公开(公告)号：KR1020040013979A

公开(公告)日：2004-02-14

申请号：KR1020020047135

申请日：2002-08-09

Applicant: 백홍구

Inventor： 백홍구 ,  이덕연

IPC: C01G23/04

CPC classification number: C01G23/047 ,  A61K6/0235

Abstract: PURPOSE: Provided is a method for producing titanium oxide-based materials using micro-hollow cathode emission, which is processed under atmospheric pressure, and reduces the cost and increases the productivity in the field of advanced materials. CONSTITUTION: The method comprises the steps of generating oxygen plasma or ozone by micro-hollow cathode emission, and oxidizing a titanium-based substance by the oxygen plasma or ozone to form a titanium oxide-based material(TixOy). In particular, the titanium oxide-based material(TixOy) is titanium dioxide(TiO2). In the case of a dental implant material, the method further comprises the step for forming an implant having a desired shape from a titanium-based material. Then, the implant is coated with the stable TixOy layer produced by the aforesaid method.

Abstract translation: 目的：提供一种使用微空心阴极发射的氧化钛系材料的制造方法，其在大气压下进行处理，降低成本并提高先进材料领域的生产率。 方案：该方法包括通过微空心阴极发射产生氧等离子体或臭氧，并通过氧等离子体或臭氧氧化钛基物质以形成氧化钛基材料（TixOy）的步骤。 特别地，氧化钛系材料（TixOy）是二氧化钛（TiO 2）。 在牙科植入材料的情况下，该方法还包括从钛基材料形成具有期望形状的植入物的步骤。 然后，用上述方法制备的稳定的TixOy层涂覆植入物。

公开(公告)号：KR1020040022639A

公开(公告)日：2004-03-16

申请号：KR1020020054250

申请日：2002-09-09

Applicant: 백홍구

Inventor： 백홍구 ,  이덕연

IPC: C23C14/06

CPC classification number: C23C14/358 ,  C23C14/0611 ,  C23C14/0658 ,  C23C14/3407

Abstract: PURPOSE: A method for forming a carbon based material thin film is provided to form a diamond-like carbon thin film on the surface of an object using micro-hallow emission or ion beam assisted deposition so that the diamond-like carbon thin film is used as a medical implant material or advanced material. CONSTITUTION: The method for forming a carbon based material thin film is characterized in that the carbon based material thin film is formed by producing carbon ion plasma from carbon based material projected in the vacuum state using micro-hallow emission and pressing the produced carbon ion plasma onto an object to be coated, wherein the carbon based material is carbon nitride (C3N4) gas. The method for forming a carbon based material thin film is characterized in that the carbon based material thin film is formed by subsidiarily depositing ions in the high energy state on an object to be coated as evaporating the carbon based material using electron beam by ion beam assist depositing the carbon based material projected in the vacuum state, wherein the carbon based material is carbon nitride (C3N4) gas.

Abstract translation: 目的：提供一种形成碳基材料薄膜的方法，以使用微型发光或离子束辅助沉积在物体的表面上形成类金刚石碳薄膜，从而使用类金刚石碳薄膜 作为医疗植入材料或先进材料。 构成：用于形成碳基材料薄膜的方法的特征在于，通过使用微型卤代发生在真空状态下投射的碳基材料制造碳离子等离子体，并且对生成的碳离子等离子体进行加压而形成碳基材料薄膜 其中碳基材料是碳氮化物（C 3 N 4）气体。 形成碳基材料薄膜的方法的特征在于，碳基材料薄膜是通过在待涂覆物体上辅助地沉积高能态的离子而形成的，因为通过离子束辅助使用电子束蒸发碳基材料 沉积在真空状态下投影的碳基材料，其中碳基材料是碳氮化物（C 3 N 4）气体。