公开(公告)号：KR100658202B1

公开(公告)日：2006-12-15

申请号：KR1020050084716

申请日：2005-09-12

Applicant: (주)마이크로인피니티

Inventor： 박범진 ,  장현기

IPC: H01L27/12

Abstract: A floating body for micro structure and a method for manufacturing of the same are provided to form a correct micro-structure without interfering a movement of a floating body by providing a cuboid etch groove. An SOI substrate including an insulating layer(120) inserted between a first silicon layer(100) and a second silicon layer(200) is provided. A first pattern substrate is formed by etching the first silicon layer. A part of the second silicon layer is exposed by removing the insulating layer exposed to the outside. A vertical groove is formed by an anisotropic etch process for the exposed part of the second silicon layer. A floating body is completed by floating a part of the first silicon layer by an isotropic etch process for the second silicon layer.

Abstract translation: 提供一种用于显微结构的浮体及其制造方法，以通过提供长方体蚀刻槽而形成正确的微结构而不干扰浮体的移动。 提供包括插入在第一硅层（100）和第二硅层（200）之间的绝缘层（120）的SOI衬底。 通过蚀刻第一硅层来形成第一图案基板。 通过去除暴露于外部的绝缘层来暴露第二硅层的一部分。 对于第二硅层的暴露部分，通过各向异性蚀刻工艺形成垂直凹槽。 通过对第二硅层进行各向同性蚀刻工艺，浮置第一硅层的一部分来完成浮体。