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公开(公告)号：KR1020160016515A
公开(公告)日：2016-02-15
申请号：KR1020150002023
申请日：2015-01-07
Applicant: 삼성전자주식회사
IPC: H04N21/4408 , G02B27/01 , H04W12/02 , H04L29/06 , G06K9/00
CPC classification number: H04N21/4408 , G02B27/01 , G06K2009/00953 , H04L63/04 , H04W12/02
Abstract: 외부디바이스에포함된컨텐츠의암호화에이용되는암호키를생성하는웨어러블(wearable) 디바이스는, 사용자정보를획득하는사용자정보획득부; 상기사용자정보에기초하여사용자를인증하고, 상기사용자가인증됨에따라상기암호키를생성하는제어부; 및상기암호키를상기외부디바이스에게전송하는통신부;를포함한다.
Abstract translation: 一种用于生成用于加密包含在外部设备中的内容的加密密钥的可穿戴设备，包括：用户信息获取单元，用于获取用户信息; 控制单元，用于基于所述用户信息认证用户，以及在所述用户认证时生成所述加密密钥; 以及用于将加密密钥发送到外部设备的通信单元。
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公开(公告)号：KR1020150110319A
公开(公告)日：2015-10-02
申请号：KR1020150022722
申请日：2015-02-13
Applicant: 삼성전자주식회사
Inventor： 정학수
CPC classification number: G06F3/1454 , G06F1/163 , G06F3/01 , G06F3/0484 , G06F3/14 , G06F3/1423 , G09G3/002 , G09G3/003 , G09G5/14 , G09G2340/12 , G09G2340/125 , G09G2340/14 , G09G2370/042 , G09G2370/06 , G09G2370/16 , G09G2380/02
Abstract: 웨어러블디바이스에서, 사용자가디바이스를이용하는지를나타내는이용정보를획득하고이용정보가획득됨에따라, 웨어러블디바이스에서디스플레이되는영상의적어도일부를결정하여, 결정된영상의적어도일부를디바이스에전송하는디바이스에영상을디스플레이하는방법이개시된다.
Abstract translation: 本发明公开了一种用于在设备中显示图像的方法，该方法获得表示用户是否在可穿戴设备中使用设备的使用信息，将可穿戴设备中显示的图像的至少一部分确定为用户 获得信息，并将确定的图像的一部分发送到设备。
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公开(公告)号：KR100819096B1
公开(公告)日：2008-04-02
申请号：KR1020060114902
申请日：2006-11-21
Applicant: 삼성전자주식회사
IPC: H01L21/3065 , H01L21/304
CPC classification number: C23C16/4405 , Y10S134/902 , Y10S438/905 , Y10S438/909
Abstract: A method for cleaning semiconductor manufacturing equipment using a remote plasma in a PEOX process is provided to prevent particles from being generated on a wafer by cleaning a process chamber so that an N2 gas does not remain in the process chamber. After a PEOX(Plasma Enhanced Oxide) process is completed, a SiH4 outlet line is opened to supply an N2 gas, thereby purging a process chamber(10). A remote plasma generator(36) supplies an NF3 gas during a predetermined time to generate a plasma. The SiH4 supply line is opened, and the N2 gas is supplied to the process chamber. The remote plasma generator supplies an Ar gas to the process chamber to generate the plasma. After the NF3 gas is removed from the process chamber and the process chamber, a second air valve(24) and a third air valve(26) are alternatively opened/closed to supply the N2 gas, with a first air valve(18) being opened.
Abstract translation: 提供了一种在PEOX工艺中使用远程等离子体清洗半导体制造设备的方法，以通过清洁处理室来防止在晶片上产生颗粒，使得N2气体不会残留在处理室中。 在完成PEOX（等离子体增强氧化物）处理之后，打开SiH4出口管线以提供N 2气体，从而净化处理室（10）。 远程等离子体发生器（36）在预定时间内提供NF 3气体以产生等离子体。 打开SiH4供应线，向处理室供给N 2气。 远程等离子体发生器向处理室提供Ar气体以产生等离子体。 在从处理室和处理室中除去NF 3气体之后，第二空气阀（24）和第三空气阀（26）被交替地打开/关闭以供应N 2气体，第一空气阀（18）是 打开。
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公开(公告)号：KR1020160120054A
公开(公告)日：2016-10-17
申请号：KR1020150049068
申请日：2015-04-07
Applicant: 삼성전자주식회사
Abstract: 일실시예에따른프록시서버관리방법에있어서, 복수의가상서버(virtual server)들을포함하는서버풀(server pool)에서적어도하나의가상서버를선택하는단계; 클라이언트에게서비스를제공하기위한서비스서버와상기선택된적어도하나의가상서버를결합하는단계; 및상기결합된적어도하나의가상서버를프록시서버로이용하여상기서비스를클라이언트에게제공하는단계를포함한다.
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公开(公告)号：KR1020160016505A
公开(公告)日：2016-02-15
申请号：KR1020140180502
申请日：2014-12-15
Applicant: 삼성전자주식회사
Abstract: 일실시예에따른디바이스는사용자에의해선택된복수의작업을포함하는작업그룹을저장하는저장부, 상기작업그룹에포함된적어도하나의작업에대응되는윈도우를표시하는출력부및 상기표시된윈도우내에상기작업그룹에포함된다른작업을나타내는적어도하나의객체를함께표시하도록출력부를제어하는제어부를포함할수 있다.
Abstract translation: 本发明涉及一种使用工作组显示窗口的方法和装置。 根据实施例，设备可以包括：存储单元，用于存储包括由用户选择的多个作业的工作组; 用于显示与包括在所述工作组中的至少一个任务相对应的窗口的输出单元; 以及控制单元，用于控制所述输出单元以在所显示的窗口内显示表示包括在所述工作组中的另一任务的至少一个对象。 本发明的目的是使得用户能够容易地识别包括在分类工作组中的窗口，并且更方便地执行包括在工作组中的窗口之间的屏幕改变。
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Patent Agency Ranking
公开(公告)号：KR1020080078344A
公开(公告)日：2008-08-27
申请号：KR1020070018319
申请日：2007-02-23
Applicant: 삼성전자주식회사
IPC: H01L21/205
CPC classification number: C23C16/45574 , C23C16/4405
Abstract: Semiconductor manufacturing equipment and a management method thereof are provided to prevent a wafer from being polluted by cleaning a lift pin with cleaning gas. A management method of semiconductor manufacturing equipment includes the steps of: removing a wafer, which is subjected to a semiconductor manufacturing process, from a process chamber(110); if the number of the wafers subjected to the semiconductor manufacturing process reaches to the predetermined number or the semiconductor manufacturing process takes a predetermined time, supplying second reaction gas in the process chamber to clean an inner wall of the process chamber; and lifting a lift pin(116) out of the top of the heater blocks(114) installed at the bottom of the process chamber to expose the lift pin to the second reaction gas.
Abstract translation: 提供半导体制造设备及其管理方法，以通过用清洁气体清洁提升销来防止晶片被污染。 半导体制造设备的管理方法包括以下步骤：从处理室（110）去除经受半导体制造工艺的晶片; 如果经过半导体制造工艺的晶片的数量达到预定数量或半导体制造过程需要预定时间，则在处理室中提供第二反应气体以清洁处理室的内壁; 以及将提升销（116）从设置在处理室底部的加热器块（114）的顶部提起以将提升销暴露于第二反应气体。
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公开(公告)号：KR1020070007625A
公开(公告)日：2007-01-16
申请号：KR1020050062363
申请日：2005-07-11
Applicant: 삼성전자주식회사
Inventor： 정학수
IPC: H01L21/027
CPC classification number: G03F7/70158 , G02B27/0037
Abstract: A beam diffraction apparatus and a method for selecting a diffraction angle of a beam are provided to easily control the diffraction angle of the beam by using plural optical panels being vertically stacked and rotating each optical panel around the center. A plurality of optical panels(110,120,130,140,150) are vertically stacked. Each of the optical panels includes a multiplicity of a DOEs(Diffractive optical Elements). The respective DOEs have different diffraction angles. The optical panels are independently rotated around the center. The optical panels allow a diffraction angle of a beam to be controlled easily.
Abstract translation: 提供了一种用于选择光束的衍射角的光束衍射装置和方法，通过使用垂直堆叠的多个光学板并围绕中心旋转每个光学板来容易地控制光束的衍射角。 多个光学面板（110,120,130,140,150）被垂直堆叠。 每个光学面板包括多个DOE（衍射光学元件）。 各自的DOE具有不同的衍射角。 光学面板独立地围绕中心旋转。 光学面板允许光束的衍射角容易控制。
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公开(公告)号：KR1020160016527A
公开(公告)日：2016-02-15
申请号：KR1020150024018
申请日：2015-02-17
Applicant: 삼성전자주식회사
IPC: H04N21/4408 , H04N21/4415 , G06F1/16 , G06K9/00
CPC classification number: H04N21/4408 , G06F1/163 , G06K2009/00953 , H04N21/4415
Abstract: 외부디바이스에포함된컨텐츠의암호화에이용되는암호키를생성하는웨어러블(wearable) 디바이스는, 사용자정보를획득하는사용자정보획득부; 상기사용자정보에기초하여사용자를인증하고, 상기사용자가인증됨에따라상기암호키를생성하는제어부; 및상기암호키를상기외부디바이스에게전송하는통신부;를포함한다.
Abstract translation: 一种用于生成用于对包含在外部设备中的内容进行加密的加密密钥的可穿戴设备，包括：用户信息获取单元，用于获取用户信息; 控制单元，用于基于用户信息来认证用户并且根据用户的认证来生成密码密钥; 以及用于将加密密钥传输到外部设备的通信单元。
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公开(公告)号：KR1020060063130A
公开(公告)日：2006-06-12
申请号：KR1020040102218
申请日：2004-12-07
Applicant: 삼성전자주식회사
Inventor： 정학수
IPC: H01L21/027 , H01L21/02
CPC classification number: G03F7/70925 , G01N21/9501 , G03F7/7085 , G03F9/7034 , G06T7/0004
Abstract: 웨이퍼 척을 레이저 빔으로 세정하는 장치 및 방법을 제시한다. 본 발명에 따르면, 노광을 위한 광원을 웨이퍼 상에 제공하는 렌즈부, 렌즈부 아래로 웨이퍼를 도입하되 웨이퍼의 레벨링을 측정하는 측정부 및 노광이 수행되는 노광부를 포함하는 웨이퍼 스테이지, 웨이퍼 스테이지 상에 올려져 웨이퍼를 지지하는 웨이퍼 척, 및 웨이퍼 척 상에 존재할 파티클에 레이저 빔을 조사하여 제거할 레이저 빔 조사부를 포함하는 노광 설비를 제시한다.
노광, 웨이퍼 스테이지, 레이저 빔, 디포커스, 파티클
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