公开(公告)号：KR1020010036694A

公开(公告)日：2001-05-07

申请号：KR1019990043809

申请日：1999-10-11

Applicant: 삼성전자주식회사

Inventor： 임영철 ,  김길수 ,  오정은 ,  신원열 ,  김성일 ,  송춘호

IPC: H01L21/027

Abstract: PURPOSE: A photoresist coating method is provided to obtain a uniform thickness of photoresist layer without defects by uniformly coating a photoresist layer on a wafer through spraying a photoresist material while rotating the wafer in low and high speeds. CONSTITUTION: A wafer is loaded on a rotation chuck. A nozzle is located to the center of the wafer for spraying a photoresist material. The photoresist material is sprayed for 1 to 15 seconds through a nozzle fixed to a central position of the wafer while rotating the rotation chuck loaded with the wafer in a low speed of 50 to 250 rpm. The rotation chuck loaded with the wafer is rotated in a high speed of 200 to 5000 rpm. Then, a photoresist layer is formed on the wafer. The wafer is unloaded from the rotation chuck for next process.

Abstract translation: 目的：提供光致抗蚀剂涂覆方法，以通过在低速高速旋转晶片的同时喷射光致抗蚀剂材料，在晶片上均匀地涂覆光致抗蚀剂层，从而获得均匀厚度的光致抗蚀剂层，而无缺陷。 构成：将晶片装载在旋转卡盘上。 喷嘴位于晶片的中心，用于喷涂光致抗蚀剂材料。 通过固定在晶片的中心位置的喷嘴将光致抗蚀剂材料喷射1至15秒，同时以50至250rpm的低速旋转装载晶片的旋转卡盘。 装载晶片的旋转卡盘以200rpm至5000rpm的高速旋转。 然后，在晶片上形成光致抗蚀剂层。 从旋转卡盘卸下晶片以进行下一工序。

公开(公告)号：KR1020000043455A

公开(公告)日：2000-07-15

申请号：KR1019980059834

申请日：1998-12-29

Applicant: 삼성전자주식회사

Inventor： 오정은 ,  신원열 ,  이제철 ,  이정훈

IPC: H01L21/027

Abstract: PURPOSE: A cooling apparatus for a spin motor is provided to reduce a production cost, to extend a life span, and to improve productivity. CONSTITUTION: A cooling apparatus includes a chuck(21) for supporting a wafer(10), a spin motor(23) for rotating the chuck(21), a flange(22) disposed between the chuck(21) and the spin motor(23), and a cooling pipe(26) wound on the spin motor(23). In particular, the cooling pipe(26) is connected with an air influx pipe(24) at one end and an exhaust pipe(25) at the other end. While the spin motor(23) is rotated, air is pumped into the influx pipe(24) by a compressor. Then, the air circulates through the cooling pipe(26) to cool the spin motor(23), and therefore becomes warmer. The warmed air is exhausted through the exhaust pipe(25). The flange(22) is formed by vacuum inside body and covered with an insulating material such as teflon to intercept a heat transmission to the wafer(10). The cooling pipe(26) may be installed inside the spin motor(23).

Abstract translation: 目的：提供一种用于旋转电机的冷却装置，以降低生产成本，延长寿命并提高生产率。 构成：冷却装置包括用于支撑晶片（10）的卡盘（21），用于旋转卡盘（21）的旋转马达（23），设置在卡盘（21）和旋转马达（ 23）和卷绕在旋转马达（23）上的冷却管（26）。 特别地，冷却管26在一端连接有空气流入管24，另一端连接有排气管25。 当旋转马达（23）旋转时，空气通过压缩机泵送到流入管（24）中。 然后，空气通过冷却管（26）循环以冷却旋转马达（23），因此变暖。 暖气通过排气管（25）排出。 凸缘（22）由真空内部形成并被诸如聚四氟乙烯之类的绝缘材料覆盖，以拦截对晶片（10）的热传递。 冷却管（26）可以安装在旋转马达（23）的内部。

公开(公告)号：KR1020000024738A

公开(公告)日：2000-05-06

申请号：KR1019980041395

申请日：1998-10-01

Applicant: 삼성전자주식회사

Inventor： 이제철 ,  김정석 ,  오정은

IPC: H01L21/027

Abstract: PURPOSE: An apparatus having a double nozzle for applying a photoresist on a wafer rotating at a high speed, forms a uniform film on the wafer, and reduces a time of applying the photoresist. CONSTITUTION: An apparatus for applying a photoresist includes a rotary table(120) on which a wafer(110) is positioned. A rotator(130) rotates the rotary table. A applying device(200) is vertically separated from the rotator, and deposits the photoresist (150) on the wafer. The applying device(140) includes a dual nozzle(144) formed on a wafer center and a predetermined edge. A supporting stand(142) supports a dual nozzle, and provides the photoresist by using a double nozzle. Thereby, the device applies a photoresist on a wafer rotating at a high speed, forms a uniform film on the wafer, and reduces a time of applying the photoresist.

Abstract translation: 目的：一种具有用于在高速旋转的晶片上施加光致抗蚀剂的双喷嘴的装置，在晶片上形成均匀的膜，并且减少了施加光致抗蚀剂的时间。 构成：用于施加光致抗蚀剂的设备包括其上定位有晶片（110）的旋转台（120）。 旋转器（130）旋转旋转台。 施加装置（200）与旋转体垂直分离，并将光致抗蚀剂（150）沉积在晶片上。 施加装置（140）包括形成在晶片中心和预定边缘上的双喷嘴（144）。 支撑台（142）支撑双喷嘴，并通过使用双喷嘴提供光致抗蚀剂。 因此，该装置在高速​​旋转的晶片上施加光致抗蚀剂，在晶片上形成均匀的膜，并且缩短了施加光致抗蚀剂的时间。

公开(公告)号：KR1020000020894A

公开(公告)日：2000-04-15

申请号：KR1019980039690

申请日：1998-09-24

Applicant: 삼성전자주식회사

Inventor： 이정훈 ,  오정은 ,  이제철 ,  김정석

IPC: H02K35/00

Abstract: PURPOSE: A reciprocating unit using electromagnetic force is provided to directly convert an electric force into a mechanical force such that the reciprocating unit does not operate abnormally due to the degradation of components. CONSTITUTION: A reciprocating unit reciprocating an external device, comprises: a piston (114) connected to the external device; a bar magnet(116) connected to the piston on the same line; and a coil(118) wound around the bar magnet. The reciprocating unit operates the piston using the electromagnetic force. As current is applied to the coil, the electromagnetic force is generated, thereby the bar magnet is moved up and down. As the bar magnet is moved up and down, the piston connected to the bar magnet on the same line is moved up and down like the bar magnet, thereby moving a nozzle(100) connected to the piston. The reciprocating unit further comprises a position sensor(120) to sense the position of the piston. The position sensor controls a distance that the nozzle is moved up and down. Thus, the invention prevent abnormal operation of the reciprocating unit due to the degradation of components, thereby enhancing the productivity.

Abstract translation: 目的：提供使用电磁力的往复运动单元，以将电力直接转换为机械力，使得往复运动单元由于部件的劣化而不能正常运转。 构成：与外部装置往复运动的往复式单元，包括：连接到外部装置的活塞（114）; 在同一条线上连接到活塞的棒状磁体（116）; 以及缠绕在所述棒状磁体上的线圈（118）。 往复式单元使用电磁力来操作活塞。 当电流施加到线圈时，产生电磁力，从而使杆磁体上下移动。 当杆状磁体上下移动时，连接到同一线路上的杆状磁体的活塞像棒状磁体一样上下移动，从而移动与活塞连接的喷嘴（100）。 往复运动单元还包括用于感测活塞位置的位置传感器（120）。 位置传感器控制喷嘴上下移动的距离。 因此，本发明能够防止由于部件的劣化导致的往复运动装置的异常运转，提高了生产率。

公开(公告)号：KR1020050060467A

公开(公告)日：2005-06-22

申请号：KR1020030092098

申请日：2003-12-16

Applicant: 삼성전자주식회사

Inventor： 오정은

IPC: H01L21/027

Abstract: 반도체 포토공정용 베이크 장치는 챔버와, 챔버의 내부에 설치되어 가열되며 웨이퍼가 안착되는 다수개의 안착돌기를 갖는 베이크 플레이트와, 챔버의 일측에 설치된 배기장치와, 배기장치의 일측에 설치되어 챔버에서 배기되는 베이크 잔여물의 양을 검출하는 검출장치를 포함한다.

公开(公告)号：KR1020030071024A

公开(公告)日：2003-09-03

申请号：KR1020020010536

申请日：2002-02-27

Applicant: 삼성전자주식회사

Inventor： 오정은 ,  이정훈

IPC: H01L21/304

Abstract: PURPOSE: An apparatus for rinsing a semiconductor wafer is provided to improve cleaning efficiency and shorten an interval of cleaning time by effectively eliminating the particles on the wafer. CONSTITUTION: A chamber(30) is prepared. A spin chuck(32) fixes and rotates a cleaning target material, received in the chamber. A nozzle is installed in a position over the spin chuck so that deionized water can be sprayed on the cleaning target material on the spin chuck. The nozzle is composed of a plurality of nozzles(38,40).

Abstract translation: 目的：提供一种用于冲洗半导体晶片的装置，以通过有效地消除晶片上的颗粒来提高清洁效率并缩短清洗时间间隔。 构成：准备了一个室（30）。 旋转卡盘（32）固定并旋转容纳在腔室中的清洁目标材料。 喷嘴安装在旋转卡盘上的位置，使得去离子水可以喷在旋转卡盘上的清洁目标材料上。 喷嘴由多个喷嘴（38,40）组成。

公开(公告)号：KR1020000024864A

公开(公告)日：2000-05-06

申请号：KR1019980041628

申请日：1998-10-02

Applicant: 삼성전자주식회사

Inventor： 임영철 ,  김성일 ,  김길수 ,  오정은

IPC: H01L21/027

Abstract: PURPOSE: A constant-temperature water circulation device for maintaining a temperature of a photoresistor developing liquid circulates a contract-temperature liquid, and makes a developing liquid maintain a constant temperature. CONSTITUTION: A constant-temperature water circulation device forms air tube(32) in one direction, allows air to be passed through with a constant pressure, and forms a vacuum tube(34) connected to the air tube(32). Because of air inflow pressure, a vacuum is made. A constant-temperature water circulation tube(28) passes through a vacuum tube(34) and air tube(32), a constant-temperature water is continuously flowed by a vacuum pressure and inflow pressure. A vacuum ejector(30) is mounted to a constant-temperature water circulation device. Thereby, a temperature of a developing liquid used to a developing process and a photoresistor deposition process of a semiconductor manufacturing process is always maintained.

Abstract translation: 目的：用于保持光敏电阻显影液的温度的恒温水循环装置循环收缩温度的液体，使显影液保持恒温。 构成：恒温水循环装置在一个方向上形成空气管（32），允许空气以恒定的压力通过，并形成连接到空气管（32）的真空管（34）。 由于空气流入压力，进行真空。 恒温水循环管（28）通过真空管（34）和空气管（32），恒温水通过真空压力和流入压力连续流动。 真空喷射器（30）安装在恒温水循环装置上。 因此，始终保持用于显影处理的显影液的温度和半导体制造工艺的光电晶体沉积工艺。