公开(公告)号：KR101262110B1

公开(公告)日：2013-05-14

申请号：KR1020110093220

申请日：2011-09-16

Applicant: 동명대학교산학협력단

Inventor： 박준협 ,  김희연 ,  남현석 ,  오영련

IPC: G01L1/16 ,  G01L1/26

Abstract: 압전막의잔류응력을효과적으로측정할수 있게하는잔류응력측정용적층압전박막구조가개시되어있다. 적층압전박막구조는잔류응력측정을위한적층압전박막구조에있어서, 기판상의중심부에형성되는미러반사면; 및상기미러반사면의측면으로부터상기기판의외곽으로형성되며, 소정의폭 및소정의길이를갖는하나이상의빔을포함한다.

公开(公告)号：KR1020130029861A

公开(公告)日：2013-03-26

申请号：KR1020110093220

申请日：2011-09-16

Applicant: 동명대학교산학협력단

Inventor： 박준협 ,  김희연 ,  남현석 ,  오영련

IPC: G01L1/16 ,  G01L1/26

Abstract: PURPOSE: A stacked piezoelectric thin film structure for measuring residual stress is provided to efficiently measure residual strain according to the residual stress of the stacked piezoelectric thin film. CONSTITUTION: A stacked piezoelectric thin film structure for measuring residual stress comprises a mirror reflecting face(402) and one or more beams(403). The mirror reflecting face is formed at the center of a substrate. The beams are formed from the lateral sides of the mirror reflecting face to the edge of the substrate and have predetermined width and length.

Abstract translation: 目的：提供一种用于测量残余应力的堆叠式压电薄膜结构，以根据层叠的压电薄膜的残余应力有效地测量残余应变。 构成：用于测量残余应力的叠层压电薄膜结构包括反射镜反射面（402）和一个或多个光束（403）。 镜面反射面形成在基板的中心。 光束从反射镜反射面的侧面到基板的边缘形成并且具有预定的宽度和长度。