Abstract:
There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.
Abstract:
A spectral purity filter (100) includes a substrate (111), a plurality of apertures (104) through the substrate (111), and a plurality of walls. The walls define the plurality of apertures (104) through the substrate (111). The spectral purity filter (100) also includes a first layer (112) formed on the substrate to reflect radiation of a first wavelength, and a second layer (113) formed on the first layer (112) to prevent oxidation of the first layer (112). The apertures (104) are constructed and arranged to be able to transmit at least a portion of radiation of a second wavelength there through.
Abstract:
A spectral purity filter includes a substrate, a plurality of apertures through the substrate, and a plurality of walls. The walls define the plurality of apertures through the substrate. The spectral purity filter also includes a first layer formed on the substrate to reflect radiation of a first wavelength, and a second layer formed on the first layer to prevent oxidation of the first layer. The apertures are constructed and arranged to be able to transmit at least a portion of radiation of a second wavelength therethrough.