公开(公告)号：KR102042635B1

公开(公告)日：2019-11-08

申请号：KR1020120071643

申请日：2012-07-02

Applicant: 삼성전자주식회사

Inventor： 부재필 ,  김동수 ,  백강민 ,  서건식 ,  최재훈

IPC: H01L21/302

公开(公告)号：KR1020140003921A

公开(公告)日：2014-01-10

申请号：KR1020120071643

申请日：2012-07-02

Applicant: 삼성전자주식회사

Inventor： 부재필 ,  김동수 ,  백강민 ,  서건식 ,  최재훈

IPC: H01L21/302

CPC classification number: H01L21/67034 ,  H01L21/67028

Abstract: A single type drying device comprises a spin chuck, a drying chamber, and a drying fluid line. The spin chuck supports one substrate and rotates the substrate. The drying chamber receives the spin chuck. The drying chamber comprises an inlet in which a drying fluid is received for drying the substrate; an outlet through which the drying fluid is discharged; and a vortex exhaust which discharges a vortex of the drying fluid caused by rotating the spin chuck. The drying fluid line is connected to the inlet of the drying chamber. Therefore, the present invention prevents the disturbance of the inflow of the drying fluid caused by the vortex. Rinse solutions and/or minute particles included in the vortex are discharged through the vortex exhaust.

Abstract translation: 单一干燥装置包括旋转卡盘，干燥室和干燥流体管线。 旋转卡盘支撑一个基板并旋转基板。 干燥室接收旋转卡盘。 所述干燥室包括入口，在所述入口中接收干燥流体以干燥所述基底; 出口，干燥流体通过该出口排出; 以及通过旋转旋转卡盘而排出干燥流体涡流的涡流排出口。 干燥流体管线连接到干燥室的入口。 因此，本发明防止由涡流引起的干燥流体的流入的干扰。 包括在涡流中的冲洗溶液和/或微小颗粒通过涡流排出物排出。