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公开(公告)号：JP2015522208A
公开(公告)日：2015-08-03
申请号：JP2015521085
申请日：2013-02-04
Inventor： マルティナス・オードロニス
CPC classification number: H01J49/0013 , C23C14/35 , C23C14/52 , C23C14/54 , H01J37/32981 , H01J37/3476 , H01J2237/2002 , H01J2237/332
Abstract: 真空処理方法のために使用されるアセンブリであって、上記アセンブリは処理チャンバー1を含む。チャンバー1内の気体組成物をサンプリング調査し分析するための気体分析装置を提供する。気体分析装置は、測定装置14を含み、これは小型化されたマススペクトロメーターに又は小型化されたプラズマ源に基づいており、伸長されたハウジング18の内部に配置されている。ハウジング18の部分は、処理チャンバー1の内部に配置され、チャンバー1内で気体を分析するようになっている。処理方法は、気体分析に応答して、制御される。
Abstract translation: 用于真空处理方法的组件，所述组件包括一处理腔室1。 提供气体分析器，用于取样调查在腔室1分析气体组成。 气体分析装置包括测量装置14，其被布置在所述质谱仪的内部或小型化的等离子体源上为主，即小型化细长壳体18。 壳体18的一部分被设置在处理室1内，以便分析在腔室1中的气体。 响应于气体分析处理方法中，进行控制。
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公开(公告)号：US20150194295A1
公开(公告)日：2015-07-09
申请号：US14412883
申请日：2013-02-04
Applicant: UAB Nova Fabrica
Inventor： Martynas Audronis
CPC classification number: H01J49/0013 , C23C14/35 , C23C14/52 , C23C14/54 , H01J37/32981 , H01J37/3476 , H01J2237/2002 , H01J2237/332
Abstract: An assembly for use in a vacuum treatment process, the assembly including a process changer 1. Gas analysis apparatus to sample and analyse the gas composition within the chamber 1 is provided. The gas analysis apparatus includes a measuring apparatus 14 based either on a miniature mass spectrometer or on a miniature plasma source, which is located within an elongate housing 18. Part of the housing 18 is located within the process chamber 1 such that the gas is analysed within the chamber 1. The process can be controlled in response to the gas analysis
Abstract translation: 一种用于真空处理工艺的组件，该组件包括一个过程转换器1.提供了用于对室1内的气体成分进行采样和分析的气体分析设备。 气体分析装置包括基于微型质谱仪或位于细长壳体18内的微型等离子体源的测量装置14.壳体18的一部分位于处理室1内，使得气体被分析 可以根据气体分析来控制该过程
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公开(公告)号：WO2014009816A1
公开(公告)日：2014-01-16
申请号：PCT/IB2013/050941
申请日：2013-02-04
Applicant: UAB NOVA FABRICA
Inventor： AUDRONIS, Martynas
IPC: H01J37/32
CPC classification number: H01J49/0013 , C23C14/35 , C23C14/52 , C23C14/54 , H01J37/32981 , H01J37/3476 , H01J2237/2002 , H01J2237/332
Abstract: An assembly for use in a vacuum treatment process, the assembly including a process chamber 1. Gas analysis apparatus to sample and analyse the gas composition within the chamber 1 is provided. The gas analysis apparatus includes a measuring apparatus 14 based either on a miniature mass spectrometer or on a miniature plasma source, which is located within an elongate housing 18. Part of the housing 18 is located within the process chamber 1 such that the gas is analysed within the chamber 1. The process can be controlled in response to the gas analysis.
Abstract translation: 一种用于真空处理过程的组件，该组件包括处理室1.提供用于对室1内的气体成分进行采样和分析的气体分析装置。 气体分析装置包括基于微型质谱仪或位于细长壳体18内的微型等离子体源的测量装置14.壳体18的一部分位于处理室1内，使得气体被分析 可以根据气体分析来控制该过程。
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公开(公告)号：EP2859575A1
公开(公告)日：2015-04-15
申请号：EP13716833.2
申请日：2013-02-04
Applicant: UAB Nova Fabrica
Inventor： AUDRONIS, Martynas
IPC: H01J37/32
CPC classification number: H01J49/0013 , C23C14/35 , C23C14/52 , C23C14/54 , H01J37/32981 , H01J37/3476 , H01J2237/2002 , H01J2237/332
Abstract: An assembly for use in a vacuum treatment process, the assembly including a process changer 1. Gas analysis apparatus to sample and analyse the gas composition within the chamber 1 is provided. The gas analysis apparatus includes a measuring apparatus 14 based either on a miniature mass spectrometer or on a miniature plasma source, which is located within an elongate housing 18. Part of the housing 18 is located within the process chamber 1 such that the gas is analysed within the chamber 1. The process can be controlled in response to the gas analysis
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