公开(公告)号：KR100819096B1

公开(公告)日：2008-04-02

申请号：KR1020060114902

申请日：2006-11-21

Applicant: 삼성전자주식회사

Inventor： 진경환 ,  김경인 ,  정학수 ,  안경민

IPC: H01L21/3065 ,  H01L21/304

CPC classification number: C23C16/4405 ,  Y10S134/902 ,  Y10S438/905 ,  Y10S438/909

Abstract: A method for cleaning semiconductor manufacturing equipment using a remote plasma in a PEOX process is provided to prevent particles from being generated on a wafer by cleaning a process chamber so that an N2 gas does not remain in the process chamber. After a PEOX(Plasma Enhanced Oxide) process is completed, a SiH4 outlet line is opened to supply an N2 gas, thereby purging a process chamber(10). A remote plasma generator(36) supplies an NF3 gas during a predetermined time to generate a plasma. The SiH4 supply line is opened, and the N2 gas is supplied to the process chamber. The remote plasma generator supplies an Ar gas to the process chamber to generate the plasma. After the NF3 gas is removed from the process chamber and the process chamber, a second air valve(24) and a third air valve(26) are alternatively opened/closed to supply the N2 gas, with a first air valve(18) being opened.

Abstract translation: 提供了一种在PEOX工艺中使用远程等离子体清洗半导体制造设备的方法，以通过清洁处理室来防止在晶片上产生颗粒，使得N2气体不会残留在处理室中。 在完成PEOX（等离子体增强氧化物）处理之后，打开SiH4出口管线以提供N 2气体，从而净化处理室（10）。 远程等离子体发生器（36）在预定时间内提供NF 3气体以产生等离子体。 打开SiH4供应线，向处理室供给N 2气。 远程等离子体发生器向处理室提供Ar气体以产生等离子体。 在从处理室和处理室中除去NF 3气体之后，第二空气阀（24）和第三空气阀（26）被交替地打开/关闭以供应N 2气体，第一空气阀（18）是 打开。

公开(公告)号：KR1020060135458A

公开(公告)日：2006-12-29

申请号：KR1020050055425

申请日：2005-06-25

Applicant: 삼성전자주식회사

Inventor： 안경민

IPC: H01L21/205

CPC classification number: H01L22/12 ,  C23C16/45565

Abstract: A shower head distance measuring jig and a shower head distance measuring method using the same are provided to reduce remarkably the maintenance time of equipment and to measure exactly the distance between a heating block and a shower head. A shower head distance measuring jig(130) is used for measuring the distance between a heating block(100) and a shower head(150) in a CVD apparatus. The shower head distance measuring jig is formed like a disc type structure. The shower head distance measuring jig is made of a metal or teflon.

Abstract translation: 提供了一种喷头距离测量夹具和使用其的喷头距离测量方法，以显着减少设备的维护时间并精确测量加热块和淋浴头之间的距离。 淋浴头距离测量夹具（130）用于测量CVD设备中的加热块（100）和喷头（150）之间的距离。 喷头距离测量夹具形成为盘形结构。 淋浴头距离测量夹具由金属或特氟隆制成。

公开(公告)号：KR1020070063282A

公开(公告)日：2007-06-19

申请号：KR1020050123334

申请日：2005-12-14

Applicant: 삼성전자주식회사

Inventor： 안경민

IPC: H01L21/02 ,  H01L21/67

Abstract: Semiconductor device fabricating equipment is provided to easily assemble a spindle fork assembly by forming fixing bosses on an upper plate which fix spindle forks, without using spindle fork springs. A spindle fork assembly(200) is positioned in a process chamber, and rotates semiconductor substrates. The spindle fork assembly includes pairs of spindle forks(220) supporting semiconductor substrates, an upper plate(210) with plural fixing bosses(212) for fixing a pair of the spindle forks, and a lower plate(230) positioned under the spindle forks. The spindle fork assembly is mounted on a heater block to maintain the semiconductor substrates at constant temperature.

Abstract translation: 半导体器件制造设备被设置为通过在固定主轴叉的上板上形成固定凸台来容易地组装主轴叉组件，而不使用主轴叉簧。 主轴叉组件（200）位于处理室中，并且旋转半导体衬底。 主轴叉组件包括支撑半导体衬底的一对主轴叉（220），具有用于固定一对主轴叉的多个固定凸台（212）的上板（210）和位于主轴叉下方的下板（230） 。 主轴叉组件安装在加热块上以将半导体衬底保持在恒定温度。