公开(公告)号：KR1020070106835A

公开(公告)日：2007-11-06

申请号：KR1020060039168

申请日：2006-05-01

Applicant: 삼성전자주식회사

Inventor： 구자훈 ,  성재현 ,  이주원

IPC: H01L21/304

Abstract: A substrate cleaning apparatus is provided to clean effectively a photoresist layer existing on the edge and bevel of a substrate by including a nozzle having a slit-type entrance for sufficiently making a cleaning solution come in contact with the edge and bevel of the substrate. A substrate(10) having a photoresist layer(12) is supported by a chuck(102). The chuck is rotated by a driving part. A first supply part(104) supplies a cleaning solution through a nozzle(106) having a slit-type entrance for removing the photoresist existing on the edge and bevel of the upper surface of the substrate, installed over the chuck. A second supply part(108) supplies a cleaning solution for removing the photoresist on the edge and bevel of the lower surface of the substrate, installed under the substrate. A driving part straightly drives the first supply part and the second supply part to supply the cleaning solution to the edge and bevel of the substrate.

Abstract translation: 提供了一种基板清洁装置，通过包括具有狭缝型入口的喷嘴来有效地清洁存在于基板的边缘和斜面上的光致抗蚀剂层，以使清洁溶液与基板的边缘和斜面接触。 具有光致抗蚀剂层（12）的基板（10）由卡盘（102）支撑。 卡盘由驱动部分旋转。 第一供应部分（104）通过具有狭缝型入口的喷嘴（106）提供清洁溶液，所述喷嘴（106）用于去除存在于安装在卡盘上的基板的边缘和斜面上的光致抗蚀剂。 第二供应部件（108）提供清洁溶液，用于去除安装在基板下方的基板的下表面的边缘和斜面上的光致抗蚀剂。 驱动部分直接驱动第一供应部分和第二供应部分，以将清洁溶液供应到基板的边缘和斜面。