公开(公告)号：KR1020070115178A

公开(公告)日：2007-12-05

申请号：KR1020060049212

申请日：2006-06-01

Applicant: 삼성전자주식회사

Inventor： 한장훈 ,  김형돈 ,  서영갑 ,  김병동 ,  양희영 ,  이호종

IPC: H01L21/3065

CPC classification number: H01J37/32807 ,  H01L21/6719

Abstract: A display substrate processing apparatus is provided to realize a plasma space symmetric to all directions by positioning additionally a second switch for opening and closing a connection path inside of a main chamber except for a first switch. A display substrate is loaded to a transfer chamber(200). A main chamber(300) performs a plasma process to the display substrate. A connection part(400) offers a connection path for transferring the display substrate by connecting the main chamber with the transfer chamber. A first switch(600) opens and closes the connection path of the main chamber from the outside. A second switch(500) opens and closes the connection path of the main chamber from the inside.

Abstract translation: 提供了一种显示基板处理装置，通过另外设置用于打开和关闭除第一开关之外的主室内的连接路径的第二开关来实现与所有方向对称的等离子体空间。 将显示基板装载到传送室（200）。 主室（300）对显示基板进行等离子体处理。 连接部件（400）通过将主室与传送室连接来提供用于传送显示基板的连接路径。 第一开关（600）从外部打开和关闭主室的连接路径。 第二开关（500）从内部打开和关闭主室的连接路径。

公开(公告)号：KR1020070097767A

公开(公告)日：2007-10-05

申请号：KR1020060028433

申请日：2006-03-29

Applicant: 삼성전자주식회사

Inventor： 김형돈

IPC: H01L21/3065

CPC classification number: H01J37/3244 ,  C23C16/50 ,  H01J37/32532 ,  H01L21/67069

Abstract: A shower electrode assembly and a plasma processing apparatus are provided to increase an available time of the apparatus and to reduce a changing cost by attaching and detaching the shower electrode assembly quickly through a connecting device. A shower electrode assembly includes an electrode plate(110) having a hole where the process gas is sprayed, a joint rod(113) formed by an extended part of the electrode plate, and a fastener which is combined in an end of the joint rod(113) and fixes the electrode plate(110) to a chamber(200). A shielding member(140) is arranged in order to surround at least a part of an edge lateral side and an edge front side of the electrode plate(110).

Abstract translation: 提供了一种淋浴电极组件和等离子体处理装置，以通过连接装置快速地安装和拆卸淋浴电极组件来增加设备的可用时间并降低变化的成本。 淋浴电极组件包括具有喷射处理气体的孔的电极板（110），由电极板的延伸部分形成的接头杆（113）和紧固件，该紧固件组合在连接杆 （113）并将电极板（110）固定到室（200）。 为了包围电极板（110）的边缘侧面和边缘前侧的至少一部分，布置有屏蔽部件（140）。

公开(公告)号：KR1020070113612A

公开(公告)日：2007-11-29

申请号：KR1020060047101

申请日：2006-05-25

Applicant: 삼성전자주식회사

Inventor： 김형돈 ,  서영갑 ,  양희영

IPC: H01L21/3065

CPC classification number: H01J37/32559 ,  H01L21/67069

Abstract: An electrode for etching equipment is provided to transfer an upper electrode to etching equipment while maintaining planarity by forming a jig coupling groove in the center of the upper electrode so that a jig is coupled to the jig coupling groove when the upper electrode is transferred to the etching equipment. Reaction gas is supplied to a chamber. An electrostatic chuck on which a substrate is mounted is installed in a lower part of the chamber. A lower electrode is disposed under the electrostatic chuck. An upper electrode(30) is disposed in an upper part of the chamber, including a plurality of jig coupling grooves that are distributed over the upper electrode including the center part of the surface of the upper electrode. The inside of the jig coupling groove can be made of a screw type.

Abstract translation: 提供用于蚀刻设备的电极，用于通过在上电极的中心形成夹具耦合槽，同时保持平面性，将上电极传送到蚀刻设备，从而当上电极转移到 蚀刻设备。 将反应气体供应到室。 安装有基板的静电卡盘安装在室的下部。 下电极设置在静电卡盘下方。 上部电极（30）设置在室的上部，包括分布在包括上部电极的表面的中心部分的上部电极上的多个夹具联接槽。 夹具联接槽的内部可以由螺钉类型制成。

公开(公告)号：KR1020070091965A

公开(公告)日：2007-09-12

申请号：KR1020060021798

申请日：2006-03-08

Applicant: 삼성전자주식회사

Inventor： 김형돈 ,  양희영

IPC: H01L21/3065

CPC classification number: H01J37/32532 ,  H01J37/32541 ,  H01J37/32559 ,  H01L21/67069

Abstract: An electrode assembly for a plasma processing apparatus is provided to prevent the surface of an electrode from being damaged by arcing generated at the edge of an upper electrode assembly by surrounding the lateral surface and the front surface of the edge of the upper electrode assembly by a mask member. An injection hole(231) for injecting reaction gas is disposed in an electrode plate(230). A mask member(240) is disposed to surround at least a part of the lateral surface and front surface of the edge of the electrode plate. A base(220) can be coupled to the electrode plate to supply a conduction unit and a sealing unit. The base is insulated from the chamber by an insulation plate(210). One surface of the insulation plate is fixed to the chamber, and the other surface of the insulation plate is coupled to the base.

Abstract translation: 提供了一种用于等离子体处理装置的电极组件，用于通过将上电极组件的边缘的侧表面和前表面围绕上电极组件的侧表面和前表面来防止电极的表面被上电极组件的边缘产生的电弧损坏 面具会员。 在电极板（230）中设置有用于注入反应气体的注入孔（231）。 掩模构件（240）设置成围绕电极板的边缘的侧表面和前表面的至少一部分。 基座（220）可以耦合到电极板以提供导电单元和密封单元。 基座通过绝缘板（210）与腔室绝缘。 绝缘板的一个表面固定在腔室上，绝缘板的另一个表面与底座相连。