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公开(公告)号：WO2012044060A3
公开(公告)日：2012-04-05
申请号：PCT/KR2011/007140
申请日：2011-09-28
Applicant: (주)트리플코어스코리아 , 김성락 , 지영연 , 김익년
IPC: H05H1/46 , H01L21/3065
Abstract: 마이크로웨이브 발생 장치, 이 장치의 구동 방법 및 폐가스 제거 시스템을 공개한다. 마이크로웨이브 발생 장치는 마이크로웨이브를 발생하는 마그네트론, 및 상기 마그네트론을 구동하기 위한 서로 다른 위상을 갖는 복수개의 정류된 고전압 생성하는 전원 공급 회로를 구비한다. 따라서 낮은 제조비용으로 안정적으로 고출력의 마그네트론을 구동할 수 있으며, 마그네트론의 수명을 연장할 수 있다.
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公开(公告)号：KR1020130090698A
公开(公告)日：2013-08-14
申请号：KR1020120012022
申请日：2012-02-06
Applicant: (주)트리플코어스코리아
IPC: H01L21/02 , H01L21/205
CPC classification number: H01L21/67098 , H01L21/205 , H01L21/67034
Abstract: PURPOSE: An apparatus and method for processing gas powder for a semiconductor processing system are provided to increase the lifetime of a pump by including a processing chamber and a reaction chamber. CONSTITUTION: A processing chamber (100) receives a processing gas. A reaction chamber receives an exhaust gas. A pump (120) applies a vacuum to the processing chamber. A heating block raises the temperature of the reaction chamber. A cooling block collects powder. [Reference numerals] (AA) ALD exhaust gas
Abstract translation: 目的：提供一种用于处理半导体处理系统的气体粉末的设备和方法，以通过包括处理室和反应室来增加泵的使用寿命。 构成：处理室（100）接收处理气体。 反应室接收废气。 泵（120）向处理室施加真空。 加热块提高了反应室的温度。 冷却块收集粉末。 （标号）（AA）ALD废气
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公开(公告)号：KR1020130049481A
公开(公告)日：2013-05-14
申请号：KR1020110114531
申请日：2011-11-04
Applicant: (주)트리플코어스코리아
CPC classification number: B01J19/088 , B01D53/32 , B01D2259/818
Abstract: PURPOSE: A plasma reactor and a gas scrubber using the same are provided to maintain bondage by weight without an adhesive member or a fastening member by inserting and coupling the discharge inner body with magnetic force generation unit. CONSTITUTION: A plasma reactor comprises a high-frequency oscillator (15); a waveguide module; a discharge outer body; cooling bodies (42) arranged inside the discharge outer body; and a discharge inner body (150). The waveguide module transmits the oscillated high frequency. The discharge outer body is perpendicularly arranged from the waveguide module and passes the high frequency transmitted along the waveguide module. The cooling bodies include slits in order for the high frequency transmitted from the waveguide module to be guided inside. The discharge inner body is arranged inside the cooling body and is inserted and coupled by weight and is combined with the discharge outer body. The outer periphery of the discharge inner body is formed in a conical shape in which the cross section becomes smaller as moving towards the lower side.
Abstract translation: 目的：提供等离子体反应器和使用该等离子体反应器的气体洗涤器，通过将放电内体与磁力产生单元插入和联接来提供重量而不用粘合构件或紧固构件。 构成：等离子体反应器包括高频振荡器（15）; 波导模块; 放电外体; 布置在排出外体内的冷却体（42） 和排出内体（150）。 波导模块传输振荡的高频。 放电外体从波导模块垂直布置，并通过沿波导模块传输的高频。 冷却体包括狭缝，以便从波导模块传输的高频被引导到内部。 排出内体布置在冷却体的内部，并通过重量插入和连接，并与排出外体结合。 排出内体的外周形成为朝向下侧移动时的截面变小的圆锥形状。
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公开(公告)号：KR1020130048576A
公开(公告)日：2013-05-10
申请号：KR1020110113497
申请日：2011-11-02
Applicant: (주)트리플코어스코리아
IPC: H05H1/46 , H01L21/205
CPC classification number: H01J37/32669 , B01D53/92 , B01D2259/818 , H01J37/32082 , H01J37/32522 , H05H1/46 , H05H2001/4645
Abstract: PURPOSE: A plasma reactor and a gas scrubber using the same are provided to prevent efficiency degradation due to high temperature heat of a magnetic force generation member. CONSTITUTION: A high frequency oscillator(15) oscillates high frequency wave. A waveguide module(20) transmits the high frequency wave oscillated in the high frequency oscillator. A discharge outer body(32) is perpendicularly arranged to the waveguide module and passes the high frequency wave transmitted along the waveguide module. A magnetic force generation unit(40) is arranged inside the discharge outer body, generates a magnetic force and is cooled by a coolant circulating in the outside. [Reference numerals] (12) Power supply unit
Abstract translation: 目的：提供等离子体反应器和使用其的气体洗涤器，以防止由于磁力产生构件的高温热导致的效率降低。 构成：高频振荡器（15）振荡高频波。 波导模块（20）传输在高频振荡器中振荡的高频波。 放电外体（32）垂直地布置在波导模块上并使沿着波导模块传输的高频波通过。 磁力产生单元（40）布置在放电外体的内部，产生磁力并由在外部循环的冷却剂冷却。 （附图标记）（12）电源单元
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公开(公告)号：KR1020120049968A
公开(公告)日：2012-05-18
申请号：KR1020100111232
申请日：2010-11-10
Applicant: (주)트리플코어스코리아
IPC: H01L21/02
CPC classification number: H01L21/67034 , H01L21/67046 , H01L21/67098 , H05H1/46
Abstract: PURPOSE: An apparatus for scrubbing an atmospheric pressure plasma gas is provided to improve the process efficiency of a process gas by maintaining a process gas to be 150 degrees or more as an indirect heat source of plasma. CONSTITUTION: A process gas inflow line(140) is connected to a bottom portion of an exterior wall(130b). The process gas inflow line lets a process gas to be processed flow from the outside. A process gas exhaust line(150) is connected to an upper end of the exterior wall. The process gas exhaust line discharges the process gas flowing in. An injection portion injects water into a waveguide(110).
Abstract translation: 目的：提供一种用于洗涤大气压等离子体气体的装置，以通过将处理气体维持在等离子体的间接热源150度以上来提高处理气体的处理效率。 构成：工艺气体流入管线（140）连接到外壁（130b）的底部。 处理气体流入管线使处理气体被处理从外部流出。 工艺气体排出管线（150）连接到外壁的上端。 处理气体排出管线排出流入的工艺气体。注入部分将水注入波导管（110）。
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Patent Agency Ranking
公开(公告)号：KR1020130048577A
公开(公告)日：2013-05-10
申请号：KR1020110113498
申请日：2011-11-02
Applicant: (주)트리플코어스코리아
CPC classification number: B01D53/32 , B01D47/00 , B01D2259/818 , B01J19/088
Abstract: PURPOSE: A plasma reactor and a gas scrubber using the same are provided to effectively generate magnetic force inside a discharge outer body which is formed at high temperature and to facilitate adjust impedance inside the discharge outer body. CONSTITUTION: A plasma reactor comprises a high-frequency oscillator (15); a waveguide module (20); a cylindrical discharge outer body (32); a magnetic force generation unit (40); and a plunger (25) arranged in the waveguide module. The waveguide module transmits the high frequency which is oscillated in the high-frequency oscillator. The discharge outer body is perpendicularly arranged with the waveguide module and passes the transmitted high frequency along the waveguide module shines. The magnetic force generation unit is arranged inside the discharge outer body and generates magnetic force and is cooled by a refrigerant circulated outside. The plunger is moved along the waveguide module in order to form plasma and controls impedance inside the discharge outer body. [Reference numerals] (12) Power supplying unit
Abstract translation: 目的：提供一种等离子体反应器和使用该等离子体反应器的气体洗涤器，以有效地在高温下形成的放电外体内产生磁力，并且有助于调节放电外体内部的阻抗。 构成：等离子体反应器包括高频振荡器（15）; 波导模块（20）; 圆柱形排出外体（32）; 磁力产生单元（40）; 和布置在波导模块中的柱塞（25）。 波导模块传输在高频振荡器中振荡的高频。 放电外体与波导模块垂直布置，并沿着波导模块照射传递的高频。 磁力产生单元布置在放电外体内部并产生磁力，并由循环在外部的制冷剂冷却。 柱塞沿着波导模块移动以形成等离子体并且控制放电外部体内的阻抗。 （附图标记）（12）供电单元
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公开(公告)号：KR101909430B1
公开(公告)日：2018-10-18
申请号：KR1020120012023
申请日：2012-02-06
Applicant: (주)트리플코어스코리아
IPC: H01L21/67 , H01L21/205
Abstract: 반도체공정시스템용가스파우더처리장치및 방법이제공된다. 본발명의일 실시예에따른반도체공정시스템용가스파우더처리장치는공정가스가유입되어반응하는공정챔버(110) 및상기공정챔버(110)에진공을인가하기위한펌프(120)를구비한반도체공정시스템용가스파우더처리장치로, 상기장치는상기공정챔버로부터배출되는배기가스가포어라인(112)을통하여유입되는반응챔버(111); 상기상기반응챔버(111) 전단에구비되며, 상기공정챔버(110)로부터배출되는배기가스중 WF6와반응, 파우더를형성할수 있는반응가스를상기포어라인(112)으로유입하는반응가스유입라인(113); 상기반응챔버(111) 내에구비되어, 상기반응챔버(111) 내온도를상승시키는히팅블록(117); 상기반응챔버(111) 내에서 WF6와상기반응가스반응에따라형성된파우더가포집되는쿨링블록(119); 및상기포집된파우더를가스화시키기위한플로린계라디칼을상기반응챔버(111) 내로공급하기위한플라즈마공급원(115)을포함한다.
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公开(公告)号：KR1020140010686A
公开(公告)日：2014-01-27
申请号：KR1020120077268
申请日：2012-07-16
Applicant: (주)트리플코어스코리아
IPC: H01L21/02
CPC classification number: H01L21/67034 , H01L21/205 , H01L21/67253
Abstract: Provided is a pump cleaning apparatus of a semiconductor process system that includes a reaction gas generation part for generating reaction gas active species supplied to a fore line; and a control part for controlling the operation of the reaction gas generation part. The pump cleaning apparatus is equipment for controlling a byproduct and a pump of a semiconductor process system including a fore line between a pump and a process chamber, a pump connected to a process chamber, and the process chamber for a semiconductor process.
Abstract translation: 提供一种半导体工艺系统的泵清洗装置，其包括用于产生供给前级管线的反应气体活性物质的反应气体产生部件; 以及用于控制反应气体产生部分的操作的控制部分。 泵清洁装置是用于控制副产物的设备和包括在泵和处理室之间的前一行的半导体处理系统的泵，连接到处理室的泵和用于半导体工艺的处理室。
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公开(公告)号：KR101265818B1
公开(公告)日：2013-05-20
申请号：KR1020110113497
申请日：2011-11-02
Applicant: (주)트리플코어스코리아
IPC: H05H1/46 , H01L21/205
Abstract: 본발명에따른플라즈마반응기및 이를이용한가스스크러버는플라즈마가형성되는방전아우터바디(32) 내부에자기력을발생시키는자기력발생유닛(40)이배치되고상기자기력발생유닛(40)이쿨러(44)에의해냉각됨으로서고온으로형성되는방전아우터바디(32) 내부에서도자기력을효과적으로발생시키는효과가있다.
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公开(公告)号：KR101427719B1
公开(公告)日：2014-09-30
申请号：KR1020120077268
申请日：2012-07-16
Applicant: (주)트리플코어스코리아
IPC: H01L21/02
Abstract: 반도체 공정이 진행되는 공정챔버, 상기 공정챔버와 연결된 펌프, 및 상기 공정챔버와 펌프 사이의 포어라인을 포함하는 반도체 공정 시스템의 펌프 및 배기라인의 부산물제어 장치로서, 상기 포어라인으로 주입되는 반응가스 활성종을 생성하기 위한 반응가스 생성부; 및 상기 반응가스 생성부의 동작을 제어하기 위한 제어부를 포함하는 것을 특징으로 하는 반도체 공정 시스템의 펌프 세정 장치가 제공된다.
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