公开(公告)号：KR1020080040980A

公开(公告)日：2008-05-09

申请号：KR1020060109022

申请日：2006-11-06

Applicant: 삼성전자주식회사

Inventor： 조용진 ,  현찬경 ,  공정흥 ,  이상호 ,  최일중

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  H01L21/67248

Abstract: A wafer stage including a temperature control unit and an immersion exposure apparatus having the same are provided to increase the accuracy of circuit pattern formation by preventing a local temperature change on a unit device region. A wafer stage(130) is divided into plural latticed unit regions(136). A projection optical system is located on an upper portion of the wafer stage and forms an exposure pattern on a wafer. An immersion region unit(138) is arranged between the projection optical system and the wafer stage. A plurality of temperature controllers are arranged on the unit regions. The temperature controller has a detection sensor and a thermal supply section. The detection sensor detects temperature of the wafer received on an upper surface of the wafer stage. The thermal supplying section induces a thermal medium to the wafer. A controller is electrically connected to the detection sensor and the thermal supplying section.

Abstract translation: 提供包括温度控制单元和具有该温度控制单元的浸没曝光设备的晶片台，以通过防止单元设备区域上的局部温度变化来提高电路图形形成的精度。 晶片台（130）被分成多个网格单元区域（136）。 投影光学系统位于晶片台的上部，并在晶片上形成曝光图案。 浸没区域单元（138）布置在投影光学系统和晶片台之间。 多个温度控制器布置在单元区域上。 温度控制器具有检测传感器和热供应部分。 检测传感器检测在晶片台的上表面上接收的晶片的温度。 热供应部分向晶片引入热介质。 控制器电连接到检测传感器和热供应部分。

公开(公告)号：KR1020080055321A

公开(公告)日：2008-06-19

申请号：KR1020060128484

申请日：2006-12-15

Applicant: 삼성전자주식회사

Inventor： 조용진 ,  공정흥

IPC: H01L21/027

CPC classification number: G03F7/70125 ,  G03F7/705

Abstract: A method for compensating lens aberration and a projection exposure apparatus capable of performing the same are provided to compensate astigmatism in various angles by transforming and rotating an aberration compensation lens. An illumination optical system induces light generated from a light source to a mask having an image pattern. A projection optical system includes plural lenses to project the projective light passing through the mask to a substrate. A lens(176) for compensating aberration is arranged between the lenses and compensates aberration of the projection optical system. A first actuator(182) transforms the lens for compensating aberration to compensate the aberration. A second actuator(184) rotates the transformed lens for compensating aberration to compensate the aberration. The lens for compensating lens is connected to the first actuator. The lens for compensating aberration is supported by a second support unit(178). The second support unit is connected to the second actuator.

Abstract translation: 提供一种用于补偿透镜像差的方法以及能够执行该像差的投影曝光装置，以通过变换和旋转像差补偿透镜来补偿各种角度的像散。 照明光学系统将从光源产生的光引导到具有图像图案的掩模。 投影光学系统包括多个透镜，用于将通过掩模的投射光投射到基板。 用于补偿像差的透镜（176）布置在透镜之间并补偿投影光学系统的像差。 第一致动器（182）转换透镜以补偿像差以补偿像差。 第二致动器（184）使变形透镜旋转以补偿像差以补偿像差。 用于补偿透镜的透镜连接到第一致动器。 用于补偿像差的透镜由第二支撑单元（178）支撑。 第二支撑单元连接到第二致动器。

公开(公告)号：KR101423611B1

公开(公告)日：2014-07-30

申请号：KR1020080004955

申请日：2008-01-16

Applicant: 삼성전자주식회사

Inventor： 류주아 ,  공정흥 ,  안요한 ,  이명기 ,  이양구 ,  진훤 ,  하헌환

IPC: H01L21/304 ,  H01L21/027 ,  H01L21/683

CPC classification number: B08B1/007 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67028 ,  H01L21/67057

Abstract: 본 발명은 척 부재와, 척 부재의 기판 안착 면상의 이물질을 제거하는 클리닝 툴을 가지는 척 세정 부재와, 클리닝 툴을 세정하는 툴 세정 부재가 처리실 내에 서로 인접한 위치에 배치된 기판 처리 장치와 노광 장치를 제공하고, 툴 세정 부재를 이용하여 클리닝 툴을 세정하는 방법을 제공한다.
이러한 특징에 의하면, 클리닝 툴에 의한 척 부재의 역 오염을 방지할 수 있고, 노광 공정에 있어서 척 부재 상에 존재하는 파티클에 의한 디포커스 현상을 최소화할 수 있다.
척 부재, 클리닝 툴, 툴 세정 부재, 노광, 디포커스

公开(公告)号：KR1020090079036A

公开(公告)日：2009-07-21

申请号：KR1020080004955

申请日：2008-01-16

Applicant: 삼성전자주식회사

Inventor： 류주아 ,  공정흥 ,  안요한 ,  이명기 ,  이양구 ,  진훤 ,  하헌환

IPC: H01L21/304 ,  H01L21/027 ,  H01L21/683

CPC classification number: B08B1/007 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67028 ,  H01L21/67057 ,  H01L21/3046 ,  H01L21/0274 ,  H01L21/6833

Abstract: A substrate processing apparatus, an exposure apparatus, and a cleaning method of a cleaning tool are provided to minimize a defocusing effect due to particles on a stage in an exposure process by improving a structure thereof. A substrate processing apparatus includes a process chamber(100), a chuck member(200), a chuck cleaning member(400), and a tool cleaning member(500). The process chamber provides a space for performing a substrate processing process. The chuck member is installed at the inside of the process chamber. A substrate is loaded on the chuck member. The chuck cleaning member is arranged at one side of the chuck member. The chuck cleaning member includes a cleaning tool(410) for removing foreign materials from a substrate loading surface of the chuck member. The tool cleaning member is used for cleaning the cleaning tool.

Abstract translation: 提供基板处理装置，曝光装置和清洁工具的清洁方法，以通过改善其结构来最小化曝光过程中的台上的颗粒的散焦效应。 基板处理装置包括处理室（100），卡盘构件（200），卡盘清洁构件（400）和工具清洁构件（500）。 处理室提供用于执行基板处理过程的空间。 卡盘构件安装在处理室的内部。 基板被装载在卡盘构件上。 卡盘清洁部件布置在卡盘部件的一侧。 卡盘清洁构件包括用于从卡盘构件的基板装载表面去除异物的清洁工具（410）。 工具清洁部件用于清洁清洁工具。