公开(公告)号：KR101572309B1

公开(公告)日：2015-11-26

申请号：KR1020130042823

申请日：2013-04-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가토히토시 ,  히시야가츠유키

IPC: H01L21/205 ,  H01L21/316

CPC classification number: C23C16/4584 ,  C23C16/4401 ,  C23C16/46

Abstract: 기판처리장치는, 진공용기와, 상기진공용기내에설치되고, 원형의기판이적재되는동시에회전되는회전테이블이며, 표면에상기기판보다도직경이큰 원형의오목부가설치되고, 당해오목부내에는당해오목부및 상기기판보다도직경이작고, 상기오목부의저부보다도높은위치에설치된원형의기판적재부가설치되고, 당해기판적재부의중심이, 상기오목부의중심보다도상기회전테이블의외주부측에편심되어있는회전테이블과, 상기기판에대하여처리가스를공급하기위한처리가스공급부와, 상기진공용기내를진공배기하기위한진공배기기구를포함한다.

公开(公告)号：KR1020130118265A

公开(公告)日：2013-10-29

申请号：KR1020130042823

申请日：2013-04-18

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 가토히토시 ,  히시야가츠유키

IPC: H01L21/205 ,  H01L21/316

CPC classification number: C23C16/4584 ,  C23C16/4401 ,  C23C16/46

Abstract: PURPOSE: A substrate processing apparatus is provided to prevent particles from being attached to a substrate and to suppress the degradation of a throughput. CONSTITUTION: A vacuum container (1) includes a ceiling plate (11) and a container body (12). A ring-shaped sealing member (13) is installed on the peripheral part of the upper surface of the container body. A rotary table (2) loads a circular substrate. A circular concave part with a diameter which is larger than the diameter of the circular substrate is installed on the surface of the rotary table. A substrate loading unit (23) is installed in the circular concave part. The diameter of the substrate loading unit is smaller than the diameters of the circular substrate and the circular concave part. A processing gas supply unit supplies processing gases to the circular substrate. [Reference numerals] (AA) Plasma generation gas; (BB,CC,DD,EE) Nitrogen (N_2) gas

Abstract translation: 目的：提供一种基板处理装置，以防止颗粒附着在基板上并抑制生产量的劣化。 构成：真空容器（1）包括顶板（11）和容器主体（12）。 环状密封件（13）安装在容器主体的上表面的周边部分上。 旋转台（2）装载圆形基板。 直径大于圆形基板的直径的圆形凹部安装在旋转台的表面上。 基板装载单元（23）安装在圆形凹部中。 基板装载单元的直径小于圆形基板和圆形凹部的直径。 处理气体供给单元向圆形基板供给处理气体。 （标号）（AA）等离子体产生气体; （BB，CC，DD，EE）氮（N_2）气体