公开(公告)号：KR101430062B1

公开(公告)日：2014-08-14

申请号：KR1020140050471

申请日：2014-04-28

Applicant: (주)해피글로벌솔루션

Inventor： 윤해근 ,  하재규

IPC: H01L21/02

CPC classification number: F15D1/02 ,  F15D1/08 ,  H01L21/02

Abstract: The present invention relates to a fluid acceleration type vacuum piping apparatus cable of preventing particles in reaction gas from being adsorbed in an inner wall of a vacuum pipe and accelerating a flow rate of reaction gas passing through a vacuum pipe during a process of discharging the reaction gas generated from a reaction chamber for a semiconductor process. More particularly, the present invention relates to a fluid acceleration type vacuum piping apparatus cable of preventing reaction gas flowing through the vacuum pipe from generating a vertex in an inner wall of the vacuum pip by mounting a vertex prevention pipe part at the center of the vacuum pipe to reduce the reduction of the flow rate of the reaction gas, accelerating a flow rate of reaction gas flowing through the vortex prevention pipe part by injecting gas at high pressure along an inner wall of the vortex prevention pipe part by mounting a gas injection pipe part at a center of the vortex prevention pipe part and a flow rate of the reaction gas by attenuating a friction force between inner sidewalls of the vortex prevention pipe part. According to the present invention prevents, a gas injection hole of the gas injection pipe part injects gas in a flow direction of the reaction gas into the vacuum pipe to accelerate a flow rate of the reaction gas. Therefore, particles are prevented from being adsorbed in an inner wall of the vacuum pipe.

Abstract translation: 本发明涉及一种防止反应气体中的颗粒吸附在真空管的内壁中并加速在反应过程中通过真空管的反应气体的流量的流体加速型真空管道装置电缆 从用于半导体工艺的反应室产生的气体。 更具体地，本发明涉及一种流体加速型真空管道装置电缆，其防止流经真空管的反应气体在真空管的内壁中产生顶点，通过将顶点防止管部分安装在真空中心 管，以减少反应气体的流量，通过沿着防涡流管部的内壁高压注入气体来加速流过防涡流管部的反应气体的流量，通过安装气体喷射管 部分在防涡流管部分的中心处，并且通过减弱防涡流管部分的内侧壁之间的摩擦力来产生反应气体的流量。 根据本发明，防止气体注入管部分的气体注入孔将反应气体的流动方向的气体注入真空管中，以加速反应气体的流量。 因此，防止了颗粒被吸附在真空管的内壁中。