公开(公告)号：KR1020070009282A

公开(公告)日：2007-01-18

申请号：KR1020050064422

申请日：2005-07-15

Applicant: 삼성전자주식회사

Inventor： 남승만

IPC: B25J9/22 ,  B25J19/00

Abstract: A manipulator aligner is provided to prevent an installation error of a manipulator when re-controlling the manipulator with a controller by sensing the constant position of the manipulator with a sensing unit set in advance. A manipulator aligner comprises extract and ground electrodes(242,244) formed with a hole(246) where a positive ion is extracted at each center; a driving unit(260) moving the position of the manipulator; and a sensing unit(300) detecting whether or not the manipulator is placed at the constant position. The sensing unit comprises a first sensing unit(310) mounted at one side of the manipulator; and a second sensing unit(320) installed out of the manipulator and corresponded to the first sensing unit. The sensing unit is connected to a control unit generating a predetermined electrical signal, corresponding to the sensed data and the control unit is connected to a display member allowing a user to recognize the electrical signal.

Abstract translation: 提供操纵器对准器，以通过用预先设置的感测单元感测机械手的恒定位置来重新控制具有控制器的操纵器来防止操纵器的安装错误。 操纵器对准器包括形成有在每个中心处提取正离子的孔（246）的提取物和接地电极（242,244） 移动所述操纵器的位置的驱动单元（260）; 以及检测机械手是否被置于恒定位置的检测单元（300）。 感测单元包括安装在操纵器一侧的第一传感单元（310） 以及安装在所述操纵器外并且对应于所述第一感测单元的第二感测单元（320）。 感测单元连接到控制单元，该控制单元产生对应于感测数据的预定电信号，并且控制单元连接到允许用户识别电信号的显示构件。

公开(公告)号：KR100553685B1

公开(公告)日：2006-02-24

申请号：KR1020030030645

申请日：2003-05-14

Applicant: 삼성전자주식회사

Inventor： 남승만 ,  임병기 ,  장진형

IPC: H01L21/68

CPC classification number: B25J15/0616 ,  B25J15/0052 ,  H01L21/67781 ,  H01L21/6838

Abstract: 본 발명은 웨이퍼 컨테이너로부터 웨이퍼를 언로딩하는 이송장치에 관한 것으로, 상기 장치는 멀티 아암부, 제어부, 그리고 진공펌프를 가진다. 멀티 아암부는 내부에 진공라인이 각각 형성되어 진공에 의해 반도체 기판을 흡착하는 복수의 블레이드들, 상기 복수의 블레이드들을 고정하는 고정체, 그리고 상기 고정체를 회전 또는 직선 이동하는 이동부를 가지며, 상기 복수의 블레이드들 내에 형성된 진공라인은 선택적으로 개방 또는 폐쇄된다.
상술한 구조를 가지는 본 발명에 의하면 컨테이너 내에 빈 슬롯이 존재하는 경우에도 복수의 웨이퍼들을 동시에 언로딩할 수 있는 효과가 있다
이송장치, 멀티 아암, 싱글 아암, 솔레노이드 밸브

公开(公告)号：KR1020040098329A

公开(公告)日：2004-11-20

申请号：KR1020030030645

申请日：2003-05-14

Applicant: 삼성전자주식회사

Inventor： 남승만 ,  임병기 ,  장진형

IPC: H01L21/68

CPC classification number: B25J15/0616 ,  B25J15/0052 ,  H01L21/67781 ,  H01L21/6838

Abstract: PURPOSE: A transfer apparatus and method are provided to unload selectively a plurality of wafers from an FOUP(Front Open Unified Pod) by controlling corresponding vacuum lines of a multi-arm unit using a control unit. CONSTITUTION: A transfer apparatus includes a multi-arm unit, a control unit, and a vacuum pump. The multi-arm unit includes a plurality of blades(420) for adsorbing semiconductor substrates, a fixing body for fixing the blades, a transfer part for moving the fixing body, and a plurality of vacuum lines(450). The control unit is used for controlling the operation of the multi-arm unit. The vacuum pump is connected with the vacuum lines. The vacuum lines are formed in the blades, respectively. The vacuum lines are selectively opened and closed.

Abstract translation: 目的：提供一种传送装置和方法，通过使用控制单元控制多臂单元的相应真空线，从FOUP（前开式统一荚）中选择性地卸载多个晶片。 构成：传送装置包括多臂单元，控制单元和真空泵。 多臂单元包括用于吸附半导体基板的多个叶片（420），用于固定叶片的固定体，用于移动固定体的转印部分和多个真空线（450）。 控制单元用于控制多臂单元的操作。 真空泵与真空管线连接。 真空管线分别形成在叶片中。 选择性地打开和关闭真空管线。

公开(公告)号：KR1020020037849A

公开(公告)日：2002-05-23

申请号：KR1020000067770

申请日：2000-11-15

Applicant: 삼성전자주식회사

Inventor： 남승만 ,  금경수

IPC: H01L21/26

Abstract: PURPOSE: An ion implanter is provided to prevent a wafer from being damaged by a wrong initial position of a platen, by installing a distance sensor capable of inspecting an initial horizontal state of the platen so that the horizontal state of the platen is inspected and the wafer is loaded. CONSTITUTION: A spacer for implanting ions to the wafer is formed in a chamber(301). The upper surface of the chamber is made of a transparent glass plate. An ion beam injecting unit(311) injects ion beams to the wafer, installed to penetrate the sidewall of the chamber. The wafer is loaded to the platen(307) installed in the lower portion of the chamber. A scan shaft(309) supports the platen from a portion lower than the platen. A plurality of distance sensors(315) are mounted on the glass plate to sense at least three different positions on the platen and to measure a distance. A horizontal control unit(317) compares input data when the values measured by the distance sensors are inputted and outputs a signal which determines a horizontal state of the platen.

Abstract translation: 目的：提供一种离子注入机，通过安装能够检查压板初始水平状态的距离传感器，以便对压板的水平状态进行检查，防止晶片受到压板错误的初始位置的损坏， 晶片被加载。 构成：在室（301）中形成用于将离子注入晶片的间隔物。 室的上表面由透明玻璃板制成。 离子束注入单元（311）将离子束注入到晶片上，以便穿透室的侧壁。 将晶片装载到安装在室的下部的压板（307）上。 扫描轴（309）从低于压板的部分支撑压板。 多个距离传感器（315）安装在玻璃板上以感测台板上的至少三个不同位置并测量距离。 当输入由距离传感器测量的值时，水平控制单元（317）比较输入数据，并输出确定压板的水平状态的信号。

公开(公告)号：KR1020040011037A

公开(公告)日：2004-02-05

申请号：KR1020020044115

申请日：2002-07-26

Applicant: 삼성전자주식회사

Inventor： 남승만

IPC: H01L21/68

Abstract: PURPOSE: A cassette loader of semiconductor device manufacturing equipment is provided to be capable of improving the operation ratio of the equipment. CONSTITUTION: A cassette loader of a semiconductor device manufacturing equipment is provided with a pedestal assembly hinged with the lower portion of a gate of a loadlock chamber and located at the lower portion of a cassette(C) for supporting and rotating the cassette, a support plate(14) for supporting the corresponding surface of the pedestal assembly and for being moved up and down by an elevator unit, and a limit switch(30) for checking the contact between the support plate and the corresponding surface of the pedestal assembly. At this time, the limit switch is capable of checking the normal position state of the pedestal assembly.

Abstract translation: 目的：提供半导体器件制造设备的盒式装载机能够提高设备的操作比。 构成：半导体器件制造设备的盒式装载机设置有与负荷锁定室的门的下部铰接并位于盒（C）的下部的基座组件，用于支撑和旋转盒，支架 板（14），用于支撑基座组件的对应表面并且由电梯单元上下移动;以及限位开关（30），用于检查支撑板和基座组件的对应表面之间的接触。 此时，限位开关能够检查基座组件的正常位置状态。

公开(公告)号：KR1020030061636A

公开(公告)日：2003-07-22

申请号：KR1020020002298

申请日：2002-01-15

Applicant: 삼성전자주식회사

Inventor： 남승만

IPC: H01L21/265

CPC classification number: H01L21/67259 ,  H01L21/26586 ,  H01L21/68

Abstract: PURPOSE: An apparatus for inspecting an alignment angle of an object of ion implanting equipment is provided to prevent a channeling phenomenon caused by ion implantation and improve process reliability and yield by correcting the position of the object so that the object can be located in a precise position. CONSTITUTION: The scale(16) that displays the angle to the center of the object is formed in the edge of a body(12), having a type of an object in an ion implantation process. A center axis(14) is formed of a type protruding from the center of the body. A display unit displays the angle of the scale in a direction that the load from the center of the center axis operates, capable of rotating with respect to the center axis.

Abstract translation: 目的：提供一种用于检查离子注入设备的物体的对准角度的装置，以防止由离子注入引起的沟道现象，并通过校正物体的位置来提高工艺可靠性和屈服度，使得物体可以位于精确的 位置。 构成：显示与物体中心的角度的刻度（16）形成在具有离子注入工艺中的物体类型的主体（12）的边缘中。 中心轴线（14）由从主体的中心突出的类型形成。 显示单元以能够相对于中心轴旋转的中心轴的中心的负载的方向显示标尺的角度。

公开(公告)号：KR1020000059700A

公开(公告)日：2000-10-05

申请号：KR1019990007507

申请日：1999-03-08

Applicant: 삼성전자주식회사

Inventor： 김수만 ,  남승만

IPC: H01L21/265

Abstract: PURPOSE: A method of operating a pumping system of an ion implantation equipment is to remove powder generated in a terminal roughing pump from a noxious gas, thereby improving a stability of a pumping operation. CONSTITUTION: A method of operating a pumping system comprising a source chamber for ionizing a source gas, a beam line chamber for implanting ions supplied in the form of an ion beam, a terminal roughing pump for making the source chamber and the beam line chamber high vacuous, and a high vacuum pump for maintaining a high vacuous state between the source chamber and terminal roughing pump and between the beam line chamber and the terminal roughing pump, comprises the steps of turning off a power source of the source chamber and the beam line chamber, turning off the high vacuous pump connected to the source chamber and the beam line chamber, supplying a venting gas through a venting gas supplying line to the source chamber.

Abstract translation: 目的：操作离子注入设备的泵送系统的方法是将终端粗抽泵中产生的粉末从有害气体中除去，从而提高泵送操作的稳定性。 构成：一种操作泵送系统的方法，其包括用于离子化源气体的源室，用于注入以离子束形式供应的离子的束线室，用于使源室和束线室高的端子粗糙泵 真空泵和高真空泵，用于在源腔室和端子粗糙泵之间以及射束线室和端子粗抽泵之间保持高的真空状态，包括以下步骤：关闭源室和束线的电源 关闭连接到源室和射束管室的高空腔泵，将通气气体通过排放气体供应管线供应到源室。

公开(公告)号：KR1020070084978A

公开(公告)日：2007-08-27

申请号：KR1020060017438

申请日：2006-02-22

Applicant: 삼성전자주식회사

Inventor： 남승만 ,  이준호

IPC: H01L21/02 ,  H01L21/68

Abstract: A wafer cassette is provided to block moisture passed through an opened portion of an upper plate by installing a first protective cover between a body unit and the upper plate. Ribs(263) for receiving wafers are formed on a body unit(262). An upper plate(265) is connected to the body unit and partially covers an upper portion of the body unit. A first protective cover(280) is disposed between the body unit and the upper plate. A wafer detecting sensor(267) is mounted on an upper surface of the rib and covered by a second protective cover(290). A lower plate(269) is connected to the body unit and covers the body unit. A part of the lower plate passes through a hole(270). A cable is buried in the hole through the penetrated portion. The first and second protective covers are formed of a transparent material.

Abstract translation: 提供晶片盒以通过在主体单元和上板之间安装第一保护盖来阻挡通过上板的开口部分的水分。 用于接收晶片的肋（263）形成在主体单元（262）上。 上板（265）连接到主体单元并且部分地覆盖主体单元的上部。 第一保护盖（280）设置在主体单元和上板之间。 晶片检测传感器（267）安装在肋的上表面上并由第二保护盖（290）覆盖。 下板（269）连接到主体单元并覆盖主体单元。 下板的一部分穿过孔（270）。 电缆通过穿透部分埋在孔中。 第一和第二保护盖由透明材料形成。

公开(公告)号：KR1020050108638A

公开(公告)日：2005-11-17

申请号：KR1020040033591

申请日：2004-05-12

Applicant: 삼성전자주식회사

Inventor： 남승만

IPC: H01L21/265

CPC classification number: H01J37/08 ,  H01J27/022 ,  H01J27/08 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/082

Abstract: 본 발명은 이온 주입 설비에 사용되는 이온 발생 장치로, 장치는 이온을 생성하는 소스 헤드와 이로부터 생성된 이온들 중 양이온을 추출하는 매니플레이터가 설치되는 소스 챔버를 가진다. 소스 챔버의 내면들에는 복수의 조각들로 이루어진 라이너가 장착된다. 일정 주기마다 기존의 라이너를 분리하고 새로운 라이너를 소스 챔버의 내면에 장착함으로써, 종래의 소스 챔버 내면을 세정하는 데 소요되는 시간을 크게 단축할 수 있다.

公开(公告)号：KR100439843B1

公开(公告)日：2004-07-12

申请号：KR1020020002298

申请日：2002-01-15

Applicant: 삼성전자주식회사

Inventor： 남승만

IPC: H01L21/265

CPC classification number: H01L21/67259 ,  H01L21/26586 ,  H01L21/68

Abstract: An object alignment inspecting apparatus is used to prevent a channeling phenomenon form occurring in an ion implantation process. The apparatus includes a body having the shape of an object to be processed and a series of graduations extending along its outer peripheral edge, a center post protruding from the center of the body; and an indicator having a rotary member freely rotatably mounted to the post and extending from the post to the graduations. In use, the alignment angle inspecting apparatus is placed on the disc of ion implantation equipment that is used to support the object during the ion implantation process. The relative rotational position of the apparatus on the disc is read. This information is used to determine whether the object, when placed on the disc, will assume a relative rotational position which will not give rise to the channeling phenomenon. Also, the object alignment inspecting apparatus may have a plumb mechanism and graduations so that the slope of the disc can be determined as well. The slope of the disc can be adjusted based on the reading taken form the plumb mechanism so as to also ensure that the channeling phenomenon will not occur.

Abstract translation: 使用物体对准检查装置来防止在离子注入过程中出现的沟道现象形式。 该设备包括具有待加工物体形状的主体和沿着其外周边缘延伸的一系列刻度，从该主体的中心突出的中心柱; 以及一个指示器，该指示器具有一个可自由转动地安装在该支柱上并从该支柱延伸到刻度的转动件。 使用时，将对准角度检测装置置于离子注入设备的盘片上，离子注入设备用于在离子注入过程中支撑物体。 装置在盘上的相对旋转位置被读取。 该信息用于确定物体放置在盘上时是否将呈现不会引起沟道现象的相对旋转位置。 而且，物体对准检查装置可以具有铅锤机构和刻度，以便也可以确定盘的斜度。 盘的斜率可以根据铅锤机构的读数进行调整，以确保不会出现沟道现象。