公开(公告)号：KR1020030025060A

公开(公告)日：2003-03-28

申请号：KR1020010057983

申请日：2001-09-19

Applicant: 삼성전자주식회사

Inventor： 박성룡 ,  엄상민 ,  김용현 ,  한우성

IPC: H01L21/027

Abstract: PURPOSE: An apparatus for fabricating a mask is provided to form uniformly the thickness of photoresist coated on a mask by using a cylindrical container for receiving a chuck. CONSTITUTION: A mask(110) coated with photoresist is loaded and rotated on a chuck(106). The mask(110) is installed in the inside of a cylindrical container(112). The container(112) is installed in the inside of a chamber(104). An exhaust line(102) is used for exhausting the photoresist. A vacuum line(100) is used for controlling a vacuum state of the chamber(104). The container(112) is formed with anodized stainless steel. The thickness of the container(112) is minimized by using the anodized stainless steel. A plurality of fluid exhaust holes(108) are formed on a wall of the container(112).

Abstract translation: 目的：提供一种用于制造掩模的设备，以通过使用用于接收卡盘的圆柱形容器来均匀地形成涂覆在掩模上的光致抗蚀剂的厚度。 构成：涂覆有光致抗蚀剂的掩模（110）被装载并在卡盘（106）上旋转。 面罩（110）安装在圆筒形容器（112）的内部。 容器（112）安装在室（104）的内部。 排气管（102）用于排出光致抗蚀剂。 真空管线（100）用于控制室（104）的真空状态。 容器（112）由阳极氧化不锈钢形成。 通过使用阳极氧化不锈钢使容器（112）的厚度最小化。 多个流体排出孔（108）形成在容器（112）的壁上。