREGORY MICHAEL

Inventor： ALLEN ROBERT DAVID ,  BROCK PHILLIP JOE ,  GIL DARIO ,  HINSBERG WILLIAM DINAN ,  LARSON CARL ERIC ,  SUNDBERG LINDA KARIN ,  WALLRAFF GREGORY MICHAEL

IPC: G03C1/76

CPC classification number: G03F7/11 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 A/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: (I) wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is 10 preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.

Abstract translation: 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000A /秒的溶解速率的聚合物。 聚合物含有包含以下两种结构之一的六氟醇单体单元：（I）其中n是整数。 面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料10优选不溶于水，因此特别适用于使用水作为成像介质的浸没式光刻技术。