ASSEMBLY FOR USE IN A VACUUM TREATMENT PROCESS
    1.
    发明申请
    ASSEMBLY FOR USE IN A VACUUM TREATMENT PROCESS 审中-公开
    组装用于真空处理工艺

    公开(公告)号:WO2014009816A1

    公开(公告)日:2014-01-16

    申请号:PCT/IB2013/050941

    申请日:2013-02-04

    Abstract: An assembly for use in a vacuum treatment process, the assembly including a process chamber 1. Gas analysis apparatus to sample and analyse the gas composition within the chamber 1 is provided. The gas analysis apparatus includes a measuring apparatus 14 based either on a miniature mass spectrometer or on a miniature plasma source, which is located within an elongate housing 18. Part of the housing 18 is located within the process chamber 1 such that the gas is analysed within the chamber 1. The process can be controlled in response to the gas analysis.

    Abstract translation: 一种用于真空处理过程的组件,该组件包括处理室1.提供用于对室1内的气体成分进行采样和分析的气体分析装置。 气体分析装置包括基于微型质谱仪或位于细长壳体18内的微型等离子体源的测量装置14.壳体18的一部分位于处理室1内,使得气体被分析 可以根据气体分析来控制该过程。

    ASSEMBLY FOR USE IN A VACUUM TREATMENT PROCESS
    2.
    发明公开
    ASSEMBLY FOR USE IN A VACUUM TREATMENT PROCESS 审中-公开
    安排用在真空处理过程

    公开(公告)号:EP2859575A1

    公开(公告)日:2015-04-15

    申请号:EP13716833.2

    申请日:2013-02-04

    Abstract: An assembly for use in a vacuum treatment process, the assembly including a process changer 1. Gas analysis apparatus to sample and analyse the gas composition within the chamber 1 is provided. The gas analysis apparatus includes a measuring apparatus 14 based either on a miniature mass spectrometer or on a miniature plasma source, which is located within an elongate housing 18. Part of the housing 18 is located within the process chamber 1 such that the gas is analysed within the chamber 1. The process can be controlled in response to the gas analysis

Patent Agency Ranking