公开(公告)号：US20110006674A1

公开(公告)日：2011-01-13

申请号：US12880107

申请日：2010-09-12

Applicant: Ron NAAMAN ,  Ben GOLAN ,  Zeev FRADKIN ,  Adam WINKLEMAN ,  Dan ORON

Inventor： Ron NAAMAN ,  Ben GOLAN ,  Zeev FRADKIN ,  Adam WINKLEMAN ,  Dan ORON

IPC: H01J40/06 ,  H01J9/12

CPC classification number: B81C1/00206 ,  B81C1/00031 ,  B81C2201/0132 ,  B81C2201/115 ,  G03F7/40

Abstract: A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super-hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.

Abstract translation: 提出了一种具有纳米级表面粗糙度的基板的制造方法。 该方法包括：图案化基板的表面以产生光敏材料的间隔开的区域的阵列; 对所述图案化表面施加可控制的蚀刻，所述可控蚀刻具有预定的持续时间，以便形成具有纳米尺度特征的图案; 并去除感光材料，从而产生具有纳米级表面粗糙度的结构。 用疏水分子对这样的纳米级粗糙表面进行硅烷化，导致产生了以接触角大和倾斜角大的特征的超疏水特性。 而且，在纳米级粗糙度表面上沉积光活性材料导致光电阴极具有增强的光电转换率。 该方法还提供对入射光的极化不敏感的光电阴极的制造。

公开(公告)号：US08288945B2

公开(公告)日：2012-10-16

申请号：US12880107

申请日：2010-09-12

Applicant: Ron Naaman ,  Ben Golan ,  Zeev Fradkin ,  Adam Winkleman ,  Dan Oron

Inventor： Ron Naaman ,  Ben Golan ,  Zeev Fradkin ,  Adam Winkleman ,  Dan Oron

IPC: H01J40/06 ,  H01J9/12

CPC classification number: B81C1/00206 ,  B81C1/00031 ,  B81C2201/0132 ,  B81C2201/115 ,  G03F7/40

Abstract: A method for fabrication of substrate having a nano-scale surface roughness is presented. The method comprises: patterning a surface of a substrate to create an array of spaced-apart regions of a light sensitive material; applying a controllable etching to the patterned surface, said controllable etching being of a predetermined duration selected so as to form a pattern with nano-scale features; and removing the light sensitive material, thereby creating a structure with the nano-scale surface roughness. Silanizing such nano-scale roughness surface with hydrophobic molecules results in the creation of super-hydrophobic properties characterized by both a large contact angle and a large tilting angle. Also, deposition of a photo-active material on the nano-scale roughness surface results in a photocathode with enhanced photoemission yield. This method also provides for fabrication of a photocathode insensitive to polarization of incident light.

Abstract translation: 提出了一种具有纳米级表面粗糙度的基板的制造方法。 该方法包括：图案化基板的表面以产生光敏材料的间隔开的区域的阵列; 对所述图案化表面施加可控制的蚀刻，所述可控蚀刻具有预定的持续时间，以便形成具有纳米尺度特征的图案; 并去除感光材料，从而产生具有纳米级表面粗糙度的结构。 用疏水分子对这样的纳米级粗糙表面进行硅烷化，导致产生了以接触角大和倾斜角大的特征的超疏水特性。 而且，在纳米级粗糙度表面上沉积光活性材料导致光电阴极具有增强的光电转换率。 该方法还提供对入射光的极化不敏感的光电阴极的制造。

公开(公告)号：IL207974D0

公开(公告)日：2010-12-30

申请号：IL20797410

申请日：2010-09-05

Applicant: YEDA RES & DEV ,  RON NAAMAN ,  DAN ORON ,  BEN GOLAN ,  ZEEV FRADKIN ,  ADAM WINKLEMAN

IPC: B81C20060101