Abstract:
본 발명은 레이저 빔을 이용하여 기판 위에 코팅된 투명전도막을 선폭 30㎛ 이하의 도선이 형성되도록 패터닝하는 방법에 관한 것이다. 본 발명은 「(a) 투명전도막이 코팅된 기판을 준비하는 단계; (b) 광폭(廣幅) 레이저 빔으로 남겨져야 하는 투명전도선 부분 주위에 여유면을 두고 상기 투명전도막을 깎아내는 단계; (c) 협폭(狹幅) 레이저 빔으로 상기 여유면을 깎아내는 단계; 를 포함하는 레이저 스크라이빙 기술을 이용한 투명전도막 미세 패터닝 방법」을 제공한다.
Abstract:
본 발명은 염기성 페이스트를 이용함으로써 종래의 기술에 비해 공정단가를 낮추고 대면적 공정이 가능하게 되는 금속 배선 기술에 관한 것이다. 본 발명은 「(a) 알칼리 금속을 함유한 염기성 용액에 증점제를 혼합하여 염기성 페이스트를 제조하는 단계; 및 (b) 염기성 반응성 수지로 제작된 기판에 상기 염기성 페이스트를 패터닝하여 알칼리 금속을 상기 기판에 흡착시키는 단계; 를 포함하는 염기성 페이스트를 이용한 알칼리 금속 패터닝 방법」을 제공한다.
Abstract:
The present invention relates to a method for improving visible light transmittance on a polyimide substrate by forming a ceramic film on the polyimide substrate, and a polyimide-ceramic-FTO transparent film which improves visible light transmittance by forming an FTO film on the polyimide-ceramic substrate. The present invention provides a method for improving visible light transmittance on a polyimide substrate, wherein the method includes a step (a) of preparing polyimide (PI) substrate and a step (b) of forming a ceramic film with a thickness of 50-150 nm on the polyimide substrate. At this time, the ceramic film can be formed with SiO2.
Abstract:
The present invention relates to a patterning method to form a leading wire having a line width no wider than 30μm from a transparent conducting oxide coated on a substrate using a laser beam. Provided in the present invention is a fine patterning method for a transparent conducting oxide using laser scribing which includes: (a) a phase for preparing a substrate coated with a transparent conducing oxide; (b) a phase for rounding off the transparent conducing oxide, leaving with a flank around the transparent conducing wire portion using a broad-width laser beam; and (c) a phase for rounding off the flank with a narrow-width laser beam. [Reference numerals] (AA) FTO film(top); (BB) FTO film; (CC) Cross section; (DD) Substrate(PI, glass, plastic, ceramic, metal); (EE) FTO laser etching; (FF) FTO etched part(scribbing)
Abstract:
The present invention relates to a metal wiring technique for enabling a large-sized process and reducing process costs compared to an existing technique by using basic paste. The present invention is to provide an alkali metal patterning method using basic paste that includes a step (a) of manufacturing basic paste by mixing a thickener with a basic solution including alkali metal; and a step (b) of adsorbing the alkali metal to a substrate by patterning the basic paste to the substrate made of a basic reaction resin.
Abstract:
The present invention relates to a metal wiring method for a substrate which is coated with a transparent conductive layer, capable of selectively forming a metal wire on the substrate which is exposed by cutting the transparent conductive layer which is coated on the upper part of the substrate in a laser scribing method. The present invention provides the method wiring method for the substrate which is coated with the transparent conductive layer including (a) a step of preparing the substrate which is coated with the transparent conductive layer, (b) a step of exposing the substrate by cutting the transparent conductive layer as necessary through a laser scribing, and (c) a step of forming the metal wire on the exposed substrate. [Reference numerals] (AA) Polymer protection film; (BB) Laser etching; (CC) Copper line; (DD) Remove polymer