폴리이미드 기재의 가시광선 투과율 향상 방법, 폴리이미드­세라믹 기재, 폴리이미드­세라믹­FTO 투명전도막 및 그 제조방법
    3.
    发明公开
    폴리이미드 기재의 가시광선 투과율 향상 방법, 폴리이미드­세라믹 기재, 폴리이미드­세라믹­FTO 투명전도막 및 그 제조방법 无效
    改进聚酰亚胺基板,PI陶瓷基板,PI-CERAMIC-FTO透明薄膜的可见光透射的方法及其制造方法

    公开(公告)号:KR1020130134584A

    公开(公告)日:2013-12-10

    申请号:KR1020120058198

    申请日:2012-05-31

    Applicant: (주)세온

    Abstract: The present invention relates to a method for improving visible light transmittance on a polyimide substrate by forming a ceramic film on the polyimide substrate, and a polyimide-ceramic-FTO transparent film which improves visible light transmittance by forming an FTO film on the polyimide-ceramic substrate. The present invention provides a method for improving visible light transmittance on a polyimide substrate, wherein the method includes a step (a) of preparing polyimide (PI) substrate and a step (b) of forming a ceramic film with a thickness of 50-150 nm on the polyimide substrate. At this time, the ceramic film can be formed with SiO2.

    Abstract translation: 本发明涉及通过在聚酰亚胺基板上形成陶瓷膜来改善聚酰亚胺基板上的可见光透射率的方法,以及通过在聚酰亚胺陶瓷上形成FTO膜来提高可见光透射率的聚酰亚胺陶瓷-FTO透明膜 基质。 本发明提供一种改善聚酰亚胺基板的可见光透射率的方法,其中该方法包括制备聚酰亚胺(PI)基板的步骤(a)和形成厚度为50-150的陶瓷膜的步骤(b) nm。 此时,可以用SiO 2形成陶瓷膜。

    레이저 스크라이빙 기술을 이용한 투명전도막 미세 패터닝 방법
    4.
    发明公开
    레이저 스크라이빙 기술을 이용한 투명전도막 미세 패터닝 방법 有权
    使用激光扫描的精细TCO绘图方法

    公开(公告)号:KR1020140021138A

    公开(公告)日:2014-02-20

    申请号:KR1020120086692

    申请日:2012-08-08

    CPC classification number: Y02E10/542 Y02P70/521

    Abstract: The present invention relates to a patterning method to form a leading wire having a line width no wider than 30μm from a transparent conducting oxide coated on a substrate using a laser beam. Provided in the present invention is a fine patterning method for a transparent conducting oxide using laser scribing which includes: (a) a phase for preparing a substrate coated with a transparent conducing oxide; (b) a phase for rounding off the transparent conducing oxide, leaving with a flank around the transparent conducing wire portion using a broad-width laser beam; and (c) a phase for rounding off the flank with a narrow-width laser beam. [Reference numerals] (AA) FTO film(top); (BB) FTO film; (CC) Cross section; (DD) Substrate(PI, glass, plastic, ceramic, metal); (EE) FTO laser etching; (FF) FTO etched part(scribbing)

    Abstract translation: 本发明涉及一种使用激光束从涂覆在基板上的透明导电氧化物形成线宽不大于30μm的引线的图案化方法。 在本发明中提供了一种使用激光划线的透明导电氧化物的精细图案化方法,其包括:(a)用于制备涂覆有透明导电氧化物的基底的相; (b)用于使透明导电氧化物四舍五入的相位,使用宽幅激光束在透明导电线部分周围留下一个侧面; 和(c)用窄宽度激光束使侧面倒圆的相位。 (附图标记)(AA)FTO膜(顶部); (BB)FTO电影; (CC)截面; (DD)基材(PI,玻璃,塑料,陶瓷,金属); (EE)FTO激光蚀刻; (FF)FTO蚀刻部分(划线)

    투명전도막이 코팅된 기판에 대한 금속 배선 방법
    6.
    发明授权
    투명전도막이 코팅된 기판에 대한 금속 배선 방법 失效
    透明薄膜基材的金属图案方法

    公开(公告)号:KR101348118B1

    公开(公告)日:2014-01-08

    申请号:KR1020120087580

    申请日:2012-08-10

    CPC classification number: H01B13/0026 G06F3/041 G06F2203/04103 H01B5/14

    Abstract: The present invention relates to a metal wiring method for a substrate which is coated with a transparent conductive layer, capable of selectively forming a metal wire on the substrate which is exposed by cutting the transparent conductive layer which is coated on the upper part of the substrate in a laser scribing method. The present invention provides the method wiring method for the substrate which is coated with the transparent conductive layer including (a) a step of preparing the substrate which is coated with the transparent conductive layer, (b) a step of exposing the substrate by cutting the transparent conductive layer as necessary through a laser scribing, and (c) a step of forming the metal wire on the exposed substrate. [Reference numerals] (AA) Polymer protection film; (BB) Laser etching; (CC) Copper line; (DD) Remove polymer

    Abstract translation: 本发明涉及一种涂覆有透明导电层的基板的金属布线方法,该透明导电层能够通过切割涂覆在基板的上部的透明导电层而在基板上选择性地形成金属线 以激光划线方式。 本发明提供了涂覆有透明导电层的基板的方法布线方法,包括(a)制备涂有透明导电层的基板的步骤,(b)通过切割 通过激光划线必要的透明导电层,以及(c)在暴露的基板上形成金属线的步骤。 (附图标记)(AA)聚合物保护膜; (BB)激光蚀刻; (CC)铜线; (DD)除去聚合物

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